scholarly journals Microstructure and Mechanical Properties of Annealed WC/C PECVD Coatings Deposited Using Hexacarbonyl of W with Different Gases

Materials ◽  
2020 ◽  
Vol 13 (16) ◽  
pp. 3576 ◽  
Author(s):  
Peter Horňák ◽  
Daniel Kottfer ◽  
Karol Kyzioł ◽  
Marianna Trebuňová ◽  
Janka Majerníková ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Chemical Vapor Deposition ◽  
Tungsten Carbide ◽  
Coefficient Of Friction ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Mechanical And Tribological Properties ◽  
Annealing Temperatures ◽  
Different Gases

The present work studies the tungsten carbide (WC/C) coatings deposited by using Plasma Enhanced Chemical Vapor Deposition (PECVD), with and without gases of Ar and N2. Volatile hexacarbonyl of W was used as a precursor. Their mechanical and tribological properties were evaluated. The following values were obtained by using deposition process with N2 of HIT = 19.7 ± 4.1 GPa, EIT = 221 ± 2.1 GPa, and coefficient of friction (COF) = 0.35 ± 0.09. Secondly, deposition without the aforementioned gas obtained values of HIT = 20.9 ± 2 GPa, EIT = 292 ± 20 GPa, and COF = 0.69 ± 0.05. WC/C coatings were annealed at temperatures of 200, 500, and 800 °C, respectively. Evaluated factors include the introduced properties, the observed morphology, and the structural composition of WC/C coatings. The process of degradation was carried out by using various velocities, depending on used gases and annealing temperatures.

scholarly journals The Effect of Annealing Temperatures on Selected Properties of WC/C Coatings, Deposited Using Hexacarbonyl Wolfram in an N2-SiH4 Atmosphere

Materials ◽  
2021 ◽  
Vol 14 (16) ◽  
pp. 4658
Author(s):  
Peter Horňák ◽  
Daniel Kottfer ◽  
Karol Kyzioł ◽  
Marianna Trebuňová ◽  
Mária Kaňuchová ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Experimental Study ◽  
Chemical Vapor Deposition ◽  
Chemical Composition ◽  
Coefficient Of Friction ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Protective Atmosphere ◽  
Annealing Temperatures ◽  
The Coefficient Of Friction

In this paper, we present the results of an experimental study on WC/C coatings, deposited by using plasma-enhanced chemical vapor deposition in an N2-SiH4 atmosphere, annealed at temperatures of 200, 500 and 800 °C, in which the hexacarbonyl of W was used as a precursor. During the experiments, the topography, chemical composition, morphology, as well as selected mechanical properties, such as hardness, Young’s modulus, and coefficient of friction of the WC/C coatings were analyzed. Annealing without the protective atmosphere in the mentioned temperatures caused a decrease in hardness (up to 15 ± 2.7 GPa). In addition, the coefficient of friction value increased only to 0.37 ± 0.03.

Fabrication and mechanical properties of tungsten carbide thin films via mist chemical vapor deposition

2020 ◽  
Vol 829 ◽  
pp. 154567 ◽  
Author(s):  
Takumi Ikenoue ◽  
Takuji Yoshida ◽  
Masao Miyake ◽  
Ryuta Kasada ◽  
Tetsuji Hirato
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Chemical Vapor Deposition ◽  
Tungsten Carbide ◽  
Vapor Deposition ◽  
Chemical Vapor

Study of SiC’s Mechanical Property Variance Caused by Film Thickness

2015 ◽  
Vol 645-646 ◽  
pp. 400-404
Author(s):  
Zong Lei Jiao ◽  
Jian Zhu
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Mechanical Properties ◽  
Mechanical Property ◽  
Chemical Vapor Deposition ◽  
Elastic Modulus ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Indentation Load

The mechanical properties of SiC thin films deposited by chemical vapor deposition process on silicon substrate are studied using nanoindentation techniques. The SiC thin films are of three different thicknesses: 1.6μm、4.5μm、9μm. In this study, nanoindentation method is preferred due to its reliability and accuracy on determining mechanical properties from indentation load-displacement data. The mechanical properties of elastic modulus and hardness are characterized. 1.6μm SiC thin film has the following values: E=345.73Gpa, H=33.71Gpa; 4.5μm SiC thin film has the following values: E=170.18Gpa, H=10.33Gpa; 9μm SiC thin film: E=167.96Gpa, H=9.48Gpa

High Band Gap Nanocrystalline Tungsten Carbide (nc-WC) Thin Films Grown by Hot Wire Chemical Vapor Deposition (HW-CVD) Method

2018 ◽  
Vol 10 (3) ◽  
pp. 03001-1-03001-6 ◽  
Author(s):  
Bharat Gabhale ◽  
◽  
Ashok Jadhawar ◽  
Ajinkya Bhorde ◽  
Shruthi Nair ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Tungsten Carbide ◽  
Band Gap ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Hot Wire ◽  
Cvd Method ◽  
High Band

scholarly journals A reactive molecular dynamics study on the mechanical properties of a recently synthesized amorphous carbon monolayer converted into a nanotube/nanoscroll

2021 ◽  
Author(s):  
Marcelo Lopes Pereira Junior ◽  
Wiliam Ferreira da Cunha ◽  
Douglas Soares Galvão ◽  
Luiz Antonio Ribeiro Junior
Keyword(s):  
Mechanical Properties ◽  
Molecular Dynamics ◽  
Chemical Vapor Deposition ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Free Standing ◽  
Reactive Molecular Dynamics

Recently, laser-assisted chemical vapor deposition has been used to synthesize a free-standing, continuous, and stable monolayer amorphous carbon (MAC).

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