Non-epitaxial, Highly Textured (001) CoPt:B2O3 Composite Films for Perpendicular Recording

2002 ◽  
Vol 721 ◽  
Author(s):  
M. L. Yan ◽  
N. Powers ◽  
D. J. Sellmyer
Keyword(s):  
Thin Films ◽  
Film Thickness ◽  
Epitaxial Growth ◽  
Thermal Processing ◽  
Composite Films ◽  
Annealing Process ◽  
Perpendicular Anisotropy ◽  
Perpendicular Recording ◽  
Nanocomposite Thin Films ◽  
Deposited Films

AbstractWe report the non-epitaxial growth of highly textured (001) CoPt:B2O3 nanocomposite thin films that are deposited directly on thermally-oxidized Si wafers. Multilayers of Co/Pt/Co/B2O3 are deposited followed by appropriate thermal processing. The as-deposited films are disordered fcc CoPt phase, and magnetically soft. After annealing, an (001) orientation of CoPt-ordered grains is developed. The texture development is dependent both on the total film thickness and the annealing process. Nearly perfect (001) texture can be obtained in films with thinner initial layer thicknesses. Strong perpendicular anisotropy is shown to be related to this (001) texture.

Effect of Al Sputtering Current on Structure of CrAlN Thin Films Prepared by Reactive DC Magnetron Co-Sputtering

2017 ◽  
Vol 866 ◽  
pp. 322-325
Author(s):  
Amonrat Khambun ◽  
Adisorn Buranawong ◽  
Nirun Witit-Anun
Keyword(s):  
Crystal Structure ◽  
Thin Films ◽  
Solid Solution ◽  
Film Thickness ◽  
Elemental Composition ◽  
Cross Section ◽  
Amorphous Structure ◽  
Film Hardness ◽  
Deposited Films ◽  
Simultaneous Evolution

Chromium aluminium nitride (CrAlN) thin films were deposited on Si by reactive DC magnetron co-sputtering technique. The effect of Al sputtering current (IAl) on the crystal structure, elemental composition, thickness, microstructure and hardness were determined by XRD, EDS, AFM and FE-SEM and Nanoindentation, respectively. The results showed that, the as-deposited films were formed as a (Cr,Al)N solid solution with low Al sputtering current, whereas the amorphous structure can be found at high Al sputtering current. The film thickness and roughness was in range of 347 - 1047 nm and 1.45 - 3.37 nm, respectively. The elemental composition of the films varied with the Al sputtering current. The FE-SEM results indicated that the simultaneous evolution in grain refinement with cross-section microstructure through the Al sputtering current. The film hardness increased from 36 GPa to 46 GPa with increasing of Al contents.

Fabrication of CoFe/BaFe12O19 Magnetic Nanocomposite Thin Films by Electrodeposition

2013 ◽  
Vol 829 ◽  
pp. 332-336
Author(s):  
Soheila Kharratian Khameneh ◽  
M. Heydarzadeh Sohi ◽  
Abolghasem Ataie ◽  
Saeed Mehrizi
Keyword(s):  
Thin Films ◽  
Barium Hexaferrite ◽  
Average Crystallite Size ◽  
Xrd Analysis ◽  
Molar Ratio ◽  
X Ray Diffraction ◽  
Nanocomposite Thin Films ◽  
Co Precipitation ◽  
Deposited Films ◽  
Dominant Phase

A study of the incorporation of barium hexaferrite nanoparticles into a CoFe matrix by means of electrodeposition over brass substrates has been performed. Barium hexaferrite nanoparticles were prepared by co-precipitation route using solution of iron and barium nitrates with a Fe3+/Ba2+molar ratio of 8, by addition of NaOH with a OH-/NO3- molar ratio of 2. X-ray diffraction (XRD) results indicated that in a sample synthesized from aqueous solution and annealed at 900 °C for 1 hour, BaFe12O19 was the dominant phase. Field emission scanning electron microscopy (FE-SEM) showed plate-like particles of barium hexaferrite by mean diameter of 300 nm and thickness of 45 nm. CoFe-BaFe12O19 nanocomposite thin films were then electrodeposited froma Co-Fe bath containing the barium hexaferrite particles obtained in the first stage of this work. Finally, FE-SEM equipped with energy dispersive spectroscopy (EDS) analyzer and XRD analysis was applied on the deposited films, to confirm presence of the nanoparticles in the film. The average crystallite size of the deposits was around 30 nm. It was also noticed that increasing the concentration of the particles in the electroplating bath, caused a rise in the BaFe12O19 content of the deposits but had no significant effect on the composition of the CoFe matrix.

