scholarly journals Small-Angle X-Ray Scattering Studies of Microvoids in Amorphous Silicon-Based Semiconductors: Annual Subcontract Report, 1 February 1992 - 31 January 1993

1994 ◽  
Author(s):  
D. L. Williamson ◽  
S. J. Jones ◽  
Y. Chen
2018 ◽  
Vol 97 (18) ◽  
Author(s):  
Durga Paudel ◽  
Raymond Atta-Fynn ◽  
David A. Drabold ◽  
Stephen R. Elliott ◽  
Parthapratim Biswas

1992 ◽  
Vol 258 ◽  
Author(s):  
Yan Chen ◽  
S.J. Jones ◽  
D.L. Williamson ◽  
S. Yang ◽  
N. Maley ◽  
...  

ABSTRACTThe microstructure of amorphous silicon-based alloys prepared by reactive magnetron sputter (RMS) deposition has been examined on a scale from 1 to 25 nm using small-angle x-ray scattering (SAXS) and compared to that from films prepared by standard glow-discharge (GD) technology. Device-quality RMS a-Si:H material is found to have a larger microvoid fraction than device-quality GD a-Si:H and to have a significantly different size distribution. Addition of by the RMS technique using CH produces enhanced SAXS similar to the introduction of C via CH4 in GD material. A significant difference in the SAXS from RMS a-Si:H and a-SiC:H films compared to GD films is the observation of some oriented microstructure, most likely columnar in nature. Flotation density measurements of the same films examined by SAXS support the assumption that the SAXS originates primarily from microvoids.


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