Room Temperature Growth of Conducting ZnO Films

1997 ◽  
Vol 485 ◽  
Author(s):  
S. Witanachchi ◽  
Y. Ying ◽  
A. M. Miyawa ◽  
P. Mukherjee
Keyword(s):  
Laser Ablation ◽  
Room Temperature ◽  
Zno Films ◽  
Large Area ◽  
Temperature Growth ◽  
Glass Substrates ◽  
Laser Ablation Process ◽  
Ambient Oxygen ◽  
Zn Ions ◽  
Dual Laser

AbstractSingle and dual-laser ablation techniques have been used to grow conductive ZnO films at room temperature by ablating a Zn metal target in oxygen ambient. The emission spectroscopy of the material plumes shows a significant presence of oxygen ions and Zn ions in the dual-laser ablated plume. Furthermore, dual-laser ablated plumes expanded rapidly in the radial direction resulting in large-area uniform films. The electrical properties of the films deposited on glass substrates depend critically on the ambient oxygen pressure. Conductivities of the order of 103 (ω.cm)-1 have been obtained for films deposited at room temperature by the dual-laser ablation process.

scholarly journals On-Machine Measurement for Surface Flatness of Transparent and Thin Film in Laser Ablation Process

Coatings ◽  
2020 ◽  
Vol 10 (9) ◽  
pp. 885
Author(s):  
HyungTae Kim ◽  
Yoon Jae Moon ◽  
Heuiseok Kang ◽  
Jun Yong Hwang
Keyword(s):  
Thin Film ◽  
Laser Ablation ◽  
Printed Electronics ◽  
Film Surface ◽  
Large Area ◽  
Laser Ablation Process ◽  
Laser Focusing ◽  
Surface Flatness ◽  
Continuous Surface ◽  
Printed Patterns

In printed electronics, laser ablation is used to repair defective patterns on transparent, flexible, and thin films, using high-power lasers. The distance between the film surface and laser focus is sensitive to changes as the narrow focus depth of the lens is the range of tens of microns. However, a film fixed on a conductive vacuum chuck (CVC) is always curved, owing to chucking bending; thus, laser focusing must be locally performed before ablation. Therefore, this study proposes a non-contact measurement method for the surface flatness of a transparent and thin film, to compensate for laser defocusing in a large area. The surface flatness was obtained using camera-focus points on the porous surface of the CVC. The focus points were interpolated to achieve a smooth and continuous surface flatness for chucking bending. A laser distance sensor was used to verify the surface flatness from the proposed method. The surface flatness was used to inspect the printed patterns, and to perform laser ablation on the film. The proposed method is advantageous for large-area laser ablation and is expected to become indispensable for repairing machines in printed electronics.

Room temperature growth and properties of ZnO films by pulsed laser deposition

2010 ◽  
Vol 257 (4) ◽  
pp. 1310-1313 ◽  
Author(s):  
Xiangli Ma ◽  
Jun Zhang ◽  
Jianguo Lu ◽  
Zhizhen Ye
Keyword(s):  
Pulsed Laser Deposition ◽  
Room Temperature ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Zno Films ◽  
Temperature Growth

LASER ABLATION PROCESS FOR FABRICATION OF Y1Ba2Cu3Ox THIN FILM

1995 ◽  
Vol 09 (28) ◽  
pp. 3625-3666 ◽  
Author(s):  
KENSUKE FUKUSHIMA
Keyword(s):  
Laser Ablation ◽  
Shock Front ◽  
Film Growth ◽  
Plasma Temperature ◽  
Translational Energy ◽  
Ablation Process ◽  
Film Properties ◽  
Laser Ablation Process ◽  
Ambient Oxygen ◽  
Plasma Species

For understanding the laser ablation process, the interaction between the laser beam and the target, the motion of plasma species under the various conditions, and the correlation between the film properties and the behavior of plasma species are investigated. It is suggested that by laser irradiation an energetic plasma is formed above a target and an expansion of the plasma species continuously occurs converting thermal energy to translational energy. Plasma species expand forward, colliding with ambient oxygen and lead to a formation of a shock front far from the target. Plasma temperature and the density are drastically increased due to the shock front formation. These phenomena affect film properties such as film growth orientation and surface morphology. Preferential orientation of thin films can be related with the kinetic energy of species impinging the substrate and it is found that the nucleation of outgrowths on film surfaces increases at higher oxygen pressures at which the shock front is generated above the target.

scholarly journals Highly Ionized Carbon Plasma Generation by Dual-Laser Ablation for Diamond-Like Carbon Film Growth

2000 ◽  
Vol 617 ◽  
Author(s):  
S. Witanachchi ◽  
A. M. Miyawa ◽  
P. Mukherjee
Keyword(s):  
Laser Ablation ◽  
Film Growth ◽  
Carbon Film ◽  
Plasma Temperature ◽  
Optical Emission ◽  
Carbon Films ◽  
Rapid Expansion ◽  
Laser Ablation Process ◽  
Carbon Plasma ◽  
Dual Laser

AbstractCarbon plasmas produced by excimer laser ablation show a low ionization yield of about 8-10%. The coupling of a second CO2laser pulse into the plasma in the dual-laser ablation process significantly increases the plasma temperature and the ionization. The resulting rapid expansion of the plasma gives rise to high ion kinetic energies and broader ion expansion profiles [1]. Optical emission spectroscopy and an ion probe have been used to investigate the dynamics of the carbon plasma. Single and dual-laser ablated carbon plumes have been deposited on DC-biased silicon substrates to form amorphous carbon films. The diamond-like behavior of these films was studied by Raman spectroscopy. The Raman spectra were deconvolved to gauge the effect of the density and the energy of ions on the formation of diamond-like sp3 -bonded carbon (DLC) films. The advantage offered by the dual-laser process for the growth of DLC films is discussed.

Transparent Ultraviolet Sensors Based on Magnetron Sputtered ZnO Thin Films

2013 ◽  
Vol 686 ◽  
pp. 79-85 ◽  
Author(s):  
Jian Wei Hoon ◽  
Kah Yoong Chan ◽  
Zi Neng Ng ◽  
Teck Yong Tou
Keyword(s):  
Room Temperature ◽  
Uv Light ◽  
High Substrate Temperature ◽  
Zno Thin Films ◽  
Zno Films ◽  
Dark Condition ◽  
Photocurrent Response ◽  
Glass Substrates ◽  
Current Voltage ◽  
Uv Sensors

Ultraviolet (UV) sensors have variety of applications. In this work, a new transparent UV sensor is developed based on zinc oxide (ZnO) films. The ZnO films with 350 nm thicknesses were fabricated on glass substrates by using direct current (DC) plasma magnetron sputtering technique. The ZnO UV sensors are characterised by using current-voltage (I-V) measurements at room temperature. The current is measured by applying small bias voltage under the white light, UV light (325 nm), and dark condition and the photocurrent responses extracted from the I-V measurements are compared. The transparent UV sensors based on ZnO films deposited at high substrate temperature of 450 °C exhibit most significant photocurrent response under UV irradiation.

Room‐temperature growth of AlN thin films by laser ablation

1992 ◽  
Vol 60 (18) ◽  
pp. 2234-2236 ◽  
Author(s):  
Kanekazu Seki ◽  
Xiangqun Xu ◽  
Hideo Okabe ◽  
Joan M. Frye ◽  
Joshua B. Halpern
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Room Temperature ◽  
Temperature Growth
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