The Effects of Ground and Space Processing on the Properties of Organic, Polymeric, and Colloidal Materials

1998 ◽  
Vol 551 ◽  
Author(s):  
Donald O. Frazier ◽  
Mark S. Paley ◽  
Benjamin G. Penn ◽  
Hossin A. Abdeldayem ◽  
David D. Smith ◽  
...  

AbstractIn recent years, a great deal of interest has been directed toward the use of organic materials in the development of high-efficiency optoelectronic and photonic devices. There is a myriad of possibilities among organic materials, which allows flexibility in the design of unique structures with a variety of functional groups. The use of nonlinear optical (NLO) organic materials as thin-film waveguides allows full exploitation of their desirable qualities by permitting long interaction lengths and large susceptibilities allowing modest power input. There are several methods in use to prepare thin films such as Langmuir-Blodgett (LB) and self-assembly techniques,2-4 vapor deposition.5-7 growth from sheared solution or melt,8,9 and melt growth between glass plates.10 Organic-based materials have many features that make them desirable for use in optical devices, such as high second- and third-order nonlinearity, flexibility of molecular design, and damage resistance to optical radiation. However, processing difficulties for crystals and thin films has hindered their use in devices.We discuss the potential role of microgravity processing of a few organic and polymeric materials. It is of interest to note how materials with second- and third-order NLO behavior may be improved in a diffusion-limited environment and ways in which convection may be detrimental to these materials. We focus our discussion on third-order materials for all-optical switching, and second-order materials for frequency conversion and electro-optics. The goal of minimizing optical loss obviously depends on processing methods. For solution-based processes, such as solution crystal growth and solution photopolymerization, it is well known that thermal- and solutal-density gradients can initiate buoyancy-driven convection. Resultant fluid flows can affect transport of material to and from growth interfaces and become manifest in the morphology and homogeneity of the growing film or crystal. Likewise, buoyancy-driven convection can hinder production of defect-free, high-quality crystals or films during crystal and film growth by vapor deposition.

2009 ◽  
Vol 23 (28) ◽  
pp. 3361-3368
Author(s):  
HELIANG FAN ◽  
XINQIANG WANG ◽  
QUAN REN ◽  
TINGBIN LI ◽  
JING SUN ◽  
...  

A series of polymeric thin films with BFDT (BFDT = 4,5-bis(foroylsulfanyl)-1,3-dithiole-2-thione) doped in PMMA (polymethylmethacrylate) were fabricated by means of spin-coating on quartz substrate. The third-order nonlinear optical properties of the films were investigated by Z-scan technique at 532 nm wavelength with 20 ps pulse width. The influences of doping concentration for third-order nonlinearity were also studied. A self-defocusing effect was observed from the Z-scan curves and the nonlinear refractive index of the film increases with the increase in doping concentration. Our results suggest that considerable nonlinear optical properties were found in BFDT. In addition, it was found that the nonlinear coefficient of the BFDT-doped PMMA thin film was about two orders of magnitude larger than that of homologous materials with organic solvents. By analysis, we can conclude that the material is a potential candidate for applications of nonlinear optics and can be considered in the fabrication of all-optical switching devices, etc.


1993 ◽  
Vol 310 ◽  
Author(s):  
Thomas M. Graettinger ◽  
P. A. Morris ◽  
R. R. Woolcotit ◽  
F. C. Zumsteg ◽  
A. F. Chow ◽  
...  

AbstractPotassium niobate, KNbO3, possesses high nonlinear optical coefficients making it a promising material for frequency conversion into the visible wavelength range. While epitaxial thin films of KNbO3 have been reported [1,2], only limited data exists concerning the optical loss mechanisms and nonlinear optical properties of these films. In this study, epitaxial thin films of KNbO3 have been grown using ion beam sputter deposition and evaluated in terms of their microstructures and optical properties. Characterization of the microstructures of these films includes the in-plane epitaxial relationship to the substrate. The relationships between the growth parameters and microstructures developed to the indices of refraction and the optical losses (absorption and scattering) are discussed.


