scholarly journals OH Content Dependence of the Intensity of ArF-Excimer-Laser Induced Absorption in Synthetic Fused Silica.

1995 ◽  
Vol 23 (6) ◽  
pp. 396-401 ◽  
Author(s):  
Nobu KUZUU
Keyword(s):  
Excimer Laser ◽  
Fused Silica ◽  
Induced Absorption ◽  
Arf Excimer Laser ◽  
Oh Content

ArF-excimer-laser-induced emission and absorption bands in fused silica synthesized under oxidizing conditions

1992 ◽  
Vol 45 (5) ◽  
pp. 2050-2054 ◽  
Author(s):  
Nobu Kuzuu ◽  
Yoshikazu Komatsu ◽  
Masataka Murahara
Keyword(s):  
Excimer Laser ◽  
Fused Silica ◽  
Absorption Bands ◽  
Arf Excimer Laser

Fabrication Fluoride High Reflection Mirror by Thermal Evaporation in the ArF Excimer Laser

2013 ◽  
Vol 552 ◽  
pp. 252-255
Author(s):  
Yan He Chang ◽  
Chun Shui Jin ◽  
Chun Li ◽  
Jing Cheng Jin
Keyword(s):  
Excimer Laser ◽  
Thermal Evaporation ◽  
Optical Loss ◽  
Single Layer ◽  
Laser Cavity ◽  
Fused Silica ◽  
Scattering Loss ◽  
Arf Excimer Laser ◽  
Laser Induced Damage ◽  
High Reflection

ArF excimer laser is the main light resource for the microlithography technology. In the laser cavity, the optical components with lowest absorption and scattering loss are necessary. As a consequence only a few materials are promising candidates for 193nm coatings with high transmittance or high reflectance. Fluoride films exhibit relatively low optical loss as well as high laser induced damage thresholds. The potentiality of LaF3 and MgF2 is evaluated in respect of the production of improved optical coatings for applications. For this purpose, single layer is prepared by thermal evaporation at the deposited temperatures of 523K on Fused Silica. A first order bulk inhomogeneity model for extracting the optical constants of weak absorbing film is applied, which is based on spectrophotometry. Refractive index (n) and extinction coefficient (k) of the optimal LaF3 film are 1.678 and 2.24×10-3 at 193nm. In the case of the optimal MgF2 film, n and k are 1.443 and 4.72×10-4 at 193nm. High reflection (HR) LaF3/MgF2 coatings are designed and fabricated for normal incident on CaF2. The experimental results indicate that after coated and fluoride coatings deposit, according to optimal process, can have more suitable optical properties at deep ultraviolet (DUV), the reflectance of HR coatings reaches more than 98% at 193nm.

Effect of SiOH and SiCl on ArF-excimer laser-induced absorption in soot-remelted silica

1997 ◽  
Vol 81 (12) ◽  
pp. 8011-8017 ◽  
Author(s):  
Nobu Kuzuu ◽  
Toshiyuki Taga ◽  
Naoyoshi Kamisugi
Keyword(s):  
Excimer Laser ◽  
Induced Absorption ◽  
Arf Excimer Laser

KrF- and ArF-excimer-laser-induced absorption in silica glasses produced by melting synthetic silica powder

2013 ◽  
Vol 114 (1) ◽  
pp. 014902 ◽  
Author(s):  
Nobu Kuzuu ◽  
Toshiya Sasaki ◽  
Tatsuya Kojima ◽  
Jun-ichiro Tanaka ◽  
Takayuki Nakamura ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Silica Powder ◽  
Induced Absorption ◽  
Silica Glasses ◽  
Arf Excimer Laser

Excimer-laser-induced absorption in fused silica

1999 ◽  
Author(s):  
Johannes Moll ◽  
Paul M. Schermerhorn
Keyword(s):  
Excimer Laser ◽  
Fused Silica ◽  
Induced Absorption

KrF-excimer-laser-induced absorption and fluorescence bands in fused silica related to the manufacturing process

1990 ◽  
Author(s):  
Norbert Leclerc ◽  
Christoph Pfleiderer ◽  
Hermine Hitzler ◽  
Stephan Thomas ◽  
Ralf Takke ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Manufacturing Process ◽  
Fused Silica ◽  
Induced Absorption ◽  
Krf Excimer Laser

Influence of sodium impurities on ArF excimer-laser-induced absorption in CaF_2 crystals

2000 ◽  
Vol 39 (22) ◽  
pp. 3925 ◽  
Author(s):  
Norio Komine ◽  
Shigeru Sakuma ◽  
Masaki Shiozawa ◽  
Tsutomu Mizugaki ◽  
Eiji Sato
Keyword(s):  
Excimer Laser ◽  
Induced Absorption ◽  
Arf Excimer Laser
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