scholarly journals Effect of Bias Voltage and Discharge Current on Mechanical Properties of TiN Film Deposited by D.C. Magnetron Sputtering.

2002 ◽  
Vol 51 (6) ◽  
pp. 694-700 ◽  
Author(s):  
Hirotaka TANABE ◽  
Yoshio MIYOSHI ◽  
Tohru TAKAMATSU ◽  
Hideyuki SUGIURA
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Discharge Current ◽  
Tin Film

scholarly journals Influence of Applied Bias Voltage on the Composition, Structure, and Properties of Ti:Si-Codoped a-C:H Films Prepared by Magnetron Sputtering

2014 ◽  
Vol 2014 ◽  
pp. 1-7 ◽  
Author(s):  
Jinlong Jiang ◽  
Qiong Wang ◽  
Yubao Wang ◽  
Zhang Xia ◽  
Hua Yang ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Surface Roughness ◽  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Tribological Properties ◽  
Structure And Properties ◽  
Applied Bias ◽  
Applied Bias Voltage ◽  
Methane Mixture ◽  
Composition Structure

The titanium- and silicon-codoped a-C:H films were prepared at different applied bias voltage by magnetron sputtering TiSi target in argon and methane mixture atmosphere. The influence of the applied bias voltage on the composition, surface morphology, structure, and mechanical properties of the films was investigated by XPS, AFM, Raman, FTIR spectroscopy, and nanoindenter. The tribological properties of the films were characterized on an UMT-2MT tribometer. The results demonstrated that the film became smoother and denser with increasing the applied bias voltage up to −200 V, whereas surface roughness increased due to the enhancement of ion bombardment as the applied bias voltage further increased. The sp3carbon fraction in the films monotonously decreased with increasing the applied bias voltage. The film exhibited moderate hardness and the superior tribological properties at the applied bias voltage of −100 V. The tribological behaviors are correlated to the H/E or H3/E2ratio of the films.

Effect of Sputtering Gas Pressure on Mechanical Properties of TiN Film Deposited by D. C. Magnetron Sputtering

2003 ◽  
Vol 2003.78 (0) ◽  
pp. _2-1_-_2-2_
Author(s):  
Hirotaka TANABE ◽  
Yoshio MIYOSHI ◽  
Tohru TAKAMATSU ◽  
Hitoshi AWANO
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Gas Pressure ◽  
Tin Film

Effect of Sputtering Gas Pressure and Bias Voltage on Mechanical Properties of TiN Coating Deposited by DC Magnetron Sputtering

2004 ◽  
Author(s):  
Hirotaka Tanabe ◽  
Yoshio Miyoshi ◽  
Tohru Takamatsu ◽  
Hitoshi Awano ◽  
Takaaki Yamano
Keyword(s):  
Mechanical Properties ◽  
Residual Stress ◽  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Adhesive Strength ◽  
Gas Pressure ◽  
Dc Magnetron Sputtering ◽  
Tin Films ◽  
Bombarding Energy ◽  
Gas Pressures

The mechanical properties of TiN films deposited on carbon steel JIS S45C by reactive dc magnetron sputtering under three sputtering gas pressures, 0.5Pa, 0.8Pa, and 1.76Pa were investigated. The residual stress once increased and then decreased with increasing bias voltage at 0.5Pa and 0.8Pa, but increased monotonously at 1.76Pa. These variations could be explained by the variations of the bombarding energy of a sputtered ion at each gas pressure. The variations of hardness and toughness correlated with the variation of residual stress. The variation of adhesive strength also could be explained by the variation of the bombarding energy with a model proposed in this study. A specific wear rate was also investigated, and it was found that to increase not only the hardness but also the adhesive strength is necessary to improve the wear resistance of TiN films.

CrN Films Deposited by Middle Frequency Magnetron Sputtering

2011 ◽  
Vol 189-193 ◽  
pp. 901-905
Author(s):  
Chang Wei Zou ◽  
Jun Zhang ◽  
Wei Xie ◽  
Le Xi Shao
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Smooth Surface ◽  
Gas Pressure ◽  
Optimal Conditions ◽  
Deposition Rates ◽  
Cr Content

CrN films with deposition rates of 30-190 nm/min were deposited on Si (111) substrates by middle-frequency magnetron sputtering methods. XRD, SEM, EDS and microhardness tests were used to investigate the effects of bias voltages and total gas pressure on the structure and mechanical properties of the resulting CrN films. With the increasing of bias voltages and total gas pressure, the preferential diffraction orientation changed from (111) to (200). A smooth surface was observed by the SEM experiments and the thickness of the film was about 2 µm. The deposition rates and Cr content of resulting films were highly influenced by the magnitude of the bias voltage and total gas pressure. RMS and Ra properties of the CrN films increased when increased total gas pressure or decreased bias voltage. CrN films produced under optimal conditions have an almost 1:1 Cr:N ratio as determined by EDS. The hardness of the CrN film increased from 2200 to 2700 HV when increased the bias voltages from 0 to 200 V.

