Characterization of Pulsed-Laser Deposited Amorphous Diamond Films by Spectroscopic Ellipsometry

1998 ◽  
Vol 526 ◽  
Author(s):  
G. E. Jellison ◽  
D. B. Geohegan ◽  
D. H. Lowndes ◽  
A. A. Puretzky ◽  
V. I. Merkulov

AbstractSpectroscopic ellipsometry is used to characterize amorphous diamond, also known as tetrahedral amorphous carbon, (ta-C) films grown by pulsed laser ablation. The ellipsometry data is collected with the two-modulator generalized ellipsometer, which measures all three parameters required to characterize isotropic samples, as well as additional parameters used to characterize strain-induced birefringence of the focusing optics. Lenses are used to focus the light spot to an ellipse 0.7 × 2.0 mm2, allowing us to perform several ellipsometric measurements across the profile of ta-C films grown on 7.5 cm diameter Si wafers. The spectroscopic ellipsometry data are fit using a model of the ta-C dielectric function based on the Tauc band edge and the Lorentz expression of the dielectric function for an ensemble of atoms. These fits are used to determine the thicknesses of the rough surface layer, the ta-C film, and the interface layer, as well as the energy gap of the film. Comparisons are made with fits to an earlier formulation due to Forouhi and Bloomer [Phys. Rev. B 34, 7018 (1986).]. In addition to being Kramers-Kronig consistent, the Tauc-Lorentz formulation fits the ta-C data better.

2004 ◽  
Vol 809 ◽  
Author(s):  
N. V. Nguyen ◽  
J. E. Maslar ◽  
Jin-Yong Kim ◽  
Jin-Ping Han ◽  
Jin-Won Park ◽  
...  

ABSTRACTThe crystalline quality of bonded Silicon-On-Insulator (SOI) wafers were examined by spectroscopic ellipsometry and Raman spectroscopy. Both techniques detect slight structural defects in the SOI layer. If a pure crystalline silicon dielectric function is assumed for the SOI layer, the spectroscopic ellipsometry data fitting yields an unacceptably large discrepancy between the experimental and modeled data. The best fits for all the samples result in a dielectric function of the SOI layer that consists of a physical mixture of crystalline silicon and about 4 % to 7 % of amorphous silicon. Using such a mixture indicates that there are still some defects in the SOI layer when compared with the high-quality bulk crystalline silicon. This observation is further supported by Raman spectroscopy measurements. The Raman spectra of all SOI samples exhibit a feature at about 495 cm−1 that is not observed in the crystalline silicon spectrum. Features similar to the 495 cm−1 feature have been reported in the literature and attributed to dislocations or faults in the silicon lattice.


2005 ◽  
Vol 351 (2) ◽  
pp. 116-123 ◽  
Author(s):  
Vladislav Dřínek ◽  
Karel Vacek ◽  
Josef Pola ◽  
Gleb Yuzhakov ◽  
Olga Šolcová ◽  
...  

2014 ◽  
Vol 118 (1) ◽  
pp. 275-281 ◽  
Author(s):  
Pedro Sá ◽  
José Barbosa ◽  
Isabel T. Gomes ◽  
Jorge A. Mendes ◽  
João Ventura ◽  
...  

2000 ◽  
Vol 114 (5) ◽  
pp. 249-253 ◽  
Author(s):  
A.R James ◽  
A Pignolet ◽  
S Senz ◽  
N.D Zakharov ◽  
D Hesse

2002 ◽  
Vol 197-198 ◽  
pp. 343-347 ◽  
Author(s):  
M.F Vignolo ◽  
I Avram ◽  
S Duhalde ◽  
C Morales ◽  
T Pérez ◽  
...  

2021 ◽  
Vol 1021 ◽  
pp. 171-180
Author(s):  
Munaf S. Majeed ◽  
Rabea Q. Nafil ◽  
Marwa F. Abdul Jabbar ◽  
Kadhim H. Suffer

We prepared Zinc oxide nanomaterial employing PLA (pulsed laser ablation) technique. A pure Zn target was immersed in ultra-pure water (UPW) and it was subjected to several pulses (1st. and 2nd. harmonic) of the pumping Nd: YAG laser. The influence of changing laser’s wavelength (1064, 532) nm on the characterization of the produced nanoparticles was studied. The results obtained from studying the structure, topography, and morphology of the product showed that the particles have a hexagonal shape. Also, changing the wavelength of the laser from 532nm to 1064nm leads to size reduction and density increasing of the nanoparticles.


2011 ◽  
Vol 257 (12) ◽  
pp. 5278-5282 ◽  
Author(s):  
A.S. Nikolov ◽  
N.N. Nedyalkov ◽  
R.G. Nikov ◽  
P.A. Atanasov ◽  
M.T. Alexandrov

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