Time resolving diagnostic of the compensation process of pulsed ion beams at high-intensity light ion source

2000 ◽  
Vol 71 (2) ◽  
pp. 1107-1109 ◽  
Author(s):  
A. Jakob ◽  
P-Y. Beauvais ◽  
R. Gobin ◽  
H. Klein ◽  
J-L. LeMaire ◽  
...  
Keyword(s):  
High Intensity ◽  
Ion Beams ◽  
Ion Source ◽  
Compensation Process ◽  
High Intensity Light

Production of High-Intensity Ion Beams from the DECRIS-PM-14 ECR Ion Source

2018 ◽  
Vol 15 (7) ◽  
pp. 878-881 ◽  
Author(s):  
S. L. Bogomolov ◽  
A. E. Bondarchenko ◽  
A. A. Efremov ◽  
K. I. Kuzmenkov ◽  
A. N. Lebedev ◽  
...  
Keyword(s):  
High Intensity ◽  
Ion Beams ◽  
Ion Source ◽  
Ecr Ion Source

Production of low energy, high intensity metal ion beams by means of a laser ion source

2002 ◽  
Vol 73 (2) ◽  
pp. 650-653 ◽  
Author(s):  
S. Gammino ◽  
L. Torrisi ◽  
L. Andò ◽  
G. Ciavola ◽  
L. Celona ◽  
...  
Keyword(s):  
High Intensity ◽  
Metal Ion ◽  
Ion Beams ◽  
Ion Source ◽  
Low Energy ◽  
Laser Ion Source

Last results of the continuous-wave high-intensity light ion source at CEA-Saclay

1998 ◽  
Vol 69 (2) ◽  
pp. 1009-1011 ◽  
Author(s):  
R. Gobin ◽  
A. France ◽  
P.-Y. Beauvais ◽  
O. Delferrière ◽  
D. De Menezes ◽  
...  
Keyword(s):  
High Intensity ◽  
Continuous Wave ◽  
Ion Source ◽  
High Intensity Light

scholarly journals Novel Approaches for Intensifying Negative C60 Ion Beams Using Conventional Ion Sources Installed on a Tandem Accelerator

2020 ◽  
Vol 4 (1) ◽  
pp. 13 ◽  
Author(s):  
Atsuya Chiba ◽  
Aya Usui ◽  
Yoshimi Hirano ◽  
Keisuke Yamada ◽  
Kazumasa Narumi ◽  
...  
Keyword(s):  
High Intensity ◽  
Energy Region ◽  
Electron Attachment ◽  
Ion Beams ◽  
Ion Source ◽  
Ion Sources ◽  
Current Intensity ◽  
Tandem Accelerator ◽  
Accelerator Facility ◽  
Novel Approaches

We developed novel methods for producing negative C60 ion beams at the accelerator facility Takasaki Ion Accelerators for Advanced Radiation Application (TIARA) to increase the current intensity of swift C60 ion beams accelerated to the MeV energy region using a tandem accelerator. We produced negative C60 ion beams with an intensity of 1.3 µA, which is several tens of thousands of times greater than the intensity of beams produced using conventional methods based on the Cs sputtering process. These beams were obtained by temporarily adding an ionization function based on electron attachment to an existing ion source that is widely used in tandem accelerators. The high-intensity swift C60 ion beams can be made available relatively easily to institutes that have tandem accelerators and ion sources of the type used at TIARA because there is no need to change existing ion sources or install new ones.

scholarly journals High intensity metallic ion beams from an ECR ion source at GANIL

2002 ◽  
Vol 73 (2) ◽  
pp. 558-560 ◽  
Author(s):  
P. Lehérissier ◽  
C. Barué ◽  
C. Canet ◽  
M. Dupuis ◽  
J. L. Flambard ◽  
...  
Keyword(s):  
High Intensity ◽  
Ion Beams ◽  
Ion Source ◽  
Ecr Ion Source
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