Effects of Bias Voltage on the Structure and Mechanical Properties of Thick CrN Coatings Deposited by Mid-Frequency Magnetron Sputtering

2009 ◽  
Vol 11 (1) ◽  
pp. 38-41 ◽  
Author(s):  
Rong Shuangquan ◽  
He Jun ◽  
Wang Hongjun ◽  
Tian Canxin ◽  
Guo Liping ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Crn Coatings

The Mechanical Property of TiN Film Deposited on N+-Implanted Aluminum by Magnetron Sputtering

2005 ◽  
Vol 297-300 ◽  
pp. 1713-1717 ◽  
Author(s):  
Xun Cai ◽  
Youming Liu ◽  
Liuhe Li ◽  
Qiu Long Chen ◽  
Ya Wei Hu
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Auger Electron ◽  
Indentation Depth ◽  
High Energy ◽  
Indentation Load ◽  
Electron Spectrometer ◽  
Nano Indentation ◽  
Tin Film ◽  
Small Depth

The effect of a AlN gradient interlayer on the surface mechanical properties was investigated by nano-indentation for the TiN film on N+-implanted Al substrate. The AlN interlayer, 80nm thick measured by Auger Electron Spectrometer (AES), was formed by high energy N+-implantation prior to magnetron sputtering the TiN film in our custom designed multifunctional ion implanter. The nanohardness of N+-implanted aluminum was 450HV at extremely small depth, but quickly decreased to a constant value (65HV). The hardness and Young’s modulus of the TiN film on two different substrates, one with and the other without N+-implantation, kept almost constant up to a small depth of 200nm, and then decreased to the values of the Al substrate with increasing indentation depth, but with a lower decreasing rate for the N+-implanted system. It was found from the load-displacement curves that the interfaces cracked when the indentation load was 38mN for the N+-implanted system, while 18mN for the unimplanted system. Therefore the N+- implantation improved the surface mechanical properties significantly.

scholarly journals TiN Films Deposited on Uranium by High Power Pulsed Magnetron Sputtering under Low Temperature

Materials ◽  
2018 ◽  
Vol 11 (8) ◽  
pp. 1400 ◽  
Author(s):  
Jingjing Ding ◽  
Xixi Yin ◽  
Liping Fang ◽  
Xiandong Meng ◽  
Anyi Yin
Keyword(s):  
Mechanical Properties ◽  
Corrosion Resistance ◽  
Magnetron Sputtering ◽  
High Power ◽  
Wear Behavior ◽  
Grazing Incidence ◽  
Nuclear Industry ◽  
Tin Films ◽  
Tin Film ◽  
Pulsed Magnetron

Depleted uranium (DU) is oxidized readily due to its chemical activities, which limits its applications in nuclear industry. TiN film has been applied widely due to its good mechanical properties and its excellent corrosion resistance. In this work, TiN protection films were deposited on DU by direct current magnetron sputtering (DCMS) and high power pulsed magnetron sputtering (HPPMS), respectively. The surface morphology and microstructures were investigated by atomic force microscope (AFM), scanning electron microscopy (SEM), and grazing incidence X-ray diffraction (GIXRD). The hardness and Young’s modulus were determined by nano-Indenter. The wear behavior and adhesion was analyzed by pin-on-disc tests and scratch adhesion tests and the corrosion resistance was evaluated by electrochemical measurements. The results show that the TiN films that were deposited by HPPMS outperformed TiN film deposited by DCMS, with improvements on surface roughness, mechanical properties, wear behavior, adhesion strength, and corrosion resistance, thanks to its much denser columnar grain growth structure and preferred orientation of (111) plane with the lowest strain energy. Besides, the process of Ti interlayer deposition by HPPMS can enhance the film properties to an extent as compared to DCMS, which is attributed to the enhanced ion bombardment during the HPPMS.

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