Cross-sectional cathodoluminescence of GaN epitaxial films

1997 ◽  
Vol 482 ◽  
Author(s):  
M. Herrera Zaldivar ◽  
P. Fernández ◽  
J. Piqueras
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Cross Section ◽  
Central Region ◽  
Epitaxial Films ◽  
Cross Sectional ◽  
Growth Axis ◽  
Low Emission ◽  
Si Doped ◽  
Scanning Electron

AbstractCathodoluminescence (CL) in the scanning electron microscope has been used to investigate the variation along the growth axis direction of luminescence emission from epitaxial GaN films. CL spectra recorded at different positions of the sample cross-section as well as monochromatic CL images show strong spatial variations of the different luminescence emissions along the growth axis. At the buffer layer-substrate interface and at the top part of the sample, which corresponds to a Si doped epilayer, enhanced CL emission is observed as compared with the relatively low emission in the central region of the cross-section. The nature of the defects responsible for the observed CL distribution is discussed.

X-ray micro tomography in the scanning electron microscope

1978 ◽  
Vol 36 (1) ◽  
pp. 106-107 ◽  
Author(s):  
W. Brünger
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Target Surface ◽  
The Body ◽  
X Rays ◽  
Cross Sectional ◽  
X Ray ◽  
Micro Tomography ◽  
Scanning Electron

Reconstructive tomography is a new technique in diagnostic radiology for imaging cross-sectional planes of the human body /1/. A collimated beam of X-rays is scanned through a thin slice of the body and the transmitted intensity is recorded by a detector giving a linear shadow graph or projection (see fig. 1). Many of these projections at different angles are used to reconstruct the body-layer, usually with the aid of a computer. The picture element size of present tomographic scanners is approximately 1.1 mm2.Micro tomography can be realized using the very fine X-ray source generated by the focused electron beam of a scanning electron microscope (see fig. 2). The translation of the X-ray source is done by a line scan of the electron beam on a polished target surface /2/. Projections at different angles are produced by rotating the object.During the registration of a single scan the electron beam is deflected in one direction only, while both deflections are operating in the display tube.

A Working Method for Adapting the (SEM) Scanning Electron Microscope to Produce (STEM) Scanning Transmission Electron Microscope Images

2002 ◽  
Author(s):  
Edward Coyne
Keyword(s):  
Electron Microscope ◽  
High Resolution ◽  
Scanning Electron Microscope ◽  
Integrated Circuits ◽  
Theoretical Idea ◽  
Cross Sectional ◽  
Additional Advantage ◽  
Transmission Electron ◽  
Resolution Element ◽  
Scanning Electron

Abstract This paper describes the problems encountered and solutions found to the practical objective of developing an imaging technique that would produce a more detailed analysis of IC material structures then a scanning electron microscope. To find a solution to this objective the theoretical idea of converting a standard SEM to produce a STEM image was developed. This solution would enable high magnification, material contrasting, detailed cross sectional analysis of integrated circuits with an ordinary SEM. This would provide a practical and cost effective alternative to Transmission Electron Microscopy (TEM), where the higher TEM accelerating voltages would ultimately yield a more detailed cross sectional image. An additional advantage, developed subsequent to STEM imaging was the use of EDX analysis to perform high-resolution element identification of IC cross sections. High-resolution element identification when used in conjunction with high-resolution STEM images provides an analysis technique that exceeds the capabilities of conventional SEM imaging.

Features of the architectonics of the microstructure of the primary remex of Owls (Strigiformes) due to the specifics of the flight

2021 ◽  
Vol 66 (2) ◽  
pp. 232-246
Author(s):  
E. O. Fadeeva
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Cross Section ◽  
Dorsal Surface ◽  
Structural Features ◽  
Electron Microscopic Investigation ◽  
Original Research ◽  
Electron Microscopic ◽  
Microstructural Characteristics ◽  
Scanning Electron

