InSb Detectors and Focal Plane Arrays on GaAs, Si, and Al203 Substrates

1996 ◽  
Vol 450 ◽  
Author(s):  
E. Michel ◽  
H. Mohseni ◽  
J. Wojkowski ◽  
J. Sandven ◽  
J. Xu ◽  
...  
Keyword(s):  
Thermal Imaging ◽  
Focal Plane ◽  
Growth Conditions ◽  
Substrate Material ◽  
Focal Plane Arrays ◽  
Electrical And Optical Properties ◽  
X Ray ◽  
Si Substrates ◽  
Sapphire Substrates ◽  
Gaas Substrates

ABSTRACTIn this paper, we report on the growth and fabrication of InSb detectors and Focal Plane Arrays (FPA's) on (100) Si, Al203, and (100) and (111) GaAs substrates for infrared (IR) imaging. Several advantages result from using GaAs, Si, or Al203. First, InSb FPA's on these materials do not require thinning as with detectors fabricated from bulk InSb. In addition, these substrates are available in larger sizes, are semi-insulating (GaAs and sapphire), and are less expensive than InSb.Optimum growth conditions have been determined and discrete devices have been fabricated on each substrate material. The structural, electrical, and optical properties were verified using x-ray, Hall, photoresponse, and photoluminescence (PL) measurements. Measured x-ray Full Widths at Half Maximum (FWHM) were as low as 55 and 100 arcsec for InSb epilayers on GaAs and Si, respectively. Hall mobilities were as high as 128,000, 95,000 and 72,000 cm2/V-sec at 200 K, 77 K, and room temperature, respectively. In addition, 77 K PL linewidths were as low as 18, 20, and 30 meV on GaAs, Si, and sapphire substrates respectively, well below the 48 meV value previously reported in the literature.In collaboration with Lockheed Martin Fairchild Systems (LMFS), IR thermal imaging has been obtained from InSb FPA's on GaAs and Si substrates. This is the first successful IR thermal imaging from heteroepitaxially grown InSb. Because of the high quality substrates, larger areas, and higher yields, this technology is very promising for challenging traditional InSb FPA hybrid technology.

Heteroepitaxial HgCdTe/CdZnTe/GaAs/Si Materials for Infrared Focal Plane Arrays

1990 ◽  
Vol 216 ◽  
Author(s):  
S.M. Johnson ◽  
J.B. James ◽  
W.L. Ahlgren ◽  
W.J. Hamilton ◽  
M. Ray ◽  
...  
Keyword(s):  
Focal Plane ◽  
High Performance ◽  
General Characteristic ◽  
Focal Plane Arrays ◽  
Misfit Dislocations ◽  
Cutoff Wavelength ◽  
X Ray Diffraction ◽  
Dislocation Interaction ◽  
X Ray ◽  
Si Substrates

ABSTRACTThe structural properties of LPE-grown HgCdTe on heteroepitaxial MOCVD-grown CdZnTe/GaAs/Si substrates were evaluated using high-resolution x-ray diffraction techniques and TEM. Large tilts {up to 4°} between CdZnTe layers and GaAs/Si substrates are a general characteristic of this heteroepitaxial system and are are attributed to the interaction of closely spaced misfit dislocations that arrange to form a tilt boundary. Either {112}CdTe or {552}CdTe can be grown on {112}GaAs/Si; the {552} was shown to result from a first-order twinning operation of {112}. Lamnella {111} microtwins in {111}CdZnTe/{100}GaAs/Si substrates, measured by x-ray techniques, are not readily propagated into the LPE-grown HgCdTe layer. The x-ray FWHM of the LPE HgCdTe is typically at least a factor of two lower than that of the Si-based substrate from annealing and due to the increased thickness of the layer; both mechanisms promote dislocation interaction and annihilation. High performance MWIR and LWIR HgCdTe 128×128 hybrid focal plane arrays were fabricated on these Si-based substrates. An array average of ROAj = 17.8 ohmcm2 for a cutoff wavelength of 10.8 μm at 78K was demonstrated.

