scholarly journals Mechanical characterization of carbon nanomembranes from self-assembled monolayers

2011 ◽  
Vol 2 ◽  
pp. 826-833 ◽  
Author(s):  
Xianghui Zhang ◽  
André Beyer ◽  
Armin Gölzhäuser

This paper reports on the mechanical characterization of carbon nanomembranes (CNMs) with a thickness of 1 nm that are fabricated by electron-induced crosslinking of aromatic self-assembled monolayers (SAMs). A novel type of in situ bulge test employing an atomic force microscope (AFM) is utilized to investigate their mechanical properties. A series of biphenyl-based molecules with different types of terminal and/or anchor groups were used to prepare the CNMs, such as 4'-[(3-trimethoxysilyl)propoxy]-[1,1'-biphenyl]-4-carbonitrile (CBPS), 1,1'-biphenyl-4-thiol (BPT) and 4-nitro-1,1'-biphenyl-4-thiol (NBPT). The elastic properties, viscoelastic behaviors and ultimate tensile strength of these biphenyl-based CNMs are investigated and discussed.

1999 ◽  
Vol 77 (5-6) ◽  
pp. 1077-1084 ◽  
Author(s):  
R Scott Reese ◽  
Marye Anne Fox

Self-assembled monolayers of sulfur-terminated oligonucleotide duplexes were formed on flat gold surfaces, either by exposure of a self-assembled monolayer bearing one oligonucleotide strand to the complementary strand or by preformation of a oligonucleotide duplex that was then deposited on a fresh gold surface. Virtually identical spectral behavior was observed whether the duplex was produced before deposition or by in situ complementary association. With a duplex bearing an appropriate pyrene end-label, the resulting thin film was photoresponsive. Surface emission measurements show no evidence for pyrene aggregation on the modified surfaces. The polarity of the photocurrent, reflecting photoinduced electron transfer initiated by photoexcitation of pyrene, is opposite that expected from the oligonucleotide-mediated reduction of the appended pyrene excited state.Key words: oligonucleotide, self-assembled monolayer, duplex formation, photoelectrochemistry, surface emission.


Langmuir ◽  
2005 ◽  
Vol 21 (14) ◽  
pp. 6142-6144 ◽  
Author(s):  
Christophe Tromas ◽  
Peter Eaton ◽  
Jean Mimault ◽  
Javier Rojo ◽  
Soledad Penadés

2016 ◽  
Vol 109 (26) ◽  
pp. 261905 ◽  
Author(s):  
Naoki Miyazawa ◽  
Junya Ishimoto ◽  
Masataka Hakamada ◽  
Mamoru Mabuchi

Nanoscale ◽  
2018 ◽  
Vol 10 (48) ◽  
pp. 23027-23036 ◽  
Author(s):  
Evangelia-Nefeli Athanasopoulou ◽  
Nikolaos Nianias ◽  
Quy Khac Ong ◽  
Francesco Stellacci

In-depth analysis of self-assembled monolayers by bimodal atomic force microscopy.


1998 ◽  
Vol 4 (S2) ◽  
pp. 308-309
Author(s):  
Jecksan R. Santiago ◽  
E. Barry Troughton ◽  
Richard A. Dennis ◽  
Phillip E. Russell

Ex-situ and in-situ studies were performed for self-assembled monolayers (SAMs) formation on mica. The behavior of two surfactants [octadecylphosphonic acid (OPA) and dodecylphosphonic acid (DPA)] in two different solutions [ethanol or tetrahydrofuran (THF)] were studied at different concentrations. A cross section analysis of the monolayer images at partial coverage showed thickness of 1.8 nm, 0.7 nm, and 1.0 nm for OPA, DPA and mixed OPA/DPA, respectively. These values are similar to the ones presented by Xiao and those expected for a monolayer of mixed surfactants as proposed by Whitesides. Since the topography of a monolayer resembles the substrate, the presence of the monolayer at full coverage was determinated by force-distance curve measurements. It was observed that the solvent had the ability to re-dissolve the OPA monolayer, suggesting that the bonding is of a physisorption nature.


2009 ◽  
Vol 25 (1) ◽  
pp. 83-86 ◽  
Author(s):  
Guo-Qiang TAN ◽  
Hai-Yang BO ◽  
Hong-Yan MIAO ◽  
Ao XIA ◽  
Zhong-Liang HE

Langmuir ◽  
2017 ◽  
Vol 33 (25) ◽  
pp. 6419-6426 ◽  
Author(s):  
A. Shaheen ◽  
J. M. Sturm ◽  
R. Ricciardi ◽  
J. Huskens ◽  
C. J. Lee ◽  
...  

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