scholarly journals Novel Approaches for Intensifying Negative C60 Ion Beams Using Conventional Ion Sources Installed on a Tandem Accelerator

2020 ◽  
Vol 4 (1) ◽  
pp. 13 ◽  
Author(s):  
Atsuya Chiba ◽  
Aya Usui ◽  
Yoshimi Hirano ◽  
Keisuke Yamada ◽  
Kazumasa Narumi ◽  
...  
Keyword(s):  
High Intensity ◽  
Energy Region ◽  
Electron Attachment ◽  
Ion Beams ◽  
Ion Source ◽  
Ion Sources ◽  
Current Intensity ◽  
Tandem Accelerator ◽  
Accelerator Facility ◽  
Novel Approaches

We developed novel methods for producing negative C60 ion beams at the accelerator facility Takasaki Ion Accelerators for Advanced Radiation Application (TIARA) to increase the current intensity of swift C60 ion beams accelerated to the MeV energy region using a tandem accelerator. We produced negative C60 ion beams with an intensity of 1.3 µA, which is several tens of thousands of times greater than the intensity of beams produced using conventional methods based on the Cs sputtering process. These beams were obtained by temporarily adding an ionization function based on electron attachment to an existing ion source that is widely used in tandem accelerators. The high-intensity swift C60 ion beams can be made available relatively easily to institutes that have tandem accelerators and ion sources of the type used at TIARA because there is no need to change existing ion sources or install new ones.

Time resolving diagnostic of the compensation process of pulsed ion beams at high-intensity light ion source

2000 ◽  
Vol 71 (2) ◽  
pp. 1107-1109 ◽  
Author(s):  
A. Jakob ◽  
P-Y. Beauvais ◽  
R. Gobin ◽  
H. Klein ◽  
J-L. LeMaire ◽  
...  
Keyword(s):  
High Intensity ◽  
Ion Beams ◽  
Ion Source ◽  
Compensation Process ◽  
High Intensity Light

Production of High-Intensity Ion Beams from the DECRIS-PM-14 ECR Ion Source

2018 ◽  
Vol 15 (7) ◽  
pp. 878-881 ◽  
Author(s):  
S. L. Bogomolov ◽  
A. E. Bondarchenko ◽  
A. A. Efremov ◽  
K. I. Kuzmenkov ◽  
A. N. Lebedev ◽  
...  
Keyword(s):  
High Intensity ◽  
Ion Beams ◽  
Ion Source ◽  
Ecr Ion Source

Ion Injectors for High-Intensity Accelerators

2013 ◽  
Vol 06 ◽  
pp. 197-219 ◽  
Author(s):  
Martin P. Stockli ◽  
Takahide Nakagawa
Keyword(s):  
Failure Rate ◽  
High Intensity ◽  
Ion Source ◽  
Ion Sources ◽  
Beam Intensity ◽  
Duty Factor ◽  
Ion Species

There are a growing number of applications for ion accelerators, with increasingly complex beam requirements and progressively higher beam intensities. The performance of the ion injector is critical to the success of these projects. First, there is the ion source that has to produce the desired ion species, with a large variety of desired species requiring vastly different ion sources. In addition, the ion source has to produce those ions with the desired rate and without debilitating impurities, as well as with the desired duty factor. Several examples will show that very successful ion sources can fail when the duty factor is increased because their lifetime becomes too short or their failure rate too high. Equally important is the extraction of those ions and their transport to the next stage of acceleration, because the slow ion velocities pose a serious challenge to increasing the intensity. As the beam intensity is increased, its emittance, stability and controllability become more important. This article cannot cover this subject in depth. It tries to provide a flavor of the complexities and serve as an introduction to further reading and studies.

scholarly journals System for Measuring Emittance Characteristics of Ion Sources

2020 ◽  
Keyword(s):  
Beam Energy ◽  
Ion Beam ◽  
Electronic System ◽  
Ion Beams ◽  
Ion Source ◽  
Ion Sources ◽  
Raspberry Pi ◽  
Current Profile ◽  
Voltage Amplifier ◽  
Wide Range

The article presents the results of the development of a system for measuring emittance characteristics of ion sources studied at the IAP NAS of Ukraine with the aim of obtaining the ion beams with a high brightness. The emittance measurement system is based on the scheme of an electrostatic scanner and consists of two main parts: the scanner, which moves in the direction perpendicular to the beam axis using a stepper motor, and the electronic system of control, processing and data acquisition. The electronic system contains a Raspberry pi 3B microcomputer, precision DAC/ADCs, the high-voltage amplifier of a scanning voltage up to ±500 V on deflection plates of the scanner and a wide range current integrator. The determination of the emittance consists in measuring the ion beam intensity distribution when the scanner moves along the x-coordinate and the electrostatic scanning along the x´ angle. The obtained two-dimensional data array allows determining the main characteristics of ion beam: geometric 90% emittance, the root mean square (rms) emittance, the Twiss parameters and phase ellipse of rms emittance, the beam current profile and the angle current density distribution. To test the performance and functionality of the system, the emittance characteristics of the penning type ion source were measured. The working gas was helium, and the beam energy varied within 7–15 keV. At 13 keV of beam energy the following emittances of the He+ ions beam was obtained: 90% emittance is 30 π∙mm∙mrad, rms emittance is 8.4 mm∙mrad, and the normalized rms emittance is equal to 0.022 mm∙mrad. The developed system for measuring the emittance of the ion beams is characterized by a short measurement time of 10-15 minutes.

Production of low energy, high intensity metal ion beams by means of a laser ion source

2002 ◽  
Vol 73 (2) ◽  
pp. 650-653 ◽  
Author(s):  
S. Gammino ◽  
L. Torrisi ◽  
L. Andò ◽  
G. Ciavola ◽  
L. Celona ◽  
...  
Keyword(s):  
High Intensity ◽  
Metal Ion ◽  
Ion Beams ◽  
Ion Source ◽  
Low Energy ◽  
Laser Ion Source
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