Fluorocarbon high density plasmas. VIII. Study of the ion flux composition at the substrate in electron cyclotron resonance etching processes using fluorocarbon gases

Karen H. R. Kirmse; Amy E. Wendt; Gottlieb S. Oehrlein; Ying Zhang

doi:10.1116/1.579310

Fluorocarbon high density plasmas. VIII. Study of the ion flux composition at the substrate in electron cyclotron resonance etching processes using fluorocarbon gases

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579310 ◽

1994 ◽

Vol 12 (4) ◽

pp. 1287-1292 ◽

Cited By ~ 11

Author(s):

Karen H. R. Kirmse ◽

Amy E. Wendt ◽

Gottlieb S. Oehrlein ◽

Ying Zhang

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Ion Flux ◽

High Density ◽

Flux Composition

Download Full-text

Etched profile distortions in high density electron cyclotron resonance plasma

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.587513 ◽

1994 ◽

Vol 12 (6) ◽

pp. 3363 ◽

Cited By ~ 5

Author(s):

Masahiro Yoneda

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

High Density ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

Download Full-text

The influence of ion energy, ion flux, and etch temperature on the electrical and material quality of GaAs etched with an electron cyclotron resonance source

Journal of Applied Physics ◽

10.1063/1.360067 ◽

1995 ◽

Vol 78 (4) ◽

pp. 2712-2715 ◽

Cited By ~ 4

Author(s):

M. W. Cole ◽

K. K. Ko ◽

S. W. Pang

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Ion Flux ◽

Ion Energy ◽

Material Quality

Download Full-text

High-Density Electron Cyclotron Resonance Electric Propulsion

51st AIAA/SAE/ASEE Joint Propulsion Conference ◽

10.2514/6.2015-3725 ◽

2015 ◽

Author(s):

Aloysius I. Reisz

Keyword(s):

Cyclotron Resonance ◽

Electric Propulsion ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

High Density

Download Full-text

Energy and composition of the ion flux in microwave electron cyclotron resonance/radio frequency methane plasma

Surface and Coatings Technology ◽

10.1016/s0257-8972(03)00391-8 ◽

2003 ◽

Vol 174-175 ◽

pp. 914-917 ◽

Cited By ~ 4

Author(s):

Martin Mišina ◽

Petr Pokorný

Keyword(s):

Radio Frequency ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Ion Flux

Download Full-text

Fluorocarbon radicals and surface reactions in fluorocarbon high density etching plasma. II. H2 addition to electron cyclotron resonance plasma employing CHF3

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580076 ◽

1996 ◽

Vol 14 (4) ◽

pp. 2011-2019 ◽

Cited By ~ 40

Author(s):

Kunimasa Takahashi ◽

Masaru Hori ◽

Toshio Goto

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Surface Reactions ◽

Electron Cyclotron ◽

High Density ◽

Electron Cyclotron Resonance Plasma ◽

H2 Addition ◽

Resonance Plasma

Download Full-text

Characterization of a high-density electron-cyclotron resonance plasma source operating in nitrogen

Review of Scientific Instruments ◽

10.1063/1.1578154 ◽

2003 ◽

Vol 74 (7) ◽

pp. 3279-3283 ◽

Cited By ~ 5

Author(s):

E. I. Toader ◽

A. Fredriksen ◽

A. Aanesland

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

High Density ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

Download Full-text

Fluorocarbon high density plasma. VI. Reactive ion etching lag model for contact hole silicon dioxide etching in an electron cyclotron resonance plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578850 ◽

1994 ◽

Vol 12 (3) ◽

pp. 665-670 ◽

Cited By ~ 43

Author(s):

O. Joubert ◽

G. S. Oehrlein ◽

M. Surendra

Keyword(s):

Silicon Dioxide ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Reactive Ion Etching ◽

Electron Cyclotron ◽

High Density ◽

Ion Etching ◽

Lag Model ◽

Resonance Plasma ◽

Density Plasma

Download Full-text

Fabrication of diamond films under high density helium plasma formed by electron cyclotron resonance

Metallurgical Coatings and Thin Films 1991 ◽

10.1016/b978-0-444-89455-7.50072-1 ◽

1991 ◽

pp. 374-380

Author(s):

Motokazu Yuasa ◽

Hiroshi Kawarada ◽

Jin Wei ◽

Jing Sheng Ma ◽

Jun-ichi Suzuki ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Diamond Films ◽

Electron Cyclotron ◽

High Density ◽

Helium Plasma

Download Full-text

Etching of polysilicon in a high-density electron cyclotron resonance plasma with collimated magnetic field

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.585860 ◽

1992 ◽

Vol 10 (4) ◽

pp. 1312 ◽

Cited By ~ 6

Author(s):

D. Dane

Keyword(s):

Magnetic Field ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

High Density ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

Download Full-text

Compact electron cyclotron resonance ion source with high density plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577348 ◽

1991 ◽

Vol 9 (3) ◽

pp. 707-710 ◽

Cited By ~ 11

Author(s):

Masaru Shimada ◽

Iwao Watanabe ◽

Yasuhiro Torii

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Ion Source ◽

Electron Cyclotron ◽

High Density ◽

Density Plasma

Download Full-text