CCVD: Low-Cost Vapor-Deposition of Thin Films in Open Atmosphere

1998 ◽  
Vol 555 ◽  
Author(s):  
Jerome J. Schmitt
Keyword(s):  
Vapor Deposition ◽  
Low Cost ◽  
Continuous Production ◽  
Chemical Vapor ◽  
Ceramic Coatings ◽  
Inorganic Materials ◽  
Operating Costs ◽  
Open Atmosphere ◽  
Environmentally Friendly Process ◽  
Continuous Production Line

AbstractThe new, patented Combustion Chemical Vapor Deposition (CCVD) process holds promise for low cost, high throughput manufacturing of thin film ceramic coatings with composition and microstructure tailored for specific applications in electronic, optic, anti-corrosion and anti-wear applications. The flame-based CCVD process is an open-air, non-vacuum, environmentally friendly process with the ability to produce coatings of equal or superior quality to those produced by conventional vacuum-based methods. Capital and operating costs for CCVD coating systems are significantly lower than, for example, conventional CVD and PVD technologies. As an open-atmosphere process, ccvD can be easily implemented in a continuous production line environment, avoiding the need for vacuum load-locks. MicroCoating Technologies has used CCVD to deposit over 60 different inorganic materials onto a variety of substrates ranging from metals and polymers to ceramics. Multi-layered films of complex composition have been achieved with excellent stoichiometric control. We review the CCVD process and characteristics of representative coatings

High-Temperature Superconducting Tapes Deposited by the Non-Vacuum, Low-Cost Combustion Chemical Vapor Deposition Technique

2000 ◽  
Vol 659 ◽  
Author(s):  
Marvis K. White ◽  
Ian H. Campbell ◽  
Adam C. King ◽  
Steve L. Krebs ◽  
Dave S. Mattox ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
High Temperature ◽  
Vapor Deposition ◽  
Low Cost ◽  
High Temperature Superconductors ◽  
Continuous Production ◽  
Chemical Vapor ◽  
Capital Requirements ◽  
Current Status ◽  
Vapor Deposition Technique

ABSTRACTThe enormous technological potential of high-temperature superconductors (HTS) was realized immediately following their discovery in 1986, yet these materials largely remain laboratory curiosities as scientists struggle to scale from coupons to long lengths of practical coated conductor. Although both vacuum and non-vacuum processes are being investigated for commercial production, low-throughput vacuum techniques were the first to succeed in producing the buffer and superconducting layers necessary for superconducting tape with high critical currents. However, vacuum processes are not only expensive but impractical when addressing the needs for rapid production of kilometer lengths of wire. The innovative Combustion Chemical Vapor Deposition (CCVD) method used with the Rolling Assisted Biaxially Textured Substrates (RABiTS™) technology has shown significant promise in fabricating the multi-layer structures necessary for successful HTS tape while overcoming many of the shortcomings of traditional vacuum techniques. The key advantage of the CCVD technology is its ability to deposit high quality thin films in the open atmosphere using inexpensive precursor chemicals in solution. As a result, continuous, production-line manufacturing is possible with significantly reduced capital requirements and operating costs when compared to competing vacuum-based technologies. The current status of development for production of long lengths of high-temperature superconductors using CCVD will be discussed.

scholarly journals The Progress on Low-Cost, High-Quality, High-Temperature Superconducting Tapes Deposited by the Combustion Chemical Vapor Deposition Process

2001 ◽  
Vol 689 ◽  
Author(s):  
Shara S. Shoup ◽  
Marvis K. White ◽  
Steve L. Krebs ◽  
Natalie Darnell ◽  
Adam C. King ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
High Temperature ◽  
Critical Current Density ◽  
Buffer Layer ◽  
Critical Current ◽  
Vapor Deposition ◽  
Low Cost ◽  
Chemical Vapor ◽  
High Critical Current Density ◽  
High Quality

