Growth of ZnS Films and Post-Annealing Effects

2008 ◽  
Vol 53 (1) ◽  
pp. 331-334 ◽  
Author(s):  
B.-S. Yun ◽  
JunHo Kim
2014 ◽  
Vol 504 ◽  
pp. 8-11 ◽  
Author(s):  
Takashi Noji ◽  
Takehiro Hatakeda ◽  
Shohei Hosono ◽  
Takayuki Kawamata ◽  
Masatsune Kato ◽  
...  

2015 ◽  
Vol 11 (5) ◽  
pp. 862-870 ◽  
Author(s):  
Faiza Meriche ◽  
Tahar Touam ◽  
Azeddine Chelouche ◽  
Mohamed Dehimi ◽  
Jeanne Solard ◽  
...  

2022 ◽  
pp. 1-1
Author(s):  
Hee-Ryoung Cha ◽  
Ga-Yeong Kim ◽  
Tae-Hoon Kim ◽  
Sang-Hyub Lee ◽  
Dong-Hwan Kim ◽  
...  

2013 ◽  
Vol 734-737 ◽  
pp. 2492-2495
Author(s):  
Yong June Choi ◽  
Kyung Mun Kang ◽  
Hyung Ho Park

The post-annealing effects on the surface morphological changes of undoped and Al-doped ZnO (ZnO:Al) thin films deposited by atomic layer deposition (ALD) were investigated. The as-grown films were deposited by ALD at growth temperature of 200°C and also, post-annealing of the samples was accomplished at 300°C for 1 h under nitrogen atmosphere. The X-ray diffraction of the films was monitored to study the crystallinity of the films according to post-anneal. The field emission-scanning electron microscopy and atomic force microscopy were conducted to observe the surface morphological changes and measure the root-mean-square roughness of the films in order to analysis the post-annealing effects on the surface roughness of the films.


1999 ◽  
Vol 85 (2) ◽  
pp. 1069-1074 ◽  
Author(s):  
Keiko Kushida-Abdelghafar ◽  
Masahiko Hiratani ◽  
Yoshihisa Fujisaki

Carbon ◽  
2017 ◽  
Vol 123 ◽  
pp. 18-25 ◽  
Author(s):  
Daniel Villaroman ◽  
Xinjiang Wang ◽  
Weijing Dai ◽  
Lin Gan ◽  
Ruizhe Wu ◽  
...  

2017 ◽  
Vol 56 (4S) ◽  
pp. 04CS07 ◽  
Author(s):  
Kosuke O. Hara ◽  
Cham Thi Trinh ◽  
Yasuyoshi Kurokawa ◽  
Keisuke Arimoto ◽  
Junji Yamanaka ◽  
...  

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