Conducted electron microscopic investigation of the primary remex fine structure of thirteen species of Owls (Strigiformes), using a scanning electron microscope (SEM). It is shown that Owls (Strigiformes) have a number of specific primary remex microstructural characteristics. First of all, these are the features of the structure of the pennaceous barb: a cross section configuration, a pith architectonics on the cross section and longitudinal sections, a cuticular structur of the barb. A number of the unique features in the microstructure of the vanules of the pennaceous barb have been found for the first time (at the scanning electron microscope level, at a large SEM magnification). First of all, these are the structural features of the distal barbules and the structure of the apical portion of the barb with the elongated proximal barbules and the distal barbules tightly contiguous to the ramus and closed with each other. Mentioned characteristics make for the thick velvet-like dorsal surface of the vane and the presence of a complex of peculiar “bunches” (fringes) forming the cleft edge (a fringed edge) of the inner vane – exceptionally specific adaptive characteristics in Strigiformes. Рresentenced original research results suggest that Owls (Strigiformes) have a number specific microstructural characteristics of the primary remex and also a number of the unique features in the microstructure of the primary remex which reflecting the ecological and morphological adaptations conditioned by the flight specificity.

Field Emission SEM with a Newly Developed FEGUN and Conical Strongly Excited Objective Lens

2000 ◽  
Vol 6 (S2) ◽  
pp. 764-765
Author(s):  
H. Kazumori ◽  
A. Yamada ◽  
M. Mita ◽  
T. Nokuo ◽  
M. Saito
Keyword(s):  
Electron Microscope ◽  
High Resolution ◽  
Scanning Electron Microscope ◽  
Secondary Electron ◽  
Objective Lens ◽  
Probe Current ◽  
Large Samples ◽  
Low Emission ◽  
Working Distance ◽  
Scanning Electron

A newly developed cold FE-GUN which enables to us to obtain large probe current and low emission noise, and conical strongly excited objective lens has been installed on the JSM-6700F Scanning Electron Microscope (SEM). In the range of accelerating voltages from 0.5 to 15kV, this instrument has got much better resolution as compared with in-lens type SEM (Ohyama et al 1986)(Fig. 1). We can obtain high-resolution secondary electron images with large samples (ex. 150mm ϕ×10mmH).Our old type objective lens (Kazumori et al 1994) has the limitation of working distance (WD), but the new lens enables us to work at very short WD at accelerating voltage of 15kV. As a result the spherical (Cs) and chromatic (Cc) aberration constants are 1.9mm and 1.7mm respectively at a WD of 3mm.In order to get large probe current, we increased emission current and got near the distance between the t ip of emi tter and the pr inciple plane of condenser lens.

scholarly journals Photoresist cross-sectional shape change caused by scanning electron microscope-induced shrinkage

2015 ◽  
Vol 14 (3) ◽  
pp. 034001 ◽  
Author(s):  
Takeyoshi Ohashi ◽  
Tomoko Sekiguchi ◽  
Atsuko Yamaguchi ◽  
Junichi Tanaka ◽  
Hiroki Kawada
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Shape Change ◽  
Cross Sectional ◽  
Sectional Shape ◽  
Scanning Electron

Cavitation Wearing of the SUPERSTON Alloy after Laser Treatment at Cryogenic Conditions

2010 ◽  
Vol 165 ◽  
pp. 306-309 ◽  
Author(s):  
Beata Majkowska ◽  
Waldemar Serbiński
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Laser Treatment ◽  
Cross Section ◽  
Base Material ◽  
Cavitation Resistance ◽  
Laser Remelting ◽  
Rotating Disc ◽  
Cryogenic Conditions ◽  
Scanning Electron

The purpose of this paper is to demonstrate the method of laser remelting at cryogenic conditions of the SUPERSTON alloy and its influence on microstructure and cavitation wearing. The cavitation test was performed using the rotating disc facility in IPM PAN Gdansk. During the cavitation test, the mass loss of the material with different parameters of laser remelting was determined. Surface and cross-section microstructure of the SUPERSTON alloy after laser treatment and cavitation test were observed by scanning electron microscope. The cavitation resistance of the remelted SUPERSTON alloy was approximately 40% higher in comparison to the base material.

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