scholarly journals The Structure of Al/GaAs Interfaces

1986 ◽  
Vol 77 ◽  
Author(s):  
Zuzanna Liliental-Weber ◽  
C. Nelson ◽  
R. Gronsky ◽  
J. Washburn ◽  
R. Ludeke
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
Molecular Beam Epitaxy ◽  
Substrate Temperature ◽  
Epitaxial Growth ◽  
Gaas Substrate ◽  
Molecular Beam ◽  
High Resolution Electron Microscopy ◽  
Resolution Electron ◽  
Molecular Beam Epitaxy Chamber

ABSTRACTThe structure of Al/GaAs interfaces was investigated by high resolution electron microscopy. The Al layers Were deposited in a molecular beam epitaxy chamber with a vacuum base pressure of <1×10∼8 Pa. The GaAs substrate temperature varied during Al deposition from -30°C to 400°C. Deposition of Al on cold substrates £25°C resulted in epitaxial growth of (001) Al on (001) GaAs. Droplets of Ga were observed in samples with the substrate temperature at -30°C (1×2) and 0°C (c(2×8)). Postannealing of the last sample caused formation of the AlGaAs phase. Deposition of Al on hot substrates (150°C and 400°C) resulted in the formation of the AlGaAs phase, which separated (110) oriented Al from (001)GaAs.

A HREM study of V/Al2O3 interface

1992 ◽  
Vol 50 (1) ◽  
pp. 146-147
Author(s):  
Y. Ikuhara ◽  
P. Pirouz ◽  
A. H. Heuer ◽  
S. Yadavalli ◽  
C. P. Flynn
Keyword(s):  
Electron Microscopy ◽  
Electron Microscope ◽  
High Resolution ◽  
Substrate Temperature ◽  
Molecular Beam ◽  
High Resolution Electron Microscopy ◽  
Interface Structure ◽  
Cross Sectional ◽  
Plan View ◽  
Resolution Electron

The interface structure between vanadium and the R-plane of sapphire (α-Al2O3) was studied by conventional and cross-sectional high resolution electron microscopy (HREM) to clarify the atomic structure of the interface.A 57 nm thick vanadium film was deposited on the (1102) (R) plane of sapphire by molecular beam epitaxy (MBE) at a substrate temperature of 920 K in a vacuum of 10-10torr. The HREM observations of the interface were done from three directions: two cross-sectional views (parallel to [0221]Al2O3 and [1120]Al2O3) and a plan view (parallel to [2201]Al2O3) by a top-entry JEOL 4000EX electron microscope (400 kV).

High‐resolution electron microscopy study of (Ca,Sr)F2/GaAs grown by molecular‐beam epitaxy

1987 ◽  
Vol 61 (6) ◽  
pp. 2410-2412 ◽  
Author(s):  
Hélène Héral ◽  
Louis Bernard ◽  
André Rocher ◽  
Chantal Fontaine ◽  
Antonio Munoz‐Yague
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
High Resolution Electron Microscopy ◽  
Microscopy Study ◽  
Electron Microscopy Study ◽  
Resolution Electron

EPITAXY OF CdTe ON (100) GaAs

1985 ◽  
Vol 56 ◽  
Author(s):  
L. A. KOLODZIEJSKI ◽  
R. L. GUNSHOR ◽  
N. OTSUKA ◽  
C. CHOI
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
Strong Interaction ◽  
Gaas Substrate ◽  
Specific Growth ◽  
Lattice Mismatch ◽  
High Resolution Electron Microscopy ◽  
Resolution Electron ◽  
Selection Of

AbstractTwo epitaxial orientations [(111) and (100)] of CdTe are grown on (100) GaAs in the presence of a 14.6% lattice mismatch. Consistent nucleation of a selected orientation is achieved by employing specific growth techniques. The growth techniques for selection of both orientations are described. High resolution electron microscopy has been used to investigate the interface between the CdTe epilayer and the GaAs substrate. For the (111) orientation strong interaction exists between the epitaxial deposit and the substrate, whereas a weakened interaction between deposit and substrate induces the (100) orientation.

Dependence of Mo/Si Multilayer Morphology on Deposition Angle

1989 ◽  
Vol 160 ◽  
Author(s):  
Yuanda Cheng ◽  
Mary Beth Stearns ◽  
David J. Smith
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
Substrate Temperature ◽  
High Resolution Electron Microscopy ◽  
Growth Conditions ◽  
Columnar Growth ◽  
Cross Sectional ◽  
Resolution Electron ◽  
Deposition Angle

AbstractStudies have been made of the dependence of the structure on the deposition angle and the substrate temperature of a series of Mo/Si multilyers fabricated in a UHV system by e-beam evaporation. The detailed morphology was determined by cross-sectional high resolution electron microscopy. Columnar growth in the crystalline Mo layers was found to follow the tangent rule. The overall quality of the multilayers was found to depend strongly on the growth conditions.

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