High-Density Electron Cyclotron Resonance Electric Propulsion

Etched profile distortions in high density electron cyclotron resonance plasma

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.587513 ◽

1994 ◽

Vol 12 (6) ◽

pp. 3363 ◽

Cited By ~ 5

Author(s):

Masahiro Yoneda

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

High Density ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Fluorocarbon radicals and surface reactions in fluorocarbon high density etching plasma. II. H2 addition to electron cyclotron resonance plasma employing CHF3

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580076 ◽

1996 ◽

Vol 14 (4) ◽

pp. 2011-2019 ◽

Cited By ~ 40

Author(s):

Kunimasa Takahashi ◽

Masaru Hori ◽

Toshio Goto

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Surface Reactions ◽

Electron Cyclotron ◽

High Density ◽

Electron Cyclotron Resonance Plasma ◽

H2 Addition ◽

Resonance Plasma

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Characterization of a high-density electron-cyclotron resonance plasma source operating in nitrogen

Review of Scientific Instruments ◽

10.1063/1.1578154 ◽

2003 ◽

Vol 74 (7) ◽

pp. 3279-3283 ◽

Cited By ~ 5

Author(s):

E. I. Toader ◽

A. Fredriksen ◽

A. Aanesland

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

High Density ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Fluorocarbon high density plasma. VI. Reactive ion etching lag model for contact hole silicon dioxide etching in an electron cyclotron resonance plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578850 ◽

1994 ◽

Vol 12 (3) ◽

pp. 665-670 ◽

Cited By ~ 43

Author(s):

O. Joubert ◽

G. S. Oehrlein ◽

M. Surendra

Keyword(s):

Silicon Dioxide ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Reactive Ion Etching ◽

Electron Cyclotron ◽

High Density ◽

Ion Etching ◽

Lag Model ◽

Resonance Plasma ◽

Density Plasma

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Fabrication of diamond films under high density helium plasma formed by electron cyclotron resonance

Metallurgical Coatings and Thin Films 1991 ◽

10.1016/b978-0-444-89455-7.50072-1 ◽

1991 ◽

pp. 374-380

Author(s):

Motokazu Yuasa ◽

Hiroshi Kawarada ◽

Jin Wei ◽

Jing Sheng Ma ◽

Jun-ichi Suzuki ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Diamond Films ◽

Electron Cyclotron ◽

High Density ◽

Helium Plasma

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Etching of polysilicon in a high-density electron cyclotron resonance plasma with collimated magnetic field

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.585860 ◽

1992 ◽

Vol 10 (4) ◽

pp. 1312 ◽

Cited By ~ 6

Author(s):

D. Dane

Keyword(s):

Magnetic Field ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

High Density ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Compact electron cyclotron resonance ion source with high density plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577348 ◽

1991 ◽

Vol 9 (3) ◽

pp. 707-710 ◽

Cited By ~ 11

Author(s):

Masaru Shimada ◽

Iwao Watanabe ◽

Yasuhiro Torii

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Ion Source ◽

Electron Cyclotron ◽

High Density ◽

Density Plasma

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Fluorocarbon high density plasmas. VIII. Study of the ion flux composition at the substrate in electron cyclotron resonance etching processes using fluorocarbon gases

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579310 ◽

1994 ◽

Vol 12 (4) ◽

pp. 1287-1292 ◽

Cited By ~ 11

Author(s):

Karen H. R. Kirmse ◽

Amy E. Wendt ◽

Gottlieb S. Oehrlein ◽

Ying Zhang

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Ion Flux ◽

High Density ◽

Flux Composition

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Fluorocarbon high density plasma. V. Influence of aspect ratio on the etch rate of silicon dioxide in an electron cyclotron resonance plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578849 ◽

1994 ◽

Vol 12 (3) ◽

pp. 658-664 ◽

Cited By ~ 50

Author(s):

O. Joubert ◽

G. S. Oehrlein ◽

Y. Zhang

Keyword(s):

Aspect Ratio ◽

Silicon Dioxide ◽

Cyclotron Resonance ◽

Etch Rate ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

High Density ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma ◽

Density Plasma

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E‐plane horn excitation of slow wave structures for obtaining high‐density electron cyclotron resonance plasmas

Review of Scientific Instruments ◽

10.1063/1.1143308 ◽

1992 ◽

Vol 63 (3) ◽

pp. 1939-1944 ◽

Cited By ~ 5

Author(s):

R. Baskaran ◽

S. K. Jain ◽

S. S. Ramamurthi

Keyword(s):

Slow Wave ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

High Density

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