scholarly journals Improvement of Silicon Nitride Film Deposition Rate by Low Frequency Double Plasma CVD Methode.

Shinku ◽  
1991 ◽  
Vol 34 (4) ◽  
pp. 427-431
Author(s):  
Mitsuo. SHIMOZUMA ◽  
Jin. MURAKAMI ◽  
Gen. TOCHITANI ◽  
Takashi. TSUJI ◽  
Hiroaki. TAGASHIRA
Keyword(s):  
Silicon Nitride ◽  
Deposition Rate ◽  
Low Frequency ◽  
Film Deposition ◽  
Nitride Film ◽  
Silicon Nitride Film ◽  
Plasma Cvd ◽  
Film Deposition Rate

Silicon nitride film growth by remote plasma CVD using Tris(dimethylamino)silane

Vacuum ◽  
1998 ◽  
Vol 51 (4) ◽  
pp. 747-750 ◽  
Author(s):  
Toru Aoki ◽  
Takuya Ogishima ◽  
Aleksander M Wróbel ◽  
Yoichiro Nakanishi ◽  
Yoshinori Hatanaka
Keyword(s):  
Silicon Nitride ◽  
Film Growth ◽  
Nitride Film ◽  
Silicon Nitride Film ◽  
Plasma Cvd ◽  
Remote Plasma

Silicon Nitride Film Deposition by Photochemical Vapor Deposition Using an Argon Excimer Lamp

2007 ◽  
Vol 46 (6A) ◽  
pp. 3534-3536 ◽  
Author(s):  
Yoshinari Maezono ◽  
Kiyohiko Toshikawa ◽  
Kou Kurosawa ◽  
Kouichi Amari ◽  
Sou Ishimura ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Vapor Deposition ◽  
Film Deposition ◽  
Nitride Film ◽  
Silicon Nitride Film ◽  
Excimer Lamp ◽  
Photochemical Vapor Deposition
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