Novel self-aligned top-gate oxide TFT for AMOLED displays

2012 ◽  
Vol 20 (1) ◽  
pp. 47 ◽  
Author(s):  
Narihiro Morosawa ◽  
Yoshihiro Ohshima ◽  
Mitsuo Morooka ◽  
Toshiaki Arai ◽  
Tatsuya Sasaoka
Keyword(s):  
2021 ◽  
Vol 52 (S2) ◽  
pp. 48-50
Author(s):  
YuanJun Hsu ◽  
Zhenguo Lin ◽  
Yihong Lu ◽  
BaiXiang Han ◽  
Weiran Cao ◽  
...  

2011 ◽  
Vol 42 (1) ◽  
pp. 479-482 ◽  
Author(s):  
Narihiro Morosawa ◽  
Yoshihiro Ohshima ◽  
Mitsuo Morooka ◽  
Toshiaki Arai ◽  
Tatsuya Sasaoka
Keyword(s):  

2009 ◽  
Vol 255 (17) ◽  
pp. 7831-7833 ◽  
Author(s):  
Santosh M. Bobade ◽  
Ji-Hoon Shin ◽  
Young-Je Cho ◽  
Jung-Sun You ◽  
Duck-Kyun Choi

2013 ◽  
Vol 21 (11) ◽  
pp. 467-473 ◽  
Author(s):  
Narihiro Morosawa ◽  
Masanori Nishiyama ◽  
Yoshihiro Ohshima ◽  
Ayumu Sato ◽  
Yasuhiro Terai ◽  
...  

2013 ◽  
Vol 44 (1) ◽  
pp. 85-88 ◽  
Author(s):  
Narihiro Morosawa ◽  
Masanori Nishiyama ◽  
Yoshihiro Ohshima ◽  
Ayumu Sato ◽  
Yasuhiro Terai ◽  
...  

2017 ◽  
Vol 53 (2) ◽  
pp. 117-119 ◽  
Author(s):  
Bong‐Hyun You ◽  
Jae‐Hoon Lee ◽  
Soo‐Yeon Lee ◽  
Seok‐Ha Hong ◽  
Hyun‐Chang Kim ◽  
...  

1995 ◽  
Vol 378 ◽  
Author(s):  
K. Y. Choi ◽  
Y. S. Kim ◽  
H.S. Choi ◽  
B.S. Bae ◽  
M. K. Han

AbstractThe dominant pathways for hydrogen diffusion in poly-Si TFT’s are identified by analyzing the hydrogenation effect on the various device geometries. It is observed that the gate poly-Si thickness and channel width didn’t affect the hydrogenation. As the channel length was decreased down to 3 µm, threshold voltage was reduced and field effect mobility was increased significantly with hydrogeantion time. In the thick gate oxide (2000 Å, 4000 Å) poly-Si TFT’s, the device characteristics have been improved rapidly with hydrogenation time. The tail state density of thin gate oxide TFT wasn’t change by hydrgenation while that of thick gate oxide TFT was significantly reduced. Our experimental results may support the model that hydrogen atoms diffuse into the bulk of the active channel layer through the gate oxide and passivate the grain boundary and intragranular defects limitedly by gate oxide area.


2018 ◽  
Vol 49 (1) ◽  
pp. 117-120 ◽  
Author(s):  
Masahiro Tada ◽  
Kazuhide Mochizuki ◽  
Takanori Tsunashima ◽  
Hitoshi Tanaka ◽  
Tomoyuki Ito ◽  
...  
Keyword(s):  

2010 ◽  
Vol 11 (3) ◽  
pp. 113-118 ◽  
Author(s):  
Sang‐Hee Ko Park ◽  
Minki Ryu ◽  
Shinhyuk Yang ◽  
Sung Min Yoon ◽  
Chi‐Sun Hwang

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