MRS Bulletin ◽  
1997 ◽  
Vol 22 (10) ◽  
pp. 28-31 ◽  
Author(s):  
T-M. Lu ◽  
J.A. Moore

For devices with feature sizes below 0.18 μm, it is desirable to have materials with a dielectric constant below 2.5 as interlayer dielectrics. Polymeric materials are possible candidates. There are two main strategies to grow polymeric films. The most widely used method is the spin-on technique. The other method is by vapor deposition. Although vapor deposition is less common, it has several attractive features that look quite promising, especially when the wafer size becomes very large.There are several advantages to vapor-deposited polymers:(1) The deposition of the polymers is a dry process. It is solvent-free and does not produce waste. No remedial measures are necessary to take care of the waste. The process is attractive from both energy-conservation and environmental considerations.(2) They can provide an extremely uniform coating over a very large area. For 200-mm wafers, for example, one can achieve better than 2% uniformity for vapor-deposited parylene (a type of polymer to be described later) films. Similar uniformity can be expected for future 300-mm wafers.(3) Many vapor-deposited polymers possess superior gap-filling capability. Small vias and trenches of very high aspect ratios can be filled without voids.There are some shortcomings in vapor deposition of polymeric thin films. First of all, except for some special cases, processing issues for these materials are not well-studied. Manufacturing equipment is not well-developed.


Author(s):  
Jason R. Heffelfinger ◽  
C. Barry Carter

Yttria-stabilized zirconia (YSZ) is currently used in a variety of applications including oxygen sensors, fuel cells, coatings for semiconductor lasers, and buffer layers for high-temperature superconducting films. Thin films of YSZ have been grown by metal-organic chemical vapor deposition, electrochemical vapor deposition, pulse-laser deposition (PLD), electron-beam evaporation, and sputtering. In this investigation, PLD was used to grow thin films of YSZ on (100) MgO substrates. This system proves to be an interesting example of relationships between interfaces and extrinsic dislocations in thin films of YSZ.In this experiment, a freshly cleaved (100) MgO substrate surface was prepared for deposition by cleaving a lmm-thick slice from a single-crystal MgO cube. The YSZ target material which contained 10mol% yttria was prepared from powders and sintered to 85% of theoretical density. The laser system used for the depositions was a Lambda Physik 210i excimer laser operating with KrF (λ=248nm, 1Hz repetition rate, average energy per pulse of 100mJ).


1989 ◽  
Vol 162 ◽  
Author(s):  
J. A. Freitas ◽  
S. G. Bishop

ABSTRACTThe temperature and excitation intensity dependence of photoluminescence (PL) spectra have been studied in thin films of SiC grown by chemical vapor deposition on Si (100) substrates. The low power PL spectra from all samples exhibited a donor-acceptor pair PL band which involves a previously undetected deep acceptor whose binding energy is approximately 470 meV. This deep acceptor is found in every sample studied independent of growth reactor, suggesting the possibility that this background acceptor is at least partially responsible for the high compensation observed in Hall effect studies of undoped films of cubic SiC.


2011 ◽  
Vol E94-C (2) ◽  
pp. 157-163 ◽  
Author(s):  
Masakazu MUROYAMA ◽  
Ayako TAJIRI ◽  
Kyoko ICHIDA ◽  
Seiji YOKOKURA ◽  
Kuniaki TANAKA ◽  
...  

2013 ◽  
Vol E96.C (3) ◽  
pp. 374-377 ◽  
Author(s):  
Kazuo SENDA ◽  
Tsuyoshi MATSUDA ◽  
Kuniaki TANAKA ◽  
Hiroaki USUI

Shinku ◽  
1997 ◽  
Vol 40 (8) ◽  
pp. 660-663
Author(s):  
Hideo OKAYAMA ◽  
Tsukasa KUBO ◽  
Noritaka MOCHIZUKI ◽  
Akiyoshi NAGATA ◽  
Hiromu ISA

2012 ◽  
Vol 27 (3) ◽  
pp. 327-331
Author(s):  
Qiang LU ◽  
Fang-Ming CUI ◽  
Chen-Yang WEI ◽  
Zi-Le HUA ◽  
Chang-Qing DONG

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