scholarly journals Effect of Target Composition and Sputtering Deposition Parameters on the Functional Properties of Nitrogenized Ag-Permalloy Flexible Thin Films Deposited on Polymer Substrates

Materials ◽  
2018 ◽  
Vol 11 (3) ◽  
pp. 439 ◽  
Author(s):  
Waheed Khan ◽  
Qun Wang ◽  
Xin Jin
Keyword(s):  
Thin Films ◽  
Functional Properties ◽  
Polymer Substrates ◽  
Sputtering Deposition ◽  
Target Composition ◽  
Deposition Parameters

Synthesis and Characterization of Amorphous Metallic Alloy Thin Films for MEMS Applications

2003 ◽  
Vol 806 ◽  
Author(s):  
Senthil N Sambandam ◽  
Shekhar Bhansali ◽  
Venkat R. Bhethanabotla
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Surface Morphology ◽  
X Ray Diffraction ◽  
Micro Electro Mechanical Systems ◽  
Force Microscopy ◽  
Target Composition ◽  
Atomic Force ◽  
Deposition Parameters ◽  
Afm Analysis

ABSTRACTMicrostructures of multi-component amorphous metallic glass alloys are becoming increasingly important due to their excellent mechanical properties and low coefficient of friction. In this work, thin films of Zr-Ti-Cu-Ni-Be have been deposited by DC magnetron sputtering in view of exploring their potential technological applications in fields such as Micro Electro Mechanical Systems (MEMS). Their structure, composition, surface morphology, mechanical properties viz., hardness and Young's modulus were analyzed using X-Ray Diffraction (XRD), Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM) and Nanoindentation. Influence of the deposition parameters of sputtering pressure and power upon the composition and surface morphology of these films has been evidenced by SEM, and AFM analysis, showing that such a process yields very smooth films with target composition at low sputtering pressures. These studies are useful in understanding the multicomponent sputtering process.

Influence of ion-beam sputtering deposition parameters on highly photosensitive and transparent CdZnO thin films

2014 ◽  
Vol 49 (20) ◽  
pp. 6917-6929 ◽  
Author(s):  
Shruti Verma ◽  
Sushil Kumar Pandey ◽  
Mukul Gupta ◽  
Shaibal Mukherjee
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Sputtering Deposition ◽  
Deposition Parameters ◽  
Beam Sputtering

Thin films of BiSrCaCu oxide prepared by laser evaporation

1990 ◽  
Vol 5 (2) ◽  
pp. 258-264 ◽  
Author(s):  
J. Perrière ◽  
G. Hauchecorne ◽  
F. Kerhervé ◽  
F. Rochet ◽  
R. M. Defourneau ◽  
...  
Keyword(s):  
Thin Films ◽  
Depth Distribution ◽  
Rutherford Backscattering Spectrometry ◽  
Laser Evaporation ◽  
Superconducting Thin Films ◽  
Resistivity Measurements ◽  
Target Composition ◽  
Annealing Conditions ◽  
Deposition Parameters ◽  
Deposited Films

We have prepared BiSrCaCuO superconducting thin films by the pulsed laser evaporation method, using a YAG or an ArF excimer laser. The as-deposited films, which were enriched in Cu with respect to the bulk target composition Bi2Sr2Ca1Cu2O8 (i.e., the “2212” phase), were converted into the superconducting phase by a subsequent high temperature annealing in oxygen. Resistivity measurements showed superconducting transitions near 90 K, and the highest zero resistivity temperature was 83 K. The influence of the deposition parameters (photon wavelength) and annealing conditions (temperature, duration, and atmosphere) have been studied. The composition and in-depth distribution of the various elements were determined by Rutherford backscattering spectrometry (RBS), and the surface morphology was studied by scanning electron microscopy (SEM).

Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

1991 ◽  
Vol 49 ◽  
pp. 1068-1069
Author(s):  
M. Grant Norton ◽  
C. Barry Carter
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Ablation Process ◽  
Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

scholarly journals Structural, Optical and Electrical Properties of Al+MoO3 and Au+MoO3 Thin Films Prepared by Magnetron Codeposition

Materials ◽  
2021 ◽  
Vol 14 (4) ◽  
pp. 766
Author(s):  
Tihomir Car ◽  
Ivan Jakovac ◽  
Ivana Šarić ◽  
Sigrid Bernstorff ◽  
Maja Micetic
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Au Nanoparticle ◽  
Content Increase ◽  
Optical And Electrical Properties ◽  
Volume Percentage ◽  
Sputtering Deposition ◽  
Nanoparticle Formation ◽  
Al Content ◽  
Sputtering Power

Structural, optical and electrical properties of Al+MoO3 and Au+MoO3 thin films prepared by simultaneous magnetron sputtering deposition were investigated. The influence of MoO3 sputtering power on the Al and Au nanoparticle formation and spatial distribution was explored. We demonstrated the formation of spatially arranged Au nanoparticles in the MoO3 matrix, while Al incorporates in the MoO3 matrix without nanoparticle formation. The dependence of the Au nanoparticle size and arrangement on the MoO3 sputtering power was established. The Al-based films show a decrease of overall absorption with an Al content increase, while the Au-based films have the opposite trend. The transport properties of the investigated films also are completely different. The resistivity of the Al-based films increases with the Al content, while it decreases with the Au content increase. The reason is a different transport mechanism that occurs in the films due to their different structural properties. The choice of the incorporated material (Al or Au) and its volume percentage in the MoO3 matrix enables the design of materials with desirable optical and electrical characteristics for a variety of applications.

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