scholarly journals Three-Dimensional Glass Monolithic Micro-Flexure Fabricated by Femtosecond Laser Exposure and Chemical Etching

Micromachines ◽  
2014 ◽  
Vol 5 (3) ◽  
pp. 697-710 ◽  
Author(s):  
Viktor Tielen ◽  
Yves Bellouard
Keyword(s):  
Femtosecond Laser ◽  
Chemical Etching ◽  
Three Dimensional ◽  
Laser Exposure

scholarly journals Fabrication of 3D microchannels for tissue engineering in photosensitive glass using NIR femtosecond laser radiation

2019 ◽  
Vol 5 (1) ◽  
pp. 34-45 ◽  
Author(s):  
Ulrike Brokmann ◽  
Tobias Milde ◽  
Edda Rädlein ◽  
Klaus Liefeith
Keyword(s):  
Tissue Engineering ◽  
Laser Radiation ◽  
Femtosecond Laser ◽  
Raw Materials ◽  
Glass Structure ◽  
Three Dimensional ◽  
Silver Ions ◽  
Laser Exposure ◽  
Femtosecond Laser Radiation ◽  
Rate Ratios

Abstract The biocompatibility of photosensitive glasses allows various biomedical applications; one is the field of tissue engineering and more precisely microengineered tissue-on-a-chip platforms to study the tissue microenvironment and disease modelling. Three dimensional architectures of adapted components are required for modern materials. A photosensitive lithiumalumosilicate glass FS21 was investigated regarding the interaction with a Ti:Sapphire laser systemto build three dimensional buried channels inside the glass. Femtosecond laser radiation with a wavelength of 800 nm and pulse duration of 140 fs was used to modify the glass structure. Subsurface channel geometries were achieved by a subsequent thermal treatment and were formed into capillaries using wet chemical etching of the exposed and crystallised channels. Contrary to ultraviolet (UV) exposure, spectral optical investigations showed that fs laser exposure caused various radiation induced defects in the base glass coupled with the generation of photoelectrons for the photochemical modification of silver ions. We observed an outgassing of different species coming from raw materials of the original glass batch during the glass crystallisation process. Etch rate ratios differ between 1:25 and 1:45 and are dependent on: stoichiometric deviation between surface and bulk, crystal size and distribution and exchange of the etching agent in narrow capillaries.

scholarly journals Three-Dimensional Residue-Free Volume Removal inside Sapphire by High-Temperature Etching aftercmd="newline" Irradiation of Femtosecond Laser Pulses

2008 ◽  
Vol 2008 ◽  
pp. 1-4 ◽  
Author(s):  
Shigeki Matsuo ◽  
Kensuke Tokumi ◽  
Takuro Tomita ◽  
Shuichi Hashimoto
Keyword(s):  
High Temperature ◽  
Femtosecond Laser ◽  
Chemical Etching ◽  
Room Temperature ◽  
Three Dimensional ◽  
Laser Pulses ◽  
Femtosecond Laser Pulses ◽  
Etching Technique ◽  
Selective Chemical ◽  
Selective Chemical Etching

We applied the femtosecond laser-assisted etching technique, that is, irradiation of focused femtosecond laser pulses followed by selective chemical etching, to volume removal inside sapphire. At room temperature, volume etching only slightly advanced while residue remained inside the volume. By increasing the etching temperature, complete volume etching without residue was achieved. Complete etching was, however, accompanied by undesirable phenomena of surface pits or cracks, which are expected to be excluded through further improvement of processing.

Fabrication of Optical Microlenses in Glass Using a Femtosecond Laser for LBA-on-a-Chip Applications

2006 ◽  
Author(s):  
Y. Cheng ◽  
H. L. Tsai
Keyword(s):  
Femtosecond Laser ◽  
Laser Beam ◽  
Chemical Etching ◽  
Laser Scanning ◽  
Three Dimensional ◽  
Lab On A Chip ◽  
Selective Removal ◽  
Curved Surfaces ◽  
Photosensitive Glass ◽  
Fs Laser

We describe the fabrication of microoptical cylindrical and hemispherical lenses vertically embedded in a photosensitive Foturan glass by femtosecond (fs) laser three-dimensional (3D) micromachining. The process is mainly composed of four steps: (1) fs laser scanning in the photosensitive glass to form curved surfaces (spherical and/or cylindrical); (2) postannealing of the sample for modification of the exposed areas; (3) chemical etching of the sample for selective removal of the modified areas; and (4) second postannealing for smoothening the surfaces of the tiny lenses. We examine the focusing ability of the microoptical lenses using a He-Ne laser beam, showing great potential of using these microoptical lenses in lab-on-a-chip applications.

Three-Dimensional Maskless Fabrication of Bionic Unidirectional Liquid Spreading Surfaces Using a Phase Spatially Shaped Femtosecond Laser

2021 ◽  
Vol 13 (11) ◽  
pp. 13781-13791
Author(s):  
Xiaozhe Chen ◽  
Xin Li ◽  
Pei Zuo ◽  
MiSheng Liang ◽  
Xiaojie Li ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
Three Dimensional ◽  
Liquid Spreading

Photoluminescence of Point Defects in Silicon Dioxide by Femtosecond Laser Exposure

2021 ◽  
Author(s):  
Vincenzo De Michele ◽  
Emmanuel Marin ◽  
Aziz Boukenter ◽  
Marco Cannas ◽  
Sylvain Girard ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
Silicon Dioxide ◽  
Point Defects ◽  
Laser Exposure

scholarly journals Mechanisms of three-dimensional structuring of photo-polymers by tightly focussed femtosecond laser pulses

2010 ◽  
Vol 18 (10) ◽  
pp. 10209 ◽  
Author(s):  
Mangirdas Malinauskas ◽  
Albertas Žukauskas ◽  
Gabija Bičkauskaitė ◽  
Roaldas Gadonas ◽  
Saulius Juodkazis
Keyword(s):  
Femtosecond Laser ◽  
Three Dimensional ◽  
Laser Pulses ◽  
Femtosecond Laser Pulses

Fabrication and Characterization of Si Nano-Columns by Femtosecond Laser

2012 ◽  
Vol 16 ◽  
pp. 15-20 ◽  
Author(s):  
Omid Tayefeh Ghalehbeygi ◽  
Vural Kara ◽  
Levent Trabzon ◽  
Selcuk Akturk ◽  
Huseyin Kizil
Keyword(s):  
Laser Ablation ◽  
Femtosecond Laser ◽  
Laser Beam ◽  
Chemical Etching ◽  
Silicon Surface ◽  
Laser Pulses ◽  
Laser Beam Profile ◽  
Fs Laser ◽  
Fabrication And Characterization

We fabricated Si Nano-columns by a femtosecond laser with various wavelengths and process parameters, whilst the specimen was submerged in water. The experiments were carried out by three types of wavelengths i.e. 1030 nm, 515nm, 343nm, with 500 fs laser pulses. The scales of these spikes are much smaller than micro spikes that are constructed by laser irradiation of silicon surface in vacuum or gases like SF6, Cl2. The Si nano-columns of 300 nm or less in width were characterized by SEM measurements. The formation of these Si Nano-columns that were revealed by SEM observation, indicates chemical etching with laser ablation occurred when surface exposed by laser beam. We observed 200 nm spikes height at the center of laser beam profile and the ones uniform in height at lateral incident area.

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