Grain Enhancement of Thin Silicon Layers Using Optical Processing
Keyword(s):
Low Cost
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ABSTRACTWe describe a new technique for producing large-grain, poly-Si thin films on low-cost glass substrates for solar cell applications. A layer of fine-grain poly-Si is deposited on metal-coated substrate followed by a grain enhancement using optical/thermal annealing at low temperatures (∼ 500 °C). The results show that in thin-layer silicon, less than 3 microns, grains can be formed in a short time (few minutes) with grain sizes larger than the film thickness. The possible mechanisms involved in this process are also presented.
1981 ◽
Vol 16
(1)
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pp. 11-14
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