Self-assembled multiferroic perovskite–spinel nanocomposite thin films: epitaxial growth, templating and integration on silicon

2019 ◽  
Vol 7 (30) ◽  
pp. 9128-9148 ◽  
Author(s):  
Dong Hun Kim ◽  
Shuai Ning ◽  
Caroline A. Ross
Keyword(s):  
Thin Films ◽  
Epitaxial Growth ◽  
Recent Progress ◽  
Low Cost ◽  
Large Area ◽  
Nanocomposite Thin Films ◽  
Self Assembled

The recent progress on self-assembled epitaxial nanocomposites on silicon or templated substrates for low cost and large area devices.

Isothermal Physical Aging of Poly(ethyl methacrylate)/Polyhedral Oligomeric Silsequioxanes Nanocomposite Thin Films

2011 ◽  
Vol 287-290 ◽  
pp. 2234-2239 ◽  
Author(s):  
Sil Ro Jin ◽  
Jong Keun Lee
Keyword(s):  
Thin Films ◽  
Glass Transition ◽  
Transition Temperature ◽  
Glass Transition Temperature ◽  
Film Thickness ◽  
Methyl Methacrylate ◽  
Relaxation Function ◽  
Physical Aging ◽  
Pmma Film ◽  
Nanocomposite Thin Films

The effects of the polyhedral oligomeric silsequioxanes (POSS) in stacked poly(methyl methacrylate) (PMMA) film samples were investigated in two different film thicknesses, ~50 and ~660 nm. The types of the POSS include methacryl-, octaisobutyl-, and octasilane-POSS. The glass transition temperature (Tg) and isothermal physical aging was depressed by the reduction of film thickness. Among POSS molecules used in this work, methacryl-POSS was the greatest effect in both Tgand relaxation enthalpy (DHRelax) due to the physical aging. The Kohlrausch-Williams-Watts (KWW) relaxation function was used to further understand the effect of POSS and film thickness on the physical aging.

SPECTROSCOPIC STUDIES ON Ag/PVA NANOCOMPOSITE THIN FILMS PREPARED BY THERMAL ANNEALING PROCESS

2011 ◽  
Vol 10 (03) ◽  
pp. 427-432 ◽  
Author(s):  
RAJIB SAIKIA ◽  
P. GOGOI ◽  
P. K. BARUA ◽  
PRANAYEE DATTA
Keyword(s):  
Thin Films ◽  
Thermal Annealing ◽  
Spectroscopic Analysis ◽  
Spectroscopic Studies ◽  
Annealing Process ◽  
Localized Surface Plasmon ◽  
Particle Sizes ◽  
Spectral Position ◽  
Nanocomposite Thin Films ◽  
Thermal Annealing Process

In this paper, a systematic spectroscopic analysis on silver–polyvinyl alcohol ( Ag /PVA) nanocomposite thin films is reported. Ag /PVA nanocomposite thin films fabricated by thermal annealing process are shown to exhibit a strong localized surface plasmon resonance (LSPR) at wavelength around 400 nm. The effects of different fabricating parameters on the absorbance and spectral position of LSPR are also investigated. The particle sizes calculated from Mie light scattering theory are found to agree with the values obtained from SEM characterization.

scholarly journals Characterization of Thermally Evaporated Ag-Ge-S Thin Films

2008 ◽  
Vol 1072 ◽  
Author(s):  
Fei Wang ◽  
William Porter Dunn ◽  
Mukul Jain ◽  
Carter De Leo ◽  
Nicholas Vicker ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Raman Spectroscopy ◽  
Film Thickness ◽  
Raman Line ◽  
Line Shapes ◽  
Thermal Evaporator ◽  
Bulk Glasses ◽  
Deposited Films

