Characterization of the Thin Diamond-Like Carbon Films Deposited Using Rf Inductively Coupled Ch4- Plasma Source

1996 ◽  
Vol 446 ◽  
Author(s):  
B. Druz ◽  
V.I. Polyakov ◽  
E. Ostan ◽  
A. Hayes ◽  
A.I. Rukovishnikov ◽  
...  
Keyword(s):  
Cross Sections ◽  
Electrical Breakdown ◽  
Ion Beam ◽  
Plasma Source ◽  
Carbon Films ◽  
Breakdown Field ◽  
Diamond Like Carbon ◽  
Silicon Substrates ◽  
Inductively Coupled ◽  
Photoelectrical Properties

AbstractDiamond-like carbon (DLC) films with 4-400 nm thickness were deposited on silicon substrates using direct ion beam from an RF inductively coupled CH4 - plasma (ICP) source. The dependence of the film electrical and photoelectrical properties on methane flow were examined. Two kinds of trapping centers with different activation energies and capture cross-sections, and very low densities were discovered by the Q-DLTS method. The influence of thermal annealing in air at 100-450°C was investigated. The current leakage and defect concentration were reduced while electrical breakdown field and photoresponse were increased in annealed films. The results obtained have been used for optimization of the technology to prepare thin films with good protective, electrically insulating, and passivating properties.

Diamond-like carbon films deposited using a broad, uniform ion beam from an RF inductively coupled CH4-plasma source

1998 ◽  
Vol 7 (7) ◽  
pp. 965-972 ◽  
Author(s):  
B. Druz ◽  
E. Ostan ◽  
S. Distefano ◽  
A. Hayes ◽  
V. Kanarov ◽  
...  
Keyword(s):  
Ion Beam ◽  
Plasma Source ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Inductively Coupled

An Study of Influence of Imperfections on the Delamination of Diamond-Like Carbon Films

2002 ◽  
Vol 719 ◽  
Author(s):  
Myoung-Woon Moon ◽  
Kyang-Ryel Lee ◽  
Jin-Won Chung ◽  
Kyu Hwan Oh
Keyword(s):  
Cross Sections ◽  
Focused Ion Beam ◽  
Imaging System ◽  
Ion Beam ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Glass Substrates ◽  
Atomic Force ◽  
Initiation And Propagation

AbstractThe role of imperfections on the initiation and propagation of interface delaminations in compressed thin films has been analyzed using experiments with diamond-like carbon (DLC) films deposited onto glass substrates. The surface topologies and interface separations have been characterized by using the Atomic Force Microscope (AFM) and the Focused Ion Beam (FIB) imaging system. The lengths and amplitudes of numerous imperfections have been measured by AFM and the interface separations characterized on cross sections made with the FIB. Chemical analysis of several sites, performed using Auger Electron Spectroscopy (AES), has revealed the origin of the imperfections. The incidence of buckles has been correlated with the imperfection length.

Field electron emission from diamond-like carbon films deposited using RF inductively coupled CH4-plasma source

1998 ◽  
Vol 7 (2-5) ◽  
pp. 695-698 ◽  
Author(s):  
B.L. Druz ◽  
V.I. Polyakov ◽  
A.V. Karabutov ◽  
N.M. Rossukanyi ◽  
A.I. Rukovishnicov ◽  
...  
Keyword(s):  
Electron Emission ◽  
Plasma Source ◽  
Carbon Films ◽  
Field Electron Emission ◽  
Diamond Like Carbon ◽  
Inductively Coupled ◽  
Field Electron

Ion beam deposition of diamond-like carbon from an r.f. inductively coupled CH4-plasma source

1996 ◽  
Vol 86-87 ◽  
pp. 708-714 ◽  
Author(s):  
B. Druz ◽  
S. DiStefano ◽  
A. Hayes ◽  
E. Ostan ◽  
K. Williams ◽  
...  
Keyword(s):  
Ion Beam ◽  
Plasma Source ◽  
Diamond Like Carbon ◽  
Inductively Coupled ◽  
Ion Beam Deposition ◽  
Beam Deposition

STUDY OF FLUORINE ADDITION INFLUENCE IN THE DIELECTRIC CONSTANT OF DIAMOND-LIKE CARBON THIN FILM DEPOSITED BY REACTIVE SPUTTERING