InAs/GaSb superlattice focal plane arrays for high-resolution thermal imaging

2005 ◽  
Author(s):  
Robert Rehm ◽  
Martin Walther ◽  
Johannes Schmitz ◽  
Joachim Fleißner ◽  
Frank Fuchs ◽  
...  
Keyword(s):  
High Resolution ◽  
Thermal Imaging ◽  
Focal Plane ◽  
Focal Plane Arrays

scholarly journals X-ray investigation of polytype distribution in InAs nanowires during MBE growth

2014 ◽  
Vol 70 (a1) ◽  
pp. C748-C748
Author(s):  
Ullrich Pietsch ◽  
Andreas Biermanns ◽  
Emmanouil Dimakis ◽  
Lutz Geelhaar ◽  
Anton Davydok ◽  
...  
Keyword(s):  
Time Evolution ◽  
Stacking Faults ◽  
Growth Conditions ◽  
Growth Mode ◽  
Ex Situ ◽  
Growth Time ◽  
X Ray Diffraction ◽  
X Ray ◽  
Si Substrates ◽  
Liquid Indium

The monolithic integration of III-V semiconductors with Si is the ideal way to combine the superior optoelectronic properties of the compound semiconductors with the mature Si technology. This integration can be realized by growing epitaxially dislocation-free III-V NWs on Si substrates either in the vapor-liquid-solid (VLS) or in the vapor-solid (VS) mode associated with the presence or absence, respectively, of group-III liquid droplets on the NW tips [1]. In this work, we investigate the correlation between the growth mode and the forming polytypes in InAs NWs grown on Si(111). The growth was performed in the molecular beam epitaxy chamber of beamline 11XU at Spring8 [2], while the structural dynamics was probed by in situ x-ray diffraction. Specifically, the time evolution of the formation of wurtzite (WZ) and zincblende (ZB) polytypes was monitored during the NW growth. Despite the As-rich growth conditions, a spontaneous build-up of liquid In on Si was found to be present in the nucleation phase, where the InAs nuclei mainly grow in the WZ phase with low number of stacking faults. Shortly after the nucleation, the liquid In is consumed by the excessive As, and the growth continues in the VS mode with an increasing density of stacking faults forming in the NW crystal. The time evolution of the liquid Indium signal (Fig. (a)) correlates well with the time evolution of wurzite growth rate (Fig (b)). The latter saturates at a time where the liquid indium disappers, i.e. where the VLS changes into the VS mode, whereas the zinc-blende polytypes grow almost continuous in both VLS and VS growth mode. The dynamics of stacking faults density was determined quantitatively by ex-situ X-ray diffraction measuring thestacking fault induced increase of the peak width of wurtzite reflections at InAs nanowire samples of different length ; i.e. growth time [3].

Recent advances in heteroepitaxial Ge/Si(100) and Ge/Si(l 11)

1994 ◽  
Vol 52 ◽  
pp. 838-839
Author(s):  
J. B. Posthill ◽  
D. P. Malta ◽  
R. Pickett ◽  
M. L. Timmons ◽  
T. P. Humphreys ◽  
...  
Keyword(s):  
Focal Plane ◽  
High Mobility ◽  
Epitaxial Films ◽  
Focal Plane Arrays ◽  
Si Substrate ◽  
Large Area ◽  
Lattice Match ◽  
Temperature Growth ◽  
X Ray ◽  
Indium Bump

Heteroepitaxial Ge-on-Si could have many applications which include: high mobility p-channel fieldeffect transistors (FETs), large area Ge-based IR or X-ray detectors, or as a substrate for the growth of other epitaxial semiconductors. In particular, the close lattice match between Ge and GaAs and Ge and ZnSe offers a potential for Ge to be used as an interlayer for a GaAs/Si or ZnSe/Si technology.Additionally, with the Si substrate as the "foundation" for further epitaxial semiconductors, thereisa built-in thermal match for any device that must be intimately bonded to Si-based circuitry. Thisis particularly critical in the case of HgCdTe IR focal plane arrays that are indium bump-bonded to aSi multiplexer which will experience thermal cycling in use. This contribution briefly reviews some ofour recent results in the high temperature growth of Ge epitaxial films on Si(100) and Si(l 11) substrates which are being developed for use as a template for HgCdTe/CdZnTe growth.