ABSTRACTThin films of ternary (GeS3)1−xAgx glasses (x=0.1 and 0.2) are studied in this work. Thin films are fabricated in a vacuum thermal evaporator at 3 different evaporation angles (0°, 30° and 45°). All thin film samples are examined in Raman spectroscopy. Raman results of both normally and obliquely deposited thin film samples reveal Ge-S CS modes (∼340cm−1) , Ge-S ES (∼360cm−1) modes, and thiogermanate modes Q1∼Q3 (390cm−1∼437cm−1). In addition, sharp peaks due to sulfur rings (S8) are observed at 218cm−1 and 470cm−1. Raman line-shapes of thin films are qualitatively consistent with their corresponding bulk glasses. However, the sharp peaks due to sulfur rings were not observed in bulk glasses. By comparing CS modes of thin films of three angles, we observe that normally deposited (0 degree) thin film shows a red-shift in center and a broadening in width. The film thickness of normally deposited films are significantly smaller comparing with that of corresponding obliquely deposited films.

Effects of Rapid Thermal Process on the Microstructural, Electrical and Optical Properties of AZO Thin Films

2013 ◽  
Vol 441 ◽  
pp. 11-14
Author(s):  
Rong Bin Liu ◽  
Kai Liang Zhang ◽  
Yu Jie Yuan ◽  
Fang Wang ◽  
Juan Xu
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Thermal Processing ◽  
Rf Magnetron Sputtering ◽  
Processing Temperature ◽  
Rapid Thermal Process ◽  
Electrical And Optical Properties ◽  
Pure Nitrogen ◽  
Glass Substrates ◽  
Deposited Films

In this paper, Al-doped ZnO thin films were deposited on glass substrates by RF magnetron sputtering and subsequently rapid thermal processing was executed under temperature range from 300°C to 600°C in order to investigate the microstructure, electrical, and optical properties of AZO films. XRD and AFM microscopy results showed that all the samples were of poly-crystalline and the grain size became larger with the increasing processing temperature. Compared with the sample as-deposited, it was shown that resistivity decreased from 1.9×10-2 to 1.48×10-3Ωcm and carrier concentration increased from 1.48×1020 to 5.59×1020 cm3 when the sample was processed at 600°C in pure nitrogen for 1 min. The highest transmittance of the samples processed at 500°C improves to 90.35% compared with the as-deposited films (68.2% ) as the wavelength varied between 400 and 900 nm.

Transition of the exchange bias effect from in-plane to out-of-plane in La0.7Sr0.3MnO3:NiO nanocomposite thin films

2019 ◽  
Vol 7 (20) ◽  
pp. 6091-6098 ◽  
Author(s):  
Ying Jie Wu ◽  
Zhan Jie Wang ◽  
Yu Bai ◽  
Yong Mei Liang ◽  
Xing Kun Ning ◽  
...  
Keyword(s):  
Thin Films ◽  
Exchange Bias ◽  
Composite Films ◽  
Bias Effect ◽  
Exchange Bias Effect ◽  
Nanocomposite Thin Films ◽  
Out Of Plane

The exchange bias effect of LSMO:NiO composite films transforms from in-plane to out-of-plane with the control of the microstructure.

scholarly journals Deposition of Thin Alumina Films Containing 3D Ordered Network of Nanopores on Porous Substrates

Materials ◽  
2020 ◽  
Vol 13 (13) ◽  
pp. 2883
Author(s):  
Marija Tkalčević ◽  
Marijan Gotić ◽  
Lovro Basioli ◽  
Martina Lihter ◽  
Goran Dražić ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Film Thickness ◽  
Annealing Process ◽  
Tetragonal Structure ◽  
Alumina Matrix ◽  
Sputtering Deposition ◽  
Network Nodes ◽  
Alumina Films ◽  
Porous Substrates

Self-supporting thin films containing nanopores are very promising materials for use for multiple applications, especially in nanofiltration. Here, we present a method for the production of nanomembranes containing a 3D ordered network of nanopores in an alumina matrix, with a diameter of about 1 nm and a body centered tetragonal structure of the network nodes. The material is produced by the magnetron sputtering deposition of a 3D ordered network of Ge nanowires in an alumina matrix, followed by a specific annealing process resulting in the evaporation of Ge. We demonstrate that the films can be easily grown on commercially available alumina substrates containing larger pores with diameters between 20 and 400 nm. We have determined the minimal film thickness needed to entirely cover the larger pores. We believe that these films have the potential for applications in the fields of filtration, separation and sensing.

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