29.2: High-Rate Deposition of MgO Films for ACPDPS by Activated Reactive Evaporation Using Hollow-Cathode Discharge (HCD-ARE)

1998 ◽  
Vol 29 (1) ◽  
pp. 869 ◽  
Author(s):  
M. Hakomori ◽  
K. Matsuzaki ◽  
T. Kurauchi ◽  
M. Matsuura ◽  
H. Yamakawa
Keyword(s):  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
High Rate ◽  
Reactive Evaporation ◽  
Activated Reactive Evaporation

Comparison of plasma characteristics of high-power pulsed sputtering glow discharge and hollow-cathode discharge

2020 ◽  
Vol 60 (1) ◽  
pp. 015501
Author(s):  
Shoki Abe ◽  
Katsuyuki Takahashi ◽  
Seiji Mukaigawa ◽  
Koichi Takaki ◽  
Ken Yukimura
Keyword(s):  
Glow Discharge ◽  
High Power ◽  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
Plasma Characteristics

Effect of aging the hollow cathode by sputtering on the analytical precision of the hollow cathode discharge emission source

1992 ◽  
Vol 64 (17) ◽  
pp. 1831-1835 ◽  
Author(s):  
Jih Lie. Tseng ◽  
Jau Yurn. Kung ◽  
J. C. Williams ◽  
Steven T. Griffin
Keyword(s):  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
Emission Source ◽  
Analytical Precision

Comparison of trace analytical results obtained with different hollow cathode discharge lamps

1985 ◽  
Vol 85 (1-2) ◽  
pp. 15-22
Author(s):  
Zs. Vámos-Szilvássy ◽  
A. Buzási-Győrfi
Keyword(s):  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
Analytical Results
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