Heteroepitaxial Growth of Cubic Boron Nitride on Silicon

1992 ◽  
Vol 242 ◽  
Author(s):  
G. L. Doll ◽  
T. A. Perry ◽  
J. A. Sell ◽  
C. A. TAYLORS ◽  
R. Clarke
Keyword(s):  
Cubic Boron Nitride ◽  
Pulsed Laser ◽  
Growth Conditions ◽  
Critical Value ◽  
Laser Deposition ◽  
Heteroepitaxial Growth ◽  
X Ray Diffraction ◽  
Present Evidence ◽  
X Ray ◽  
Si Substrates

ABSTRACTNew x-ray diffraction measurements performed on bonm nitride films deposited by pulsed excimer laser deposition are presented. The x-ray data, taken with both a molybdenum rotating anode source and synchrotron radiation, indicate that the epitaxial cBN films are ≤ 200 Å thick. We also report the successful growth of oriented crystalline diamond on the (001) surface of cBN/Si substrates using the method of pulsed laser deposition. X-ray diffraction measurements indicate that the diamond layer is 200 Å thick with a lattice constant of 3.56 Å. The structures of metastable films (cBN and diamond) are very sensitive to growth conditions: we present evidence that an epitaxial-crystalline to incoherent phase transition occurs when the thickness of the films exceeds a critical value (∼ 200 Å for our present growth conditions).

scholarly journals InSb Photodiodes for Monolithic Active Focal Plane Arrays on GaAs Substrates

2016 ◽  
Vol 63 (8) ◽  
pp. 3135-3142 ◽  
Author(s):  
Vincenzo Pusino ◽  
Chengzhi Xie ◽  
Ata Khalid ◽  
Matthew J. Steer ◽  
Marc Sorel ◽  
...  
Keyword(s):  
Focal Plane ◽  
Focal Plane Arrays ◽  
Gaas Substrates

Pulsed Laser Deposition of Epitaxial SrVO3 Films on (100)LaAlO3 and (100)Si

2000 ◽  
Vol 623 ◽  
Author(s):  
P.W. Yip ◽  
K.H. Wong
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Growth Conditions ◽  
Spectroscopic Studies ◽  
Laser Deposition ◽  
X Ray ◽  
Si Substrates ◽  
Post Annealing ◽  
Ambient Oxygen ◽  
Relationship Of

AbstractThin films of SrVO3 have been grown on (100)LaAlO3 and TiN buffered (100)Si substrates by pulsed laser deposition. The films were deposited in temperature range of 450°C – 750°C and under ambient oxygen pressure between 101−6 and 101−2 Torr. Their structural properties were characterized using a four-circle x-ray diffractometer. High quality SrVO3 films were obtained at growth temperatures above 500°C without post annealing. Heteroepitaxial relationship of < 100 >SrVo3 ∥ < 100 >LaAOl3 and <100>SrVo3∥ < 100 >TiN ∥ < 100 >Si were observed for films deposited at ≤ 550°C. X-ray photoelectron spectroscopic studies of the films suggest that the vanadium is mainly tetravalent and pentavalent. Charge transport measurements show that the films vary from semiconducting to highly conducting for different growth conditions. Resistivity of a few micro-ohm cm was recorded for some of the epitaxial SrVO3 films.

MBE Growth Considerations for the Fabrication of 640×480 IR Focal Plane Arrays of SiGe Hip Detectors

1995 ◽  
Vol 402 ◽  
Author(s):  
P. E. Hompson ◽  
M. Weeks ◽  
P. Tedrow ◽  
K. Hobart
Keyword(s):  
Focal Plane ◽  
Sige Layer ◽  
Focal Plane Arrays ◽  
Optical Pyrometer ◽  
Ir Detectors ◽  
Detector Arrays ◽  
Si Substrates ◽  
Boron Doped ◽  
B Doping ◽  
Microelectronic Processing

AbstractEncouraging results have been reported for discrete heterojunction internal photoemission (HIP) infrared (IR) detectors composed of heavily boron doped Si1−3Gex layers on Si. We desired to build on those results and fabricate 640×480 IR focal plane arrays on 100 mm Si substrates, suitable for commercial microelectronic processing. In this paper we discuss the growth issues for growing these structures by molecular beam epitaxy. Since the wafers had already undergone processing and some had PtSi contacts, the growth temperature was constrained to be no greater than 600 °C. Precise temperature control was obtained by calibrating an optical pyrometer with a thermocouple embedded in the substrate heater assembly, which was calibrated using the eutectic emperatures of Au/Si and Al/Si. The final step of the cleaning process was a 1% HF dip/ spin dry, which resulted in a H-terminated surface. The H was removed at 550 °C in vacuum prior to rowth. The growth of the B-doped SiGe layer was done at 350 °C to minimize segregation and diffusion of the Ge and B. Doping levels of 2×1020/cm3 were obtained with near 100% activation. Using Si0.35, doped with 2×1020 B/cm3, a cut-off wavelength of 11.1 μm and an emission coefficient of 19.8 %/eV were obtained for discrete detectors. Preliminary results from the detector arrays show full functionality in the spectral range of 6.1 to 12.8 μm.

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