scholarly journals Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation of E. Coli and S. Aureus Biofilms

Materials ◽  
2020 ◽  
Vol 13 (14) ◽  
pp. 3166
Author(s):  
Tsegaye Gashaw Getnet ◽  
Gabriela F. da Silva ◽  
Iolanda S. Duarte ◽  
Milton E. Kayama ◽  
Elidiane C. Rangel ◽  
...  
Keyword(s):  
Thin Films ◽  
Stainless Steel ◽  
Atmospheric Pressure Plasma ◽  
Chemical Vapor ◽  
Dbd Plasma ◽  
Plasma Chemical Vapor Deposition ◽  
E Coli ◽  
Angle Measurements ◽  
Contact Angle Measurements ◽  
Bacteria Adhesion

In this paper, we have investigated the deposition of thin films from natural carvacrol extract using dielectric barrier discharge (DBD) plasma polymerization, aiming at the inhibition of bacteria adhesion and proliferation. The films deposited on stainless steel samples have been characterized by scanning electron microscopy, infrared reflectance-absorbance spectroscopy, profilometry, and contact angle measurements. Films with thicknesses ranging from 1.5 μm to 3.5 μm presented a chemical structure similar to that of carvacrol. While the formation of biofilm was observed on untreated samples, the coating completely inhibited the adhesion of E. coli and reduced the adhesion of S. aureus biofilm in more than 90%.

Preparation of Magnesia Stabilized Zirconia Thin Films for Solid Oxide Fuel Cell by Microwave Plasma Chemical Vapor Deposition.

Shinku ◽  
1997 ◽  
Vol 40 (8) ◽  
pp. 660-663
Author(s):  
Hideo OKAYAMA ◽  
Tsukasa KUBO ◽  
Noritaka MOCHIZUKI ◽  
Akiyoshi NAGATA ◽  
Hiromu ISA
Keyword(s):  
Thin Films ◽  
Fuel Cell ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Solid Oxide ◽  
Oxide Fuel ◽  
Stabilized Zirconia ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition

NITROGEN INCORPORATED HYDROGENATED AMORPHOUS CARBON THIN FILMS DEPOSITED BY MICROWAVE SURFACE-WAVE PLASMA CHEMICAL VAPOR DEPOSITION

2009 ◽  
Vol 23 (09) ◽  
pp. 2159-2165 ◽  
Author(s):  
SUDIP ADHIKARI ◽  
MASAYOSHI UMENO
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Surface Wave ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Hydrogenated Amorphous Carbon ◽  
Plasma Chemical Vapor Deposition ◽  
Hydrogenated Amorphous

Nitrogen incorporated hydrogenated amorphous carbon (a-C:N:H) thin films have been deposited by microwave surface-wave plasma chemical vapor deposition on silicon and quartz substrates, using helium, methane and nitrogen ( N 2) as plasma source. The deposited a-C:N:H films were characterized by their optical, structural and electrical properties through UV/VIS/NIR spectroscopy, Raman spectroscopy, atomic force microscope and current-voltage characteristics. The optical band gap decreased gently from 3.0 eV to 2.5 eV with increasing N 2 concentration in the films. The a-C:N:H film shows significantly higher electrical conductivity compared to that of N 2-free a-C:H film.

Surface Wettability Enhances Osteoblast Adhesion on Silicon-Substituted Hydroxyapatite Thin Films

2007 ◽  
Vol 330-332 ◽  
pp. 877-880 ◽  
Author(s):  
E.S. Thian ◽  
J. Huang ◽  
Serena Best ◽  
Zoe H. Barber ◽  
William Bonfield
Keyword(s):  
Thin Films ◽  
Contact Angle ◽  
Actin Filaments ◽  
Culture Study ◽  
Cell Culture Study ◽  
Angle Measurements ◽  
Contact Angle Measurements ◽  
Osteoblast Adhesion ◽  
Lower Contact

Crystalline hydroxyapatite (HA) and 0.8 wt.% silicon-substituted HA (SiHA) thin films were produced using magnetron co-sputtering. These films were subjected to contact angle measurements and in vitro cell culture study using human osteoblast-like (HOB) cells. A wettability study showed that SiHA has a lower contact angle, and thus is more hydrophilic in nature, as compared to HA. Consequently, enhanced cell growth was observed on SiHA at all time-points. Furthermore, distinct and well-developed actin filaments could be seen within HOB cells on SiHA. Thus, this work demonstrated that the surface properties of the coating may be modified by the substitution of Si into the HA structure.

