Preparation of Diamond Like Carbon Films by Hot Cathode Penning Ionization Gauge Discharge Type Plasma-Enhanced Chemical Vapor Deposition Method.

Nobuyuki TERAYAMA; Yuka TATSUMI; Masami NAKASONE

doi:10.3131/jvsj.38.653

Preparation of Diamond Like Carbon Films by Hot Cathode Penning Ionization Gauge Discharge Type Plasma-Enhanced Chemical Vapor Deposition Method.

Shinku ◽

10.3131/jvsj.38.653 ◽

1995 ◽

Vol 38 (7) ◽

pp. 653-656

Author(s):

Nobuyuki TERAYAMA ◽

Yuka TATSUMI ◽

Masami NAKASONE

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Deposition Method ◽

Penning Ionization ◽

Ionization Gauge

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Preparation of Diamond Like Carbon (DLC) Films by Hot Cathode Penning Ionization Gauge Type Plasma-Enhanced Chemical Vapor Deposition Method

Journal of the Vacuum Society of Japan ◽

10.3131/jvsj2.60.85 ◽

2017 ◽

Vol 60 (3) ◽

pp. 85-91 ◽

Cited By ~ 1

Author(s):

Nobuyuki TERAYAMA

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Deposition Method ◽

Penning Ionization ◽

Ionization Gauge

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Electrical conductive hard-carbon (diamond-like carbon) films formed by i-C4H10/N2 supermagnetron plasma chemical vapor deposition method

Thin Solid Films ◽

10.1016/s0040-6090(00)01091-9 ◽

2000 ◽

Vol 373 (1-2) ◽

pp. 251-254 ◽

Cited By ~ 9

Author(s):

Haruhisa Kinoshita ◽

Jun Takahashi ◽

Takuya Hando

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Deposition Method ◽

Hard Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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CSW-14: High-rate Synthesis of Diamond-like Carbon Films by Bipolar Nanopulse Chemical Vapor Deposition Method(CSW-III: COATING, SURFACE MODIFICATION AND WEAR)

The Proceedings of the JSME Materials and Processing Conference (M&P) ◽

10.1299/jsmeintmp.2005.45_5 ◽

2005 ◽

Vol 2005 (0) ◽

pp. 45-46

Author(s):

T. SAITO ◽

Y. KONDO ◽

T. TERAZAWA ◽

N. OHTAKE

Keyword(s):

Surface Modification ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

High Rate ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Deposition Method ◽

Coating Surface

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Fabrication of diamond-like carbon films using pseudo-spark discharge plasma-enhanced chemical vapor deposition method

Japanese Journal of Applied Physics ◽

10.7567/jjap.53.068006 ◽

2014 ◽

Vol 53 (6) ◽

pp. 068006 ◽

Cited By ~ 1

Author(s):

Takaharu Kamada ◽

Yoshitake Sohma ◽

Masayuki Watanabe ◽

Seiji Mukaigawa

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Discharge Plasma ◽

Chemical Vapor ◽

Carbon Films ◽

Spark Discharge ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Deposition Method ◽

Spark Discharge Plasma

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Development ofCH4-Radio-Frequency-Plasma-Enhanced Chemical Vapor Deposition Method with a Positively Self-Biased Electrode for Diamond-Like Carbon Film

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.2817 ◽

1997 ◽

Vol 36 (Part 1, No. 5A) ◽

pp. 2817-2821 ◽

Cited By ~ 6

Author(s):

Hiroshi Inaba ◽

Yuuichi Kokaku ◽

Masatomo Terakado ◽

Hiroyuki Kataoka

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Carbon Film ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Frequency Plasma

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Tensile test of a silicon microstructure fully coated with submicrometer-thick diamond like carbon film using plasma enhanced chemical vapor deposition method

Japanese Journal of Applied Physics ◽

10.7567/jjap.56.06gn01 ◽

2017 ◽

Vol 56 (6S1) ◽

pp. 06GN01 ◽

Cited By ~ 2

Author(s):

Wenlei Zhang ◽

Akio Uesugi ◽

Yoshikazu Hirai ◽

Toshiyuki Tsuchiya ◽

Osamu Tabata

Keyword(s):

Chemical Vapor Deposition ◽

Tensile Test ◽

Vapor Deposition ◽

Carbon Film ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Deposition Method ◽

Diamond Like Carbon Film

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Effects of pulse bias duty cycle on fullerenelike nanostructure and mechanical properties of hydrogenated carbon films prepared by plasma enhanced chemical vapor deposition method

Journal of Applied Physics ◽

10.1063/1.3125528 ◽

2009 ◽

Vol 105 (10) ◽

pp. 106113 ◽

Cited By ~ 20

Author(s):

Li Ji ◽

Hongxuan Li ◽

Fei Zhao ◽

Weilong Quan ◽

Jianmin Chen ◽

...

Keyword(s):

Mechanical Properties ◽

Chemical Vapor Deposition ◽

Duty Cycle ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Chemical Vapor Deposition Method ◽

Deposition Method

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Variations in structure and emission characteristics of nanostructured carbon films prepared by the hot-filament chemical-vapor-deposition method due to the addition of ammonia in the source

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1527644 ◽

2003 ◽

Vol 21 (1) ◽

pp. 576 ◽

Cited By ~ 3

Author(s):

Seungho Choi ◽

Kyung Ho Park ◽

Hyung Jun Han ◽

Kyung Moon Lee ◽

Soonil Lee ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Chemical Vapor Deposition Method ◽

Emission Characteristics ◽

Deposition Method ◽

Nanostructured Carbon ◽

Hot Filament

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Synthesis of carbon nanotubes on diamond-like carbon by the hot filament plasma-enhanced chemical vapor deposition method

Micron ◽

10.1016/j.micron.2009.02.009 ◽

2009 ◽

Vol 40 (5-6) ◽

pp. 612-616 ◽

Cited By ~ 5

Author(s):

Eun Chang Choi ◽

Yong Seob Park ◽

Byungyou Hong

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Deposition Method ◽

Hot Filament ◽

Synthesis Of Carbon Nanotubes ◽

Filament Plasma

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Characterization of diamond-like carbon thin films prepared by a microwave plasma enhanced chemical vapor deposition method

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2003.10.033 ◽

2004 ◽

Vol 180-181 ◽

pp. 254-258 ◽

Cited By ~ 13

Author(s):

Won Seok Choi ◽

Ilsub Chung ◽

Young-Ze Lee ◽

Byungyou Hong

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Deposition Method ◽

Carbon Thin Films

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