scholarly journals Deposition of Thin Alumina Films Containing 3D Ordered Network of Nanopores on Porous Substrates

Materials ◽  
2020 ◽  
Vol 13 (13) ◽  
pp. 2883
Author(s):  
Marija Tkalčević ◽  
Marijan Gotić ◽  
Lovro Basioli ◽  
Martina Lihter ◽  
Goran Dražić ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Film Thickness ◽  
Annealing Process ◽  
Tetragonal Structure ◽  
Alumina Matrix ◽  
Sputtering Deposition ◽  
Network Nodes ◽  
Alumina Films ◽  
Porous Substrates

Self-supporting thin films containing nanopores are very promising materials for use for multiple applications, especially in nanofiltration. Here, we present a method for the production of nanomembranes containing a 3D ordered network of nanopores in an alumina matrix, with a diameter of about 1 nm and a body centered tetragonal structure of the network nodes. The material is produced by the magnetron sputtering deposition of a 3D ordered network of Ge nanowires in an alumina matrix, followed by a specific annealing process resulting in the evaporation of Ge. We demonstrate that the films can be easily grown on commercially available alumina substrates containing larger pores with diameters between 20 and 400 nm. We have determined the minimal film thickness needed to entirely cover the larger pores. We believe that these films have the potential for applications in the fields of filtration, separation and sensing.

High Performance Metal Surface Coating Using Ta2O5 Thin Film Prepared by D.C. Magnetron Sputtering

2014 ◽  
Vol 979 ◽  
pp. 240-243
Author(s):  
Narathon Khemasiri ◽  
Chanunthorn Chananonnawathorn ◽  
Mati Horprathum ◽  
Pitak Eiamchai ◽  
Pongpan Chindaudom ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Film Thickness ◽  
Metal Surface ◽  
High Performance ◽  
Grazing Incidence ◽  
Surface Finishing ◽  
Afm Micrographs ◽  
Protective Performance

Tantalum oxide (Ta2O5) thin films were deposited as the protective layers for the metal surface finishing by the DC reactive magnetron sputtering system. The effect of the Ta2O5 film thickness, ranging from 25 nm to 200 nm, on the physical properties and the anti-corrosive performance were investigated. The grazing-incidence X-ray diffraction (GIXRD) and the atomic force microscopy (AFM) were used to examine the crystal structures and the surface topologies of the prepared films, respectively. The XRD results showed that the Ta2O5 thin films were all amorphous. The AFM micrographs demonstrated the film morphology with quite smooth surface features. The surface roughness tended to be rough when the film thickness was increased. To examine the protective performance of the films, the poteniostat and galvanometer was utilized to examine the electrochemical activities with the 1M NaCl as the corrosive electrolyte. The results from the I-V polarization curves (Tafel slope) indicated that, with the Ta2O5 thin film, the current density was significantly reduced by 3 orders of magnitude when compared with the blank sample. Such results were observed because of fully encapsulated surface of the samples were covered with the sputtered Ta2O5 thin films. The study also showed that the Ta2O5 thin film deposited at 50 nm yielded the most extreme protective performance. The Ta2O5 thin films therefore could be optimized for the smallest film thickness for highly potential role in the protective performance of the metal surface finishing products.

Non-epitaxial, Highly Textured (001) CoPt:B2O3 Composite Films for Perpendicular Recording

2002 ◽  
Vol 721 ◽  
Author(s):  
M. L. Yan ◽  
N. Powers ◽  
D. J. Sellmyer
Keyword(s):  
Thin Films ◽  
Film Thickness ◽  
Epitaxial Growth ◽  
Thermal Processing ◽  
Composite Films ◽  
Annealing Process ◽  
Perpendicular Anisotropy ◽  
Perpendicular Recording ◽  
Nanocomposite Thin Films ◽  
Deposited Films

AbstractWe report the non-epitaxial growth of highly textured (001) CoPt:B2O3 nanocomposite thin films that are deposited directly on thermally-oxidized Si wafers. Multilayers of Co/Pt/Co/B2O3 are deposited followed by appropriate thermal processing. The as-deposited films are disordered fcc CoPt phase, and magnetically soft. After annealing, an (001) orientation of CoPt-ordered grains is developed. The texture development is dependent both on the total film thickness and the annealing process. Nearly perfect (001) texture can be obtained in films with thinner initial layer thicknesses. Strong perpendicular anisotropy is shown to be related to this (001) texture.

MICROSTRUCTURES OF SPUTTERED ORIENTED Si/CeO2 BILAYERs YBa2Cu3O7-δ/Si INTEGRATED MICROELECTRONICS

2003 ◽  
Vol 17 (04n06) ◽  
pp. 848-854 ◽  
Author(s):  
A. CHIODONI ◽  
E. MEZZETTI ◽  
D. BOTTA ◽  
L. GOZZELINO ◽  
B. MINETTI ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Cerium Dioxide ◽  
Buffer Layers ◽  
X Ray Diffraction ◽  
Sputtering Deposition ◽  
X Ray ◽  
Integrated Electronics ◽  
Lattice Matching ◽  
Deposition Techniques

In the framework of a research aimed to superconductor/semiconductor integrated electronics, we have grown a-axis oriented YBa 2 Cu 3 O 7-δ (YBCO) thin films on silicon (100) substrates with (111) oriented insulating buffer layers of cerium dioxide ( CeO 2), using magnetron sputtering deposition techniques. The properties of the cerium dioxide layer have been preliminary optimized by means of several layout and by monitoring the growing procedures through X-ray diffraction, AFM and TEM techniques. The lattice matching between CeO 2 and YBCO resulted to be worsened by an amorphous thin SiO 2 layer at the Si/CeO 2 interface, that decouples the buffer orientation from the seed orientation. However, it was possible to grow a relatively thick, optimally textured layer of CeO 2 without spurious orientations. The YBCO films deposited on top of this layer result preferentially a-axis oriented. The transition widths are very large, jet well controllable and reproducible. Some technological applications can be already envisaged.

Interface Stress of Oxide Thin Films Produced by DC Pulse Magnetron Sputtering Deposition

2010 ◽  
Author(s):  
Kun-Hsien Lee ◽  
Chia-Chen Lee ◽  
Chien-Jen Tang ◽  
Cheng-Chung Jaing ◽  
His-Chao Chen ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Interface Stress ◽  
Oxide Thin Films ◽  
Sputtering Deposition ◽  
Pulse Magnetron
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