Slow Degradation of Hydrogenated Amorphous Silicon Photoconductivity Under Pulsed Illumination

1999 ◽  
Vol 557 ◽  
Author(s):  
Stephan Heck ◽  
Howard M. Branz

AbstractWe degraded hydrogenated amorphous silicon (a-Si:H) using red light pulses of 32 microseconds to 2 milliseconds. These metastable photoconductivity degradations were compared to degradation with continuous light of the same intensity and same exposure time. For a given integrated exposure time we observe higher degraded photoconductivities (by up to 40 %) as we shorten the pulses. For example, to obtain the same amount of degradation with 120 microsecond pulses as with continuous illumination, the integrated sample exposure time must be doubled. Experiments were conducted to exclude thermal effects. Our result cannot be explained with a simple recombination-driven degradation mechanism, because electron and hole populations rise and fall to steady-state values in only a few microseconds. We conclude that carrier recombination creates a more proximate precursor to metastable degradation of a-Si:H. When illumination begins, this precursor's density rises more slowly than the density of photocarriers and therefore degradation is delayed.

2000 ◽  
Vol 609 ◽  
Author(s):  
Stephan Heck ◽  
Howard M. Branz

ABSTRACTIllumination of hydrogenated amorphous silicon (a-Si:H) samples with short (e.g., 40 microsecond) pulses of red light produces a smaller metastable absorption increase in the defect region than continuous illumination of the same intensity for the same integrated exposure time. The defect absorption was measured at 1.3 and 1.4 eV by use of the constant photocurrent method (CPM). This smaller degradation is also observed in the photoconductivity. Careful measurement of the film temperature with several techniques confirm that the film temperature rises by less than 5 °C, under continuous illumination. However, several experiments suggest that the suppressed degradation during pulsed illumination is caused primarily by annealing during the dark time between pulses, even at 15 to 26 °C.


1993 ◽  
Vol 297 ◽  
Author(s):  
Nobuhiro Hata ◽  
Gautam Ganguly ◽  
Akihisa Matsuda

Measurements of the steady-state defect density (Nst) in hydrogenated amorphous silicon under illumination of pulse-laser light, as well as of continuous light, were carried out; and the dependence of Nst on the effective rate of carrier generation (G) is presented. The values of G ranged from 8 x 1021 to 2.4 × 1023 cm-3 s-1, while the illumination temperature was kept at 30 °C or at 105 °C. The results showed trends of Nst increasing with G similarly to the trends in the literature, but covered a higher and wider G range, and fitted a defect model which assumes a limited number of possible defect states.


1997 ◽  
Vol 467 ◽  
Author(s):  
H. Hata ◽  
T. Kamei ◽  
H. Okamoto ◽  
A. Matsuda

ABSTRACTExperimental results on structural change other than defect creation upon light-soaking of hydrogenated amorphous silicon (a-Si:H) are reported. A-Si:H films were light-soaked with laser pulses or with continuous (cw) light to steady-states, and then annealed at 170 °C in vacuum. The changes in electro-absorption (EA) signal, and defect density (Nd) from subgap absorption were measured as functions of light-soaking/annealing time. The results are: (1) EA ratio, which is defined as the ratio of anisotropie to isotropie components in EA signal, increases upon light-soaking with a time constant shorter by almost two orders of magnitude than that for Nd increase, and (2) shows saturation when extensively light-soaked. (3) The saturated values of EA ratio are comparable for both pulsed and cw light-soaking. (4) Both the EA ratio and Nd show recovery to the values in the annealed states. It is suggested that light-soaking causes a structural change in a short time, as manifested by EA ratio, and this changed structure works as the pathway leading to the defect creation. Thermal annealing is also discussed.


1992 ◽  
Vol 258 ◽  
Author(s):  
Howard M. Branz ◽  
Sally E. Asher ◽  
Brent P. Nelson

ABSTRACTWe measure the light-enhancement of D diffusion in hydrogenated amorphous silicon and determine that the mechanism for the effect is an increase of the rate of Si-D bond breaking under illumination. We exclude light-induced heating of the sample and light-induced excitation of D between dissimilar materials as sources of the light-enhancement. It is a bulk effect, most likely caused by excess carriers. We are able to observe the light-induced effect with 380 mW-cm-2 of red light, an intensity only slightly larger than the intensity normally used to induce the Staebler-Wronski effect. At room temperature, the effect is unobservable and we derive an upper bound of 2 × 10-8 photon-1 for the efficiency of light-induced Si-D bond breaking. Implications for the Staebler-Wronski effect are discussed.


2002 ◽  
Vol 715 ◽  
Author(s):  
Howard M. Branz ◽  
Yueqin Xu ◽  
Stephan Heck ◽  
Qi Wang ◽  
Wei Gao ◽  
...  

AbstractWe observe improved photoconductivity stability against light-soaking in hydrogenated amorphous silicon thin films as a result of an ultraviolet (UV) illumination and etch treatment. UV-etch treated samples begins with red-light photoconductivities inferior to that of a control sample which is only etched. After less than an hour of 1 sun red light-soaking, the photoconductivity of the etched-only control falls below that of the UV-etch treated sample. After 2 to 3 days light soaking, the UV-etch films can have a photosensitivity 20 to 38% above their control. We observe no corresponding improvement of defect optical absorption by constant photocurrent method spectroscopy. The UV-etch treatment also produces small improvements in the stabilized open-circuit voltage of Schottky barier solar cells. We speculate that mobile hydrogen produced during UV illumination is penetrating the film and improving stability.


1981 ◽  
Vol 42 (C4) ◽  
pp. C4-773-C4-777 ◽  
Author(s):  
H. R. Shanks ◽  
F. R. Jeffrey ◽  
M. E. Lowry

Sign in / Sign up

Export Citation Format

Share Document