Crystalline carbon nitride thin films deposited by microwave plasma chemical vapor deposition

2000 ◽  
Vol 9 (7) ◽  
pp. 545-549
Author(s):  
Zhang Yong-ping ◽  
Gu You-song ◽  
Chang Xiang-rong ◽  
Tian Zhong-zhuo ◽  
Shi Dong-xia ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Carbon Nitride ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition

scholarly journals Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
R. Lukose ◽  
M. Lisker ◽  
F. Akhtar ◽  
M. Fraschke ◽  
T. Grabolla ◽  
...  
Keyword(s):  
Large Scale ◽  
Oxygen Plasma ◽  
Chemical Vapor ◽  
Limiting Factors ◽  
Adhesion Properties ◽  
Si Substrates ◽  
Wetting Contact Angle ◽  
Angle Measurements ◽  
Chemical Vapor Deposited ◽  
Contact Angle Measurements

AbstractOne of the limiting factors of graphene integration into electronic, photonic, or sensing devices is the unavailability of large-scale graphene directly grown on the isolators. Therefore, it is necessary to transfer graphene from the donor growth wafers onto the isolating target wafers. In the present research, graphene was transferred from the chemical vapor deposited 200 mm Germanium/Silicon (Ge/Si) wafers onto isolating (SiO2/Si and Si3N4/Si) wafers by electrochemical delamination procedure, employing poly(methylmethacrylate) as an intermediate support layer. In order to influence the adhesion properties of graphene, the wettability properties of the target substrates were investigated in this study. To increase the adhesion of the graphene on the isolating surfaces, they were pre-treated with oxygen plasma prior the transfer process of graphene. The wetting contact angle measurements revealed the increase of the hydrophilicity after surface interaction with oxygen plasma, leading to improved adhesion of the graphene on 200 mm target wafers and possible proof-of-concept development of graphene-based devices in standard Si technologies.

Zwitterionic molecule layer for inhibiting microbial corrosion of copper alloy

2018 ◽  
Vol 65 (1) ◽  
pp. 46-52
Author(s):  
Fengling Xu ◽  
Zhenghui Qiu ◽  
Ri Qiu ◽  
Jiadong Yang ◽  
Cunguo Lin
Keyword(s):  
Electrochemical Impedance ◽  
Chemical Vapor ◽  
Attenuated Total Reflectance ◽  
Microbial Corrosion ◽  
Content Type ◽  
Sulfate Reducing ◽  
Angle Measurements ◽  
Static Contact ◽  
Contact Angle Measurements ◽  
Reducing Bacteria

Purpose For mitigating biocorrosion induced by sulfate-reducing bacteria (SRB) in seawater, the zwitterionic molecule layer (ZML) of poly (sulfobetaine methacrylate) is grafted onto B10 surface by chemical vapor deposition and surface-initiated atom transfer radical polymerization. Design/methodology/approach Energy-dispersive spectroscopy-attenuated total reflectance Fourier transform infrared spectroscopy and static contact angle measurements are used to characterize the as-formed layer. Findings After surface modification, B10 can significantly reduce SRB adhesion, demonstrating the good antifouling property. Further, the biocorrosion inhibition is investigated by potentiodynamic polarization and electrochemical impedance spectroscopy, indicating that ZML exhibits high resistance to biocorrosion with inhibition efficiency of approximately 90 per cent. Originality/value ZML performs a dual feature, i.e. antifouling film and corrosion inhibitor, for the biocorrosion inhibition.

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