Development of a polysilicon process based on chemical vapor deposition: Phase I. Seventh quarterly progress report, 1 April-30 June 1981

Mapping Intimacies ◽

10.2172/6831240 ◽

1982 ◽

Author(s):

F. Plahutnik ◽

A. Arvidson ◽

D. Sawyer

Keyword(s):

Chemical Vapor Deposition ◽

Phase I ◽

Vapor Deposition ◽

Chemical Vapor ◽

Progress Report

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Progress Report on Microstructured Surfaces Based on Chemical Vapor Deposition

Methods in Molecular Biology - Biological Microarrays ◽

10.1007/978-1-59745-551-0_16 ◽

2010 ◽

pp. 261-279 ◽

Cited By ~ 1

Author(s):

Yaseen Elkasabi ◽

Joerg Lahann

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Progress Report ◽

Microstructured Surfaces

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Development of a polysilicon process based on chemical vapor deposition (Phase 1). Fifth quarterly progress report, 1 October-31 December 1980

10.2172/6428678 ◽

1981 ◽

Author(s):

J. McCormick ◽

K. Sharp ◽

A. Arvidson ◽

D. Sawyer

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Phase 1 ◽

Chemical Vapor ◽

Progress Report

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Development of a polysilicon process based on chemical vapor deposition (Phase 1). First quarterly progress report, 6 October-31 December 1979

10.2172/5491926 ◽

1980 ◽

Author(s):

J. R. McCormick ◽

A. Arvidson ◽

F. Plahutnik ◽

D. Sawyer ◽

K. Sharp

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Phase 1 ◽

Chemical Vapor ◽

Progress Report

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Fundamental studies of the chemical vapor deposition of diamond. Progress report, April 1, 1990--July 31, 1991

10.2172/10133078 ◽

1991 ◽

Author(s):

D.A. Stevenson

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Progress Report

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Development of a polysilicon process based on chemical vapor deposition. Phase 1. Fourth quarterly progress report, 1 July-30 September 1980

10.2172/6946271 ◽

1980 ◽

Author(s):

K. Sharp ◽

A. Arvidson ◽

D. Sawyer

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Phase 1 ◽

Chemical Vapor ◽

Progress Report

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Low-pressure chemical vapor deposition of amorphous silicon photovoltaic devices. Annual technical progress report, 1 May 1984-30 April 1985

10.2172/5965186 ◽

1986 ◽

Author(s):

B. Baron ◽

R. Rocheleau ◽

S. Hegedus

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Technical Progress ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Progress Report ◽

Photovoltaic Devices ◽

Pressure Chemical

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Development of a polysilicon process based on chemical vapor deposition. Sixth quarterly progress report, 1 January-31 March 1981 (Phase 1)

10.2172/5746839 ◽

1981 ◽

Author(s):

J. McCormick ◽

A. Arvidson ◽

D. Sawyer ◽

F. Plahutnik

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Phase 1 ◽

Chemical Vapor ◽

Progress Report

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Progress Report on the Application of a One Atmosphere Uniform Glow Discharge Plasma (OAUGDP®) to Plasma Chemical Vapor Deposition (PCVD)

IEEE Conference Record - Abstracts. 2005 IEEE International Conference on Plasma Science ◽

10.1109/plasma.2005.359289 ◽

2005 ◽

Author(s):

Truman Bonds ◽

J. Reece Roth

Keyword(s):

Chemical Vapor Deposition ◽

Glow Discharge ◽

Vapor Deposition ◽

Discharge Plasma ◽

Chemical Vapor ◽

Progress Report ◽

Glow Discharge Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Development of a polysilicon process based on chemical vapor deposition: Phase 1. Third quarterly progress report, 1 April-30 June 1980

10.2172/6832859 ◽

1980 ◽

Author(s):

K. Sharp ◽

A. Arvidson ◽

F. Plahutnik ◽

D. Sawyer

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Phase 1 ◽

Chemical Vapor ◽

Progress Report

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Development of a polysilicon process based on chemical vapor deposition. Phase 1. Second quarterly progress report, January 1-March 31, 1980

10.2172/5416431 ◽

1980 ◽

Author(s):

K. Sharp ◽

A. Arvidson ◽

F. Plahutnik ◽

D. Sawyer

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Phase 1 ◽

Chemical Vapor ◽

Progress Report

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