Determination of the Mechanical Properties of Polysilicon Thin Films Using Bulge Testing

1997 ◽  
Vol 505 ◽  
Author(s):  
S. Jayaraman ◽  
R. L. Edwards ◽  
K. J. Hemker
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Elastic Constants ◽  
Polycrystalline Silicon ◽  
Silicon Substrates ◽  
Bulge Testing ◽  
Good Agreement

ABSTRACTUsing standard deposition and micromachining techniques, silicon substrates with square and rectangular windows covered with membranes of polycrystalline silicon (polysilicon) have been fabricated. Pressure-displacement curves obtained during the bulge testing of membranes with the above geometries have been used to determine the elastic constants E and v of the polysilicon. The results obtained (E = 162± 4 GPa and v = 0.19±0.03) are in good agreement with literature values for bulk polycrystalline silicon.

Relating mechanical testing and microstructural features of polysilicon thin films

1999 ◽  
Vol 14 (3) ◽  
pp. 688-697 ◽  
Author(s):  
S. Jayaraman ◽  
R. L. Edwards ◽  
K. J. Hemker
Keyword(s):  
Thin Films ◽  
Elastic Constants ◽  
Crystalline Silicon ◽  
Silicon Substrates ◽  
X Ray Diffraction ◽  
Silicon Thin Films ◽  
Bulge Testing ◽  
Transmission Electron ◽  
Wide Range ◽  
Out Of Plane

Polycrystalline silicon thin films (polysilicon) have been deposited on single crystalline silicon substrates, and square and rectangular windows have been etched into these substrates using standard micromachining techniques. Pressure-displacement curves of the resulting polysilicon membranes have been obtained for these geometries, and this data has been used to determine the elastic constants E and v. The microstructural features of the films have been investigated by transmission electron microscopy (TEM) and x-ray diffraction. The grains were observed to be columnar and were found to have a 〈011〉 out-of-plane texture and a random in-plane grain orientation. A probabilistic model of the texture has been used to calculate the bounds of the elastic constants in the thin films. The results obtained from bulge testing (E = 162 ± 4 GPa and v = 0.20 ± 0.03) fall in the wide range of values previously reported for polysilicon and are in good agreement with the microsample tensile measurements conducted on films deposited in the same run as the present study (168 ± 2 GPa and 0.22 ± 0.01) and the calculated values of the in-plane moduli for 〈1103〉 textured films (E = 163.0–165.5 GPa and v = 0.221–0.239).

scholarly journals Advanced determination of piezoelectric properties of AlN thin films on silicon substrates

2008 ◽  
Author(s):  
J.L. Sanchez-Rojas ◽  
J. Hernando ◽  
A. Ababneh ◽  
U. Schmid ◽  
J. Olivares ◽  
...  
Keyword(s):  
Thin Films ◽  
Piezoelectric Properties ◽  
Silicon Substrates

scholarly journals The study of the mechanical properties of thin films using piezoceramic acoustic resonators

2019 ◽  
Vol 30 ◽  
pp. 07002 ◽  
Author(s):  
Andrey Teplykh ◽  
Boris Zaitsev ◽  
Irina Borodina ◽  
Alexander Semyonov ◽  
Mayya Ziangirova ◽  
...  
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Elastic Constants ◽  
Acoustic Resonator ◽  
Organic Films ◽  
Hericium Erinaceus ◽  
Acoustic Resonators

The paper describes a method for determining the properties of thin films: elastic constants, viscosity and density. The method is based on the analysis of changing the characteristics of the acoustic resonator, on the surface of which the film under study is deposited, in comparison with a free resonator. Using the described method, the properties of two organic films based on the mycelium of basidiomycete Hericium erinaceus (Bull.) Persoon were determined.

Rotating Band Pressures and Engraving Forces in 155mm Artillery Shells

1973 ◽  
Vol 95 (2) ◽  
pp. 124-129 ◽  
Author(s):  
W. F. Hartman ◽  
P. P. Stirbis
Keyword(s):  
Mechanical Properties ◽  
Analytic Method ◽  
Mechanical Stiffness ◽  
Rotating Band ◽  
Good Agreement

The forces retarding the motion of 155mm artillery shells during quasi-static engraving of the rotating band were investigated both experimentally and analytically. The analytic method was based on a determination of the pressures existing between the projectile and the gun tube and the use of this information in a frictional model of the process. The retardation forces predicted in this manner are shown to be in good agreement with the hydrostatic pressures required to engrave the projectile in quasi-static push tests. This model leads to some interesting conclusions regarding alteration of engraving forces. In particular, the model suggests that, for shells similar to those used in this study, the rotating band pressure is more dependent upon the form and mechanical properties of the band than upon the mechanical stiffness of the projectile.

Elastic Properties of Diamond Like Carbon Thin Films: a Brillouin Scattering Study

1996 ◽  
Vol 444 ◽  
Author(s):  
O. R. Monteiro ◽  
I. G. Brown ◽  
R. Sooryakumar ◽  
M. Chirita
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Elastic Constants ◽  
Brillouin Scattering ◽  
Deposition Process ◽  
Hard Coatings ◽  
Vacuum Arc ◽  
Deposition Parameters ◽  
Scattering Study ◽  
Isotropic Solids

AbstractDiamondlike carbon (DLC) thin films have been widely used as hard coatings in a variety of applications where increased wear resistance and hardness are required. Vacuum arc DLC films are among the hardest, with measured hardness values of up to 68 GPa. In our deposition process a repetitively pulsed bias voltage is applied to the substrate, which controls the energy of the incoming C ions. DLC chemical and mechanical properties are strongly affected by the energy of the depositing ions. In this paper, we relate the mechanical properties of these films to the deposition parameters, and describe our initial Brillouin scattering measurements of the elastic constants of monolithic DLC films. Evidence for bulk longitudinal and surface Rayleigh excitation in films with thickness of 50 and 500 nm has been observed. Since the DLC films are amorphous, they are modeled as isotropic solids and the elastic constants CII and C44 are derived.

The Determination of Mechanical Parameters and Residual Stresses for Thin Films Using Micro-Cantilever Beams

1988 ◽  
Vol 130 ◽  
Author(s):  
S. Hong ◽  
T. P. Weihs ◽  
J. C. Bravman ◽  
W. D. Nix
Keyword(s):  
Thin Films ◽  
Residual Stresses ◽  
Elastic Constants ◽  
Testing Machine ◽  
Elastic Response ◽  
Cantilever Beams ◽  
Mechanical Parameters ◽  
Processing Technologies ◽  
Micro Cantilever

AbstractA method for determining mechanical parameters and residual stresses for thin films is described. Multi-layer cantilever beams (LPCVD SiNx/thermal SiO2) are fabricated utilizing standard IC processing technologies and micromachining of silicon. The elastic response of the beams to imposed deflections is then measured using a Nanoindenter, a sub-micron hardness testing machine. The elastic constants of the nitride films are calculated from the force vs. deflection slope and known elastic constants of the thermal SiO2 and silicon. By measuring the curvature of the multi-layer cantilever beams with a scanning electron microscope after successive etching of the LPCVD nitride films, average and differential stresses in the films were calculated.

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