scholarly journals Identifying the Electronic Properties Relevant to Improving the Performance of High Band-Gap Copper Based I-III-VI2 Chalcopyrite Thin Film Photovoltaic Devices: Final Subcontract Report, 27 April 2004-15 September 2007

2008 ◽  
Author(s):  
J. D. Cohen
2014 ◽  
Vol 47 (13) ◽  
pp. 135105 ◽  
Author(s):  
Se Jin Park ◽  
Yunae Cho ◽  
Sung Hwan Moon ◽  
Ji Eun Kim ◽  
Doh-Kwon Lee ◽  
...  

2012 ◽  
Vol 1426 ◽  
pp. 45-49 ◽  
Author(s):  
M.M. de Jong ◽  
J.K. Rath ◽  
R.E.I. Schropp

ABSTRACTAs an alternative to crystalline silicon or thin film solar cells on rigid glass substrates, we aim to fabricate amorphous silicon (a-Si)/nanocrystalline silicon (nc-Si) tandem thin film solar cells on cheap flexible substrates. We have chosen polycarbonate as the superstrate and adapted the a-Si and nc-Si deposition processes for deposition at a maximum temperature of 130°. Because a-Si deposited at low temperatures has a high band gap, we were able to fabricate very thin (<1.2 μm) a-Si/nc-Si solar cells, because the high band gap of the a-Si shifts the current generation more towards the bottom cell, allowing for a much thinner (900 nm) bottom cell. The somewhat lower Jsc of the complete cell is partly compensated by a higher Vocwhich results in an initial conversion efficiency of 9.5% for the low temperature tandem solar cells on glass.


Coatings ◽  
2021 ◽  
Vol 11 (1) ◽  
pp. 52
Author(s):  
Asmaa Soheil Najm ◽  
Puvaneswaran Chelvanathan ◽  
Sieh Kiong Tiong ◽  
Mohammad Tanvirul Ferdaous ◽  
Seyed Ahmad Shahahmadi ◽  
...  

A CdS thin film buffer layer has been widely used as conventional n-type heterojunction partner both in established and emerging thin film photovoltaic devices. In this study, we perform numerical simulation to elucidate the influence of electrical properties of the CdS buffer layer, essentially in terms of carrier mobility and carrier concentration on the performance of SLG/Mo/p-Absorber/n-CdS/n-ZnO/Ag configured thin film photovoltaic devices, by using the Solar Cell Capacitance Simulator (SCAPS-1D). A wide range of p-type absorber layers with a band gap from 0.9 to 1.7 eV and electron affinity from 3.7 to 4.7 eV have been considered in this simulation study. For an ideal absorber layer (no defect), the carrier mobility and carrier concentration of CdS buffer layer do not significantly alter the maximum attainable efficiency. Generally, it was revealed that for an absorber layer with a conduction band offset (CBO) that is more than 0.3 eV, Jsc is strongly dependent on the carrier mobility and carrier concentration of the CdS buffer layer, whereas Voc is predominantly dependent on the back contact barrier height. However, as the bulk defect density of the absorber layer is increased from 1014 to 1018 cm−3, a CdS buffer layer with higher carrier mobility and carrier concentration is an imperative requirement to a yield device with higher conversion efficiency and a larger band gap-CBO window for realization of a functional device. Most tellingly, simulation outcomes from this study reveal that electrical properties of the CdS buffer layer play a decisive role in determining the progress of emerging p-type photo-absorber layer materials, particularly during the embryonic device development stage.


2003 ◽  
Vol 431-432 ◽  
pp. 461-465 ◽  
Author(s):  
P. Mahawela ◽  
S. Jeedigunta ◽  
C.S. Ferekides ◽  
D.L. Morel

2013 ◽  
Vol 22 (1) ◽  
pp. 122-128 ◽  
Author(s):  
Se Jin Park ◽  
Jin Woo Cho ◽  
Joong Kee Lee ◽  
Keeshik Shin ◽  
Ji-Hyun Kim ◽  
...  

RSC Advances ◽  
2021 ◽  
Vol 11 (21) ◽  
pp. 12687-12695
Author(s):  
Teoman Taskesen ◽  
Devendra Pareek ◽  
Dirk Hauschild ◽  
Alan Haertel ◽  
Lothar Weinhardt ◽  
...  

This article demonstrates a flash-type kinetic sulfurization method to introduce band-gap grading in CZTSe based photovoltaic devices. The developed approach allows to achieve a steep grading profile on kesterite thin-film surface.


2015 ◽  
Vol 9 (6) ◽  
pp. 338-343 ◽  
Author(s):  
Hossam ElAnzeery ◽  
Marie Buffière ◽  
Khaled Ben Messaoud ◽  
Souhaib Oueslati ◽  
Guy Brammertz ◽  
...  

Author(s):  
J.M. Bonar ◽  
R. Hull ◽  
R. Malik ◽  
R. Ryan ◽  
J.F. Walker

In this study we have examined a series of strained heteropeitaxial GaAs/InGaAs/GaAs and InGaAs/GaAs structures, both on (001) GaAs substrates. These heterostructures are potentially very interesting from a device standpoint because of improved band gap properties (InAs has a much smaller band gap than GaAs so there is a large band offset at the InGaAs/GaAs interface), and because of the much higher mobility of InAs. However, there is a 7.2% lattice mismatch between InAs and GaAs, so an InxGa1-xAs layer in a GaAs structure with even relatively low x will have a large amount of strain, and misfit dislocations are expected to form above some critical thickness. We attempt here to correlate the effect of misfit dislocations on the electronic properties of this material.The samples we examined consisted of 200Å InxGa1-xAs layered in a hetero-junction bipolar transistor (HBT) structure (InxGa1-xAs on top of a (001) GaAs buffer, followed by more GaAs, then a layer of AlGaAs and a GaAs cap), and a series consisting of a 200Å layer of InxGa1-xAs on a (001) GaAs substrate.


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