Regularities of deep deoxidization of molten ionic chlorides in reactive gas atmosphere

RSC Advances ◽  
2016 ◽  
Vol 6 (63) ◽  
pp. 58780-58785 ◽  
Author(s):  
V. L. Cherginets ◽  
T. P. Rebrova ◽  
V. A. Naumenko ◽  
A. L. Rebrov ◽  
O. I. Yurchenko
Keyword(s):  
Potentiometric Method ◽  
Chloride Melts ◽  
Gas Atmosphere ◽  
Oxide Ion ◽  
Reactive Gas

The process of the removal of oxide ion admixtures by the action of CCl4 vapor (carbochlorination) from chloride melts of KCl–NaCl (0.5 : 0.5), BaCl2–KCl (0.26 : 0.74) and KCl–LiCl (0.41 : 0.59) was studied by a potentiometric method.

scholarly journals The nitrogen concentration effect on Ce doped SiOxNy emission: towards optimized Ce3+ for LED applications

Nanoscale ◽  
2018 ◽  
Vol 10 (8) ◽  
pp. 3823-3837 ◽  
Author(s):  
F. Ehré ◽  
C. Labbé ◽  
C. Dufour ◽  
W. M. Jadwisienczak ◽  
J. Weimmerskirch-Aubatin ◽  
...  
Keyword(s):  
Nitrogen Concentration ◽  
Reactive Sputtering ◽  
Concentration Effect ◽  
Gas Atmosphere ◽  
Reactive Gas

Ce-Doped SiOxNy films are deposited by magnetron reactive sputtering from a CeO2 target under a nitrogen reactive gas atmosphere.

Characterization of a plasma generated by a multisource vacuum arc with zirconium cathodes in a reactive gas atmosphere

2004 ◽  
Vol 180-181 ◽  
pp. 396-400 ◽  
Author(s):  
B. Kułakowska-Pawlak ◽  
W. Żyrnicki ◽  
J. Walkowicz ◽  
J. Smolik
Keyword(s):  
Vacuum Arc ◽  
Gas Atmosphere ◽  
Reactive Gas

Noble-transition metal nanoparticle breathing in a reactive gas atmosphere

Nanoscale ◽  
2013 ◽  
Vol 5 (16) ◽  
pp. 7379 ◽  
Author(s):  
Valeri Petkov ◽  
Shiyao Shan ◽  
Peter Chupas ◽  
Jun Yin ◽  
Lefu Yang ◽  
...  
Keyword(s):  
Transition Metal ◽  
Metal Nanoparticle ◽  
Gas Atmosphere ◽  
Reactive Gas

Reactive Laser–Sputtering for Amorphous Silicon Films

1981 ◽  
Vol 4 ◽  
Author(s):  
M. Hanabusa ◽  
M. Suzuki
Keyword(s):  
Amorphous Silicon ◽  
Laser Pulses ◽  
Spectroscopic Technique ◽  
Silicon Films ◽  
Atomic Vapor ◽  
Reactive Deposition ◽  
Target Spot ◽  
Silicon Target ◽  
Gas Atmosphere ◽  
Reactive Gas

ABSTRACTIntense, Q-switched Nd:YAG laser pulses were used to vaporize a silicon target. The pulsed atomic vapor generated produces amorphous silicon films at unusually fast accumulation speeds of 106 Å/s. Despite this speed, reactive deposition is made possible simply by evaporating in a reactive gas atmosphere. For instance, hydrogenated films have been produced by evaporating in hydrogen. Atomic hydrogen generated by thermal decomposition at a laserirradiated target spot is responsible for hydrogenation. Dynamics of this laser-induced deposition have been studied by a spectroscopic technique.

Development of a three-electrode-lens drift tube for time-of-flight mass spectrometry

1998 ◽  
Vol 5 (3) ◽  
pp. 612-614
Author(s):  
Hitoshi Sakamoto ◽  
Yuji Takakuwa ◽  
Toyokazu Hori ◽  
Yoshiharu Enta ◽  
Hiroo Kato ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Drift Tube ◽  
Detection Efficiency ◽  
Time Of Flight ◽  
Flight Mass Spectrometry ◽  
Gas Atmosphere ◽  
High Detection ◽  
High Detection Efficiency ◽  
Tof Ms ◽  
Reactive Gas

A three-electrode-lens drift tube for time-of-flight mass spectrometry (TOF-MS) has been developed for utilizing a detector to observe photon-stimulated desorption (PSD). In spite of a small detection area, the detector has a high detection efficiency and durability to reactive gas atmosphere at high pressure. The TOF-MS performance of the drift tube was examined for PSD using single-bunch-mode synchrotron radiation on a dichlorosilane (SiH2Cl2)-saturated Si(001) surface. The measured acceleration and focusing-voltage dependences of the time of flight, intensity and full width at half-maximum for the peak of H+ and Cl+ PSD ions are discussed in terms of the numerical calculations of ion trajectories and focusing characteristic of the drift tube.

Recent Progress In High-Resolution Shadowing For Biological Transmission Electron Microscopy

1990 ◽  
Vol 48 (1) ◽  
pp. 510-511 ◽  
Author(s):  
Heinz Gross ◽  
Katarina Krusche ◽  
Peter Tittmann
Keyword(s):  
Heavy Metal ◽  
High Resolution ◽  
Freeze Drying ◽  
Atmospheric Conditions ◽  
Vacuum Equipment ◽  
Transmission Electron ◽  
Gas Atmosphere ◽  
Gas Molecules ◽  
Residual Gas ◽  
Backing Layer

Freeze-drying followed by heavy metal shadowing is a long established and straight forward approach to routinely study the structure of dehydrated macromolecules. Very thin specimens such as isolated membranes or single macromolecules are directly adsorbed on C-coated grids. After rapid freezing the grids are transferred into a suitable vacuum equipment for freeze-drying and heavy metal shadowing.To improve the resolution power of shadowing films we introduced shadowing at very low specimen temperature (−250°C). To routinely do that without the danger of contamination we developed in collaboration with Balzers an UHV (p≤10-9 mbar) machine (BAF500K, Fig.2). It should be mentioned here that at −250°C the specimen surface acts as effective cryopump for practically all impinging residual gas molecules from the residual gas atmosphere.Common high resolution shadowing films (Pt/C, Ta/W) have to be protected from alterations due to air contact by a relatively thick C-backing layer, when transferred via atmospheric conditions into the TEM. Such an additional C-coat contributes disturbingly to the contrast at high resolution.

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