Variation Effect of Silicon Film Thickness on Electrical Properties of NANOMOSFET

Author(s):  
A Tijjani ◽  
1999 ◽  
Vol 595 ◽  
Author(s):  
P. Ruterana ◽  
G. Nouet ◽  
Th. Kehagias ◽  
Ph. Komninou ◽  
Th. Karakostas ◽  
...  

AbstractWhen the stoichiometric TiN was deposited directly on GaN, we obtained columnar TiN grains of 5-20 nm section which cross the whole film thickness and are rotated mostly around the [111] axis. The conventional epitaxial relationship is obtained and no amorphous patches are observed at the interface. The deposition of TiN on Si doped GaN layers lead to the formation of an ohmic contact, whereas we obtain a rectifying contact on p type layers.


Molecules ◽  
2018 ◽  
Vol 23 (9) ◽  
pp. 2296 ◽  
Author(s):  
Yao Huang ◽  
Run Yang ◽  
Shijie Xiong ◽  
Jian Chen ◽  
Xinglong Wu

Silicon carbide (SiC) has a large number of polytypes of which 3C-, 4H-, 6H-SiC are most common. Since different polytypes have different energy gaps and electrical properties, it is important to identify and characterize various SiC polytypes. Here, Raman scattering is performed on 6H-SiC micro/nanocrystal (MNC) films to investigate all four folded transverse optic (TO) and longitudinal optic (LO) modes. With increasing film thickness, the four folded TO modes exhibit the same frequency downshift, whereas the four folded LO modes show a gradually-reduced downshift. For the same film thickness, all the folded modes show larger frequency downshifts with decreasing MNC size. Based on plasmons on MNCs, these folded modes can be attributed to strong coupling of the folded phonons with plasmons which show different strengths for the different folded modes while changing the film thickness and MNC size. This work provides a useful technique to identify SiC polytypes from Raman scattering.


2017 ◽  
Vol 45 ◽  
pp. 193-198 ◽  
Author(s):  
Ankur Soam ◽  
Rajiv Dusane

As the physical and electrical properties of silicon nanowires (SiNWs) are determined by their dimension, it is necessary to control their dimension to integrate them in a device. SiNWs were synthesized via Vapor-Liquid-Solid (VLS) mechanism in hot-wire chemical vapor process (HWCVP) technique using silane as a Si source and Sn as a catalyst. Different sizes of nano-template have been made by depositing of different amount of Sn using thermal evaporation method. The size of nano-template is found to be increased with the quantity of Sn. The diameter of resulted SiNWs depends on the size of the nano-template and it increases with the nano-template size. However, the diameter of SiNWs is found to be much larger than the used nano-template which is due to the deposition of silicon film on the sidewalls of the growing SiNWs. It is demonstrated here that the diameter of the interior core of SiNWs can be controlled desirable by adjusting the size of the nano-template.


1991 ◽  
Vol 235 ◽  
Author(s):  
T. Sameshima ◽  
S. Usui

ABSTRACTAmorphization of silicon films occurred through homogeneous solidification of molten silicon layers on quartz substrates induced by irradiation with a 30ns-XeCl excimer laser. The crystalline nucleation rate was obtained to be 8×1030m−3s−1. Silicon films were completely amorphized for films thinner than 18nm. Complete amorphizatoin is brought about by reduced grain size and reduced recalescence as the film thickness decreases. Recalescence was observed in situusing transient thermometry with a platinum-temperature-sensing layer when a 15nm-thick silicon film was amorphized.


Sign in / Sign up

Export Citation Format

Share Document