2002 ◽  
Vol 16 (15n16) ◽  
pp. 577-582 ◽  
Author(s):  
S. C. TRIPPE ◽  
R. D. MANSANO
Keyword(s):  
Dielectric Constant ◽  
Electrical Breakdown ◽  
Rf Magnetron Sputtering ◽  
Carbon Films ◽  
Breakdown Field ◽  
Diamond Like Carbon ◽  
Low Dielectric ◽  
High Electrical Resistivity ◽  
Applied Tension ◽  
Hydrogenated Amorphous

The hydrogenated amorphous carbon films (a-C:H) or DLC (Diamond-Like Carbon) films are well known for exhibiting high electrical resistivity, low dielectric constant, high mechanical hardness, low friction coefficient, low superficial roughness and also for being inert. In this paper, we produced fluorinated DLC films (a-C:F), and studied the effect of adding CF 4 on the above-mentioned properties of DLC films. These films were produced by a reactive RF magnetron sputtering system using a target of pure carbon in stable graphite allotrope. We performed measurements of electrical characteristic curves of capacitance as a function of applied tension (C-V) and current as a function of the applied tension (I-V). We showed the dielectric constant (k) and the resistivity (ρ) as functions of the CF 4 concentration. On films with 65% CF 4, we found that k = 2.7, and on films with 70% CF 4, ρ = 12.3 × 1011 Ω cm. The value of the electrical breakdown field to films with 70% CF 4 is 5.3 × 106 V/cm.

Contact damage of tetrahedral amorphous carbon thin films on silicon substrates

2009 ◽  
Vol 24 (11) ◽  
pp. 3286-3293 ◽  
Author(s):  
Oscar Borrero-López ◽  
Mark Hoffman ◽  
Avi Bendavid ◽  
Phil J. Martin
Keyword(s):  
Thin Films ◽  
Amorphous Carbon ◽  
Cross Sections ◽  
Focused Ion Beam ◽  
Microelectromechanical Systems ◽  
Ion Beam ◽  
Carbon Films ◽  
Silicon Substrates ◽  
Tetrahedral Amorphous Carbon ◽  
Thick Coatings

We have investigated the fracture behavior of tetrahedral amorphous carbon films, with thicknesses 0.15 (ultrathin), 0.5 (thin), and 1.2 (thick) microns on silicon substrates. To that end, the systems were progressively loaded into a nanoindenter using a spherical tip, and surface and cross sections were subsequently examined using a focused ion beam miller at different loads. A transition was found as a function of film thickness: for ultrathin and thin films, cracking (radial and lateral) initiated in the silicon substrate and followed a similar path in the films. Thicker films, on the other hand, provided a higher level of protection to the substrate, and cracking (lateral and radial at the interface) was constrained to the film. The damage modes and the transition obtained differ from those that occur in thick coatings. Lateral cracks are highly dangerous, leading to delamination of thick films and to spallation when thinner films are used. The results have implications concerning the mechanical reliability of microelectromechanical systems.

Large Area Surface Treatment by Ion Beam Technology

1996 ◽  
Vol 438 ◽  
Author(s):  
R. L. C. Wu ◽  
W. Lanter
Keyword(s):  
Ion Beam ◽  
High Vacuum ◽  
Polycrystalline Diamond ◽  
Carbon Films ◽  
Ultra High Vacuum ◽  
Diamond Like Carbon ◽  
Chemical Compositions ◽  
Rf Power ◽  
Large Area ◽  
Ion Energy

AbstractAn ultra high vacuum ion beam system, consisting of a 20 cm diameter Rf excilted (13.56 MHz) ion gun and a four-axis substrate scanner, has been used to modify large surfaces (up to 1000 cm2) of various materials, including; infrared windows, silicon nitride, polycrystalline diamond, 304 and 316 stainless steels, 440C and M50 steels, aluminum alloys, and polycarbonates; by depositing different chemical compositions of diamond-like carbon films. The influences of ion energy, Rf power, gas composition (H2/CH4 , Ar/CH4 and O2/CH4/H2), on the diamond-like carbon characteristics has been studied. Particular attention was focused on adhesion, environmental effects, IR(3–12 μm) transmission, coefficient of friction, and wear factors under spacelike environments of diamond-like carbon films on various substrates. A quadrupole mass spectrometer was utilized to monitor the ion beam composition for quality control and process optimization.

Ion beam synthesis of the diamond like carbon films for nanoimprint lithography applications

2006 ◽  
Vol 515 (2) ◽  
pp. 636-639 ◽  
Author(s):  
Š. Meškinis ◽  
V. Kopustinskas ◽  
K. Šlapikas ◽  
S. Tamulevičius ◽  
A. Guobienë ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Ion Beam ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Ion Beam Synthesis
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