Small-Angle X-Ray Scattering from a-Si:H and a-SiC:H Alloys Prepared by Reactive DC Magnetron Sputtering

1992 ◽  
Vol 258 ◽  
Author(s):  
Yan Chen ◽  
S.J. Jones ◽  
D.L. Williamson ◽  
S. Yang ◽  
N. Maley ◽  
...  
Keyword(s):  
Small Angle ◽  
Reactive Magnetron ◽  
Dc Magnetron Sputtering ◽  
Density Measurements ◽  
X Ray ◽  
X Ray Scattering ◽  
Significant Difference ◽  
Magnetron Sputter ◽  
Silicon Based ◽  
Ray Scattering

ABSTRACTThe microstructure of amorphous silicon-based alloys prepared by reactive magnetron sputter (RMS) deposition has been examined on a scale from 1 to 25 nm using small-angle x-ray scattering (SAXS) and compared to that from films prepared by standard glow-discharge (GD) technology. Device-quality RMS a-Si:H material is found to have a larger microvoid fraction than device-quality GD a-Si:H and to have a significantly different size distribution. Addition of by the RMS technique using CH produces enhanced SAXS similar to the introduction of C via CH4 in GD material. A significant difference in the SAXS from RMS a-Si:H and a-SiC:H films compared to GD films is the observation of some oriented microstructure, most likely columnar in nature. Flotation density measurements of the same films examined by SAXS support the assumption that the SAXS originates primarily from microvoids.

Voids Investigation of Amorphous Carbon Films Deposited by DC-Magnetron Sputtering: A Small Angle x-ray Scattering and Gas Thermal Effusion Study

1999 ◽  
Vol 593 ◽  
Author(s):  
F.L. Freire ◽  
L.G. Jacobsohn ◽  
D.F. Franceschini ◽  
S.S. Camargo
Keyword(s):  
Magnetron Sputtering ◽  
Amorphous Carbon ◽  
Small Angle ◽  
Ion Beam ◽  
Carbon Films ◽  
Dc Magnetron Sputtering ◽  
Amorphous Carbon Films ◽  
X Ray ◽  
X Ray Scattering ◽  
Ray Scattering

ABSTRACTAmorphous carbon films were deposited onto (100) Si crystals and onto ultra-pure Al foils by dc-magnetron sputtering with different Ar plasma pressures, from 0.17 to 1.4 Pa. We investigate the voids structure and the voids density in these films by means of small angle x-ray scattering (SAXS) and mass spectrometry of effused gases. The analysis of the effusion spectra provided clear evidence that films deposited at lower pressures are compact, while the films deposited at higher pressure present a more open structural arrangement, confirming density results obtained by using ion beam techniques. SAXS results reveal that the fraction of open volumes increases with the plasma pressure: a direct correlation between film density and open volume fraction is found. These different film microstructures could be explained by the existence of different bombarding regimes during film growth

A Revised O2 Reduction Model in Li-O2 Batteries as Revealed by in Situ Small Angle X-Ray Scattering

2019 ◽  
Author(s):  
Christian Prehal ◽  
Aleksej Samojlov ◽  
Manfred Nachtnebel ◽  
Manfred Kriechbaum ◽  
Heinz Amenitsch ◽  
...  
Keyword(s):  
Small Angle ◽  
Wide Angle ◽  
Reduction Mechanism ◽  
Reduction Model ◽  
X Ray ◽  
X Ray Scattering ◽  
O2 Reduction ◽  
Ray Scattering

<b>Here we use in situ small and wide angle X-ray scattering to elucidate unexpected mechanistic insights of the O2 reduction mechanism in Li-O2 batteries.<br></b>

Sign in / Sign up

Export Citation Format

Share Document