Production of low energy, high intensity metal ion beams by means of a laser ion source

2002 ◽  
Vol 73 (2) ◽  
pp. 650-653 ◽  
Author(s):  
S. Gammino ◽  
L. Torrisi ◽  
L. Andò ◽  
G. Ciavola ◽  
L. Celona ◽  
...  
Author(s):  
Alexander Ryabchikov ◽  
Anna Ivanova ◽  
Denis Sivin ◽  
Sergey Dektyarev ◽  
Olga Korneva ◽  
...  

2009 ◽  
Author(s):  
Y. Liu ◽  
J. R. Beene ◽  
T. Gottwald ◽  
C. C. Havener ◽  
C. Mattolat ◽  
...  

2000 ◽  
Vol 71 (2) ◽  
pp. 1107-1109 ◽  
Author(s):  
A. Jakob ◽  
P-Y. Beauvais ◽  
R. Gobin ◽  
H. Klein ◽  
J-L. LeMaire ◽  
...  

2018 ◽  
Vol 15 (7) ◽  
pp. 878-881 ◽  
Author(s):  
S. L. Bogomolov ◽  
A. E. Bondarchenko ◽  
A. A. Efremov ◽  
K. I. Kuzmenkov ◽  
A. N. Lebedev ◽  
...  

2019 ◽  
Vol 55 (10) ◽  
Author(s):  
K. Chrysalidis ◽  
J. Ballof ◽  
Ch. E. Düllmann ◽  
V. N. Fedosseev ◽  
C. Granados ◽  
...  

Abstract. The production of selenium ion beams has been investigated at the CERN-ISOLDE facility via two different ionization methods. Whilst molecular selenium (SeCO) beams were produced at ISOLDE since the early 1990s, recent attempts at reliably reproducing these results have so far been unsuccessful. Here we report on tests of a step-wise resonance laser ionization scheme for atomic selenium using the ISOLDE Resonance Ionization Laser Ion Source (RILIS). For stable selenium an ionization efficiency of 1% was achieved. During the first on-line radioisotope production tests, a yield of $ \approx 2.4 \times 10^4$≈2.4×104 ions/μC was measured for 71Se+, using a ZrO2 target with an electron impact ion source. In parallel, an approach for extraction of molecular carbonyl selenide (SeCO) beams was tested. The same ion source and target material were used and a maximum yield of $ \approx 3.6\times 10^5$≈3.6×105 ions/μ C of 71SeCO+ was measured.


2019 ◽  
Vol 2019 (11) ◽  
Author(s):  
T Sonoda ◽  
I Katayama ◽  
M Wada ◽  
H Iimura ◽  
V Sonnenschein ◽  
...  

Abstract An in-flight separator performs the important role of separating a single specific radioactive isotope (RI) beam from the thousands of RI beams produced by in-flight fission as well as projectile fragmentation. However, when looking at ``separation'' from a different viewpoint, more than 99% of simultaneously produced RI beams are just eliminated in the focal plane slits or elsewhere in the separator. In order to enhance the effective usability of the RIKEN in-flight separator BigRIPS, we have been developing an innovative method: parasitic laser ion source (PALIS), which implements parasitic low-energy RI beam production by saving eliminated RI beams during BigRIPS experiments. In this paper, we present the expected benefits and feasibility for the PALIS concept and the results of the first stopping examination for high-energy RI beams in the gas cell.


1985 ◽  
Vol 45 ◽  
Author(s):  
David R Kingham ◽  
Vincent J Mifsud

ABSTRACTA theoretical model of liquid metal ion source (LMIS) operation has been developed by Kingham and Swanson. In this paper we consider beams from LMIS on the basis of this model. In particular we consider properties such as angular intensity, energy spread and relative abundance of differently charged species of the ion beam, and the dependence of these properties on source current and elemental composition. The conclusion is that the brightest focussed beam for a given probe size is attainable at the lowest possible source current as previously stated by Swanson. LMIS sources have an onset current of typically 1-2[A and will not operate stably below this current, thus limiting the maximum focussed ion beam brightness. The physical reason for this is discussed. The relevance of these properties to fine focussed ion beam applications, particularly semiconductor processing, is discussed. Useful, and in some cases unique, device manufacturing techniques can be postulated using one or more of the momentum, energy or atomic addition properties inherant tothis type of system. Advanced research tools are discussed, together with some examples of the use of microfocussed ion beams with probe sizes down to less than 50nm. Immediate applications include: high resolution ion imaging and SIMS microanalysis; ion beam machining and microfabrication; ion beam resist exposure and ion beam mask repair.


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