scholarly journals Boron-doped amorphous carbon film grown by bias assisted pyrolysis chemical vapor deposition

2015 ◽  
Vol 12 (3) ◽  
pp. 20140937-20140937 ◽  
Author(s):  
Ishak Annuar ◽  
Jalal Rouhi ◽  
Mohamad Rusop
Keyword(s):  
Chemical Vapor Deposition ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Carbon Film ◽  
Chemical Vapor ◽  
Amorphous Carbon Film ◽  
Boron Doped

EFFECT OF GAS PRESSURE ON THE BORON-DOPED HYDROGENATED AMORPHOUS CARBON THIN FILMS GROWN BY RADIO FREQUENCY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION

2006 ◽  
Vol 13 (01) ◽  
pp. 7-12 ◽  
Author(s):  
M. RUSOP ◽  
S. ABDULLAH ◽  
J. PODDER ◽  
T. SOGA ◽  
T. JIMBO
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Radio Frequency Plasma ◽  
Boron Doped ◽  
Frequency Plasma ◽  
Hydrogenated Amorphous ◽  
Deposited Films

Boron-doped hydrogenated amorphous carbon ( a-C:B:H ) thin films have been deposited by radio frequency plasma-enhanced chemical vapor deposition (r.f. PECVD) with a frequency of 13.56 MHz at room temperature using pure methane as a precursor of carbon source mixed with hydrogen ( H 2) as a carrier gas. The films were prepared by varying the r.f. power, different gas flow rates of CH 4, and partial pressure of mixed gas ( CH 4/ H 2) using boron as a solid target. The thickness, structural bonding, and optical properties of the as-deposited films were studied by Alpha-step surface profiler, Raman spectroscopy (Raman), Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy, and UV–visible spectroscopy. It was found that changing the deposition pressure in addition of using solid boron target in the r.f. PECVD process has a profound effect on the properties of the deposited films as evidenced from their Raman scattering and optical results. The grown a-C:B:H films were found to be smooth and their thicknesses were in the range of 200 to 400 nm for 1 h of deposition time. Films deposited at lower pressure appear brownish in color, whereas those deposited at higher pressure appear pale yellowish. The as-deposited film was found to be dominated by trigonal (sp2) rather than tetrahedral (sp3), which might be due to the formation of small crystallites. The optical band gap is found to be reduced from 2.60 to 1.62 eV as the partial pressure of CH 4/ H 2 gas is reduced.

Diamond Nucleation During Biased Chemical Vapor Deposition

1992 ◽  
Vol 280 ◽  
Author(s):  
Roseann Csencsits ◽  
Janet Rankin ◽  
Rachel E. Boekenhauer ◽  
Michael K. Kundmann ◽  
Brian W. Sheldon
Keyword(s):  
Chemical Vapor Deposition ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Carbon Film ◽  
Chemical Vapor ◽  
Amorphous Film ◽  
Amorphous Layer ◽  
Carbon Layer ◽  
Diamond Nucleation

ABSTRACTThe initial stages of bias-enhanced chemical vapor deposition (CVD) of diamond were investigated in a microwave-plasma system. Samples were characterized with TEM and concurrent electron energy loss spectroscopy (EELS) to characterize chemical bonding in the deposited material. The results show that a thin amorphous carbon film is deposited during biasing, and that diamond nucleation occurs on this amorphous film. Isolated regions of crystalline SiC within the amorphous layer were also observed at longer bias times. These regions apparently form by a reaction between the amorphous carbon layer and the silicon substrate.

Microstructure of Carbon Film Deposited Using Hot-Filament Chemical Vapor Deposition

2015 ◽  
Vol 48 (6) ◽  
pp. 104-109
Author(s):  
Youn-Joon Baik ◽  
Do-Hyun Kwon ◽  
Jong-Keuk Park ◽  
Wook-Seong Lee
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Carbon Film ◽  
Chemical Vapor ◽  
Hot Filament
Sign in / Sign up

Export Citation Format

Share Document