scholarly journals Fabrication of Fully Dense Composite Materials by SHS Under Pressurized Reactive-Gas Atmosphere.

1994 ◽  
Vol 43 (492) ◽  
pp. 1059-1064 ◽  
Author(s):  
Osamu YAMADA
Keyword(s):  
Composite Materials ◽  
Gas Atmosphere ◽  
Reactive Gas

scholarly journals The nitrogen concentration effect on Ce doped SiOxNy emission: towards optimized Ce3+ for LED applications

Nanoscale ◽  
2018 ◽  
Vol 10 (8) ◽  
pp. 3823-3837 ◽  
Author(s):  
F. Ehré ◽  
C. Labbé ◽  
C. Dufour ◽  
W. M. Jadwisienczak ◽  
J. Weimmerskirch-Aubatin ◽  
...  
Keyword(s):  
Nitrogen Concentration ◽  
Reactive Sputtering ◽  
Concentration Effect ◽  
Gas Atmosphere ◽  
Reactive Gas

Ce-Doped SiOxNy films are deposited by magnetron reactive sputtering from a CeO2 target under a nitrogen reactive gas atmosphere.

Characterization of a plasma generated by a multisource vacuum arc with zirconium cathodes in a reactive gas atmosphere

2004 ◽  
Vol 180-181 ◽  
pp. 396-400 ◽  
Author(s):  
B. Kułakowska-Pawlak ◽  
W. Żyrnicki ◽  
J. Walkowicz ◽  
J. Smolik
Keyword(s):  
Vacuum Arc ◽  
Gas Atmosphere ◽  
Reactive Gas

Noble-transition metal nanoparticle breathing in a reactive gas atmosphere

Nanoscale ◽  
2013 ◽  
Vol 5 (16) ◽  
pp. 7379 ◽  
Author(s):  
Valeri Petkov ◽  
Shiyao Shan ◽  
Peter Chupas ◽  
Jun Yin ◽  
Lefu Yang ◽  
...  
Keyword(s):  
Transition Metal ◽  
Metal Nanoparticle ◽  
Gas Atmosphere ◽  
Reactive Gas

Regularities of deep deoxidization of molten ionic chlorides in reactive gas atmosphere

RSC Advances ◽  
2016 ◽  
Vol 6 (63) ◽  
pp. 58780-58785 ◽  
Author(s):  
V. L. Cherginets ◽  
T. P. Rebrova ◽  
V. A. Naumenko ◽  
A. L. Rebrov ◽  
O. I. Yurchenko
Keyword(s):  
Potentiometric Method ◽  
Chloride Melts ◽  
Gas Atmosphere ◽  
Oxide Ion ◽  
Reactive Gas

The process of the removal of oxide ion admixtures by the action of CCl4 vapor (carbochlorination) from chloride melts of KCl–NaCl (0.5 : 0.5), BaCl2–KCl (0.26 : 0.74) and KCl–LiCl (0.41 : 0.59) was studied by a potentiometric method.

Reactive Laser–Sputtering for Amorphous Silicon Films

1981 ◽  
Vol 4 ◽  
Author(s):  
M. Hanabusa ◽  
M. Suzuki
Keyword(s):  
Amorphous Silicon ◽  
Laser Pulses ◽  
Spectroscopic Technique ◽  
Silicon Films ◽  
Atomic Vapor ◽  
Reactive Deposition ◽  
Target Spot ◽  
Silicon Target ◽  
Gas Atmosphere ◽  
Reactive Gas

ABSTRACTIntense, Q-switched Nd:YAG laser pulses were used to vaporize a silicon target. The pulsed atomic vapor generated produces amorphous silicon films at unusually fast accumulation speeds of 106 Å/s. Despite this speed, reactive deposition is made possible simply by evaporating in a reactive gas atmosphere. For instance, hydrogenated films have been produced by evaporating in hydrogen. Atomic hydrogen generated by thermal decomposition at a laserirradiated target spot is responsible for hydrogenation. Dynamics of this laser-induced deposition have been studied by a spectroscopic technique.

Development of a three-electrode-lens drift tube for time-of-flight mass spectrometry

1998 ◽  
Vol 5 (3) ◽  
pp. 612-614
Author(s):  
Hitoshi Sakamoto ◽  
Yuji Takakuwa ◽  
Toyokazu Hori ◽  
Yoshiharu Enta ◽  
Hiroo Kato ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Drift Tube ◽  
Detection Efficiency ◽  
Time Of Flight ◽  
Flight Mass Spectrometry ◽  
Gas Atmosphere ◽  
High Detection ◽  
High Detection Efficiency ◽  
Tof Ms ◽  
Reactive Gas

A three-electrode-lens drift tube for time-of-flight mass spectrometry (TOF-MS) has been developed for utilizing a detector to observe photon-stimulated desorption (PSD). In spite of a small detection area, the detector has a high detection efficiency and durability to reactive gas atmosphere at high pressure. The TOF-MS performance of the drift tube was examined for PSD using single-bunch-mode synchrotron radiation on a dichlorosilane (SiH2Cl2)-saturated Si(001) surface. The measured acceleration and focusing-voltage dependences of the time of flight, intensity and full width at half-maximum for the peak of H+ and Cl+ PSD ions are discussed in terms of the numerical calculations of ion trajectories and focusing characteristic of the drift tube.

Comparative Microstructures of Ion Milled and Electrochemically Thinned Composite Materials

1974 ◽  
Vol 32 ◽  
pp. 546-547
Author(s):  
R.R. Russell
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Composite Materials ◽  
Great Difficulty ◽  
Ion Milling ◽  
Transmission Electron ◽  
Ion Damage ◽  
Intermetallic Composite

Transmission electron microscopy of metallic/intermetallic composite materials is most challenging since the microscopist typically has great difficulty preparing specimens with uniform electron thin areas in adjacent phases. The application of ion milling for thinning foils from such materials has been quite effective. Although composite specimens prepared by ion milling have yielded much microstructural information, this technique has some inherent drawbacks such as the possible generation of ion damage near sample surfaces.

Transmission electron microscopy of composite materials

1988 ◽  
Vol 46 ◽  
pp. 1012-1015
Author(s):  
K.P.D. Lagerlof
Keyword(s):  
Composite Materials ◽  
Physical Properties ◽  
Structural Defects ◽  
Structural Composites ◽  
Multiphase Materials ◽  
Structural Reinforcement ◽  
Transmission Electron ◽  
Reinforced Fiber ◽  
Particulate Reinforced Composites ◽  
Definition Of

Although most materials contain more than one phase, and thus are multiphase materials, the definition of composite materials is commonly used to describe those materials containing more than one phase deliberately added to obtain certain desired physical properties. Composite materials are often classified according to their application, i.e. structural composites and electronic composites, but may also be classified according to the type of compounds making up the composite, i.e. metal/ceramic, ceramic/ceramie and metal/semiconductor composites. For structural composites it is also common to refer to the type of structural reinforcement; whisker-reinforced, fiber-reinforced, or particulate reinforced composites [1-4].For all types of composite materials, it is of fundamental importance to understand the relationship between the microstructure and the observed physical properties, and it is therefore vital to properly characterize the microstructure. The interfaces separating the different phases comprising the composite are of particular interest to understand. In structural composites the interface is often the weakest part, where fracture will nucleate, and in electronic composites structural defects at or near the interface will affect the critical electronic properties.

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