ABSTRACTThe innovative Combustion Chemical Vapor Deposition (CCVD) process is a non-vacuum technique that is being investigated to enable next generation products in several application areas including high-temperature superconductors (HTS). In combination with the Rolling Assisted Biaxially Textured Substrate (RABiTS) technology, the CCVD process has significant promise to provide low-cost, high-quality lengths of YBCO coated conductor. The CCVD technology has been used to deposit both buffer layer coatings as well as YBCO superconducting layers. A buffer layer architecture of strontium titanate and ceria have been deposited by CCVD on textured nickel substrates and optimized to appropriate thicknesses and microstructures to provide templates for growing PLD YBCO with high critical current density values. The CCVD buffer layers have been scaled to meter plus lengths with good epitaxial uniformity along the length. A short sample cut from one of the lengths enabled high critical current density PLD YBCO. Films of CCVD YBCO superconductors have been grown on single crystal substrates with critical current densities over 1 MA/cm2. Work is currently in progress to combine both the buffer layer and superconductor technologies to produce high-quality coupons of HTS tape made entirely by the non-vacuum CCVD process.

Low-cost combustion chemical vapor deposition of epitaxial buffer layers and superconductors

1999 ◽  
Vol 9 (2) ◽  
pp. 2426-2429 ◽  
Author(s):  
S.S. Shoup ◽  
S. Shanmugham ◽  
D. Cousins ◽  
A.T. Hunt ◽  
M. Paranthaman ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Low Cost ◽  
Chemical Vapor ◽  
Buffer Layers

Progress in Catalytic Preparation of Carbon/Carbon Composites

2013 ◽  
Vol 634-638 ◽  
pp. 2004-2008
Author(s):  
Bing Ju Li ◽  
Jun Li ◽  
Lei Shi ◽  
Zhou Jian Tan ◽  
Ji Qiao Liao
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Catalytic Properties ◽  
Low Cost ◽  
Chemical Vapor ◽  
Carbon Composites ◽  
Catalytic Chemical Vapor Deposition ◽  
Vapor Deposition Technique ◽  
Development Tendency ◽  
Published Research

This paper reviewed published research into catalytic fabrication techniques and recent progresses of carbon/carbon (C/C) composites. It’s described the catalytic chemical vapor deposition theory and reviewed the catalytic properties of different metal catalysts. Merits and demerits of the traditional chemical vapor deposition, improved chemical vapor deposition and other new rapid densification techniques were analyzed. The new densification techniques are to shorten the preparation cycle, but most of them are limited in the laboratory with application problems. Finally, the prospect on the application and development tendency of improved catalytic chemical vapor deposition technique is put forward in the rapid low cost fabrication of C/C composites in the future.

Characterization of Si-DLC films synthesized by low cost plasma-enhanced chemical vapor deposition

2020 ◽  
Vol 33 ◽  
pp. 1997-2002 ◽  
Author(s):  
Igor A. Salimon ◽  
Aleksandr A. Temirov ◽  
Ilya V. Kubasov ◽  
Elena A. Skryleva ◽  
Aleksandr M. Kislyuk ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Low Cost ◽  
Chemical Vapor

Numerical Model of Template-Based Chemical Vapor Deposition Processes to Manufacture Carbon Nanotubes for Biological Devices

2015 ◽  
Author(s):  
Yashar Seyed Vahedein ◽  
Michael G. Schrlau
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Process Parameters ◽  
Flow Rate ◽  
Vapor Deposition ◽  
Carbon Nanostructures ◽  
Numerical Models ◽  
Fluid Dynamic ◽  
Low Cost ◽  
Chemical Vapor

Carbon nanotubes (CNTs) hold significant promise in the fields of efficient drug delivery and bio-sensing for disease treatment because of their unique properties. In our lab, single and arrayed CNT-tipped devices are manufactured by deposition of carbon on the heated surfaces of templates using chemical vapor deposition (Template-Based Chemical Vapor Deposition, TB-CVD). Experimental results show CNT formation in templates is controlled by TB-CVD process parameters such as flow rate and temperature. However, there is a need for a more comprehensive and low cost way to characterize the flow in the furnace in order to understand how process parameters may affect CNT formation. In this report, 2D and 3D numerical models with Quadrilateral grids were developed using computational fluid dynamic (CFD) commercial codes. Velocity patterns and flow regimes in the tube were compared with experimental data. In addition, statistical techniques were employed to study temperature profiles and velocity patterns in the furnace as a function of flow rate. The outcome of this work will help to elucidate the TB-CVD process and facilitate the efficient manufacture of carbon nanostructures from a variety of templates. The results are broadly applicable to the manufacturing of CNTs and other nanostructured devices used in energy and biomedical fields, including CNT-based devices used in biological applications.

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