scholarly journals Nanoindentation of Soft Films on Hard Substrates:The Importance of Pile-Up

1996 ◽  
Vol 436 ◽  
Author(s):  
T. Y. Tsui ◽  
W. C. Oliver ◽  
G. M. Pharr
Keyword(s):  
Elastic Modulus ◽  
Measurement Errors ◽  
Flow Characteristics ◽  
Hard Substrate ◽  
Unusual Behavior ◽  
Potential Measurement ◽  
Glass Substrates ◽  
Pile Up ◽  
Film Substrate ◽  
Composite Hardness

AbstractNanoindentation is a common technique for measuring the mechanical properties of thin films. Here, we address the potential measurement errors caused by pile-up when soft films deposited on hard substrates are tested by nanoindentation methods. Pile-up is exacerbated in soft film / hard substrate systems because of the constraint the substrate exerts on plastic deformation of the film. To experimentally examine pile-up effects, aluminum films with thicknesses of 240 and 1700 nm were deposited on hard glass substrates and tested by standard nanoindentation techniques. The aluminum/glass system is interesting because the film and substrate have similar elastic moduli; thus, any unusual behavior in the nanoindentation results may be attributed to differences in the plastic flow characteristics alone. A detailed scanning electron microscopy examination of nanoindentation hardness impressions in the film revealed that common methods for analyzing nanoindentation data underestimate the true contact areas by as much as 80%, which results in overestimations of the hardness and modulus by as much as 80% and 35%, respectively. The sources of these errors and their influence on the measurement of hardness and elastic modulus are discussed, and a simple model for the composite hardness of the film/substrate system is developed. The model could prove useful in measuring the hardness and elastic modulus of soft-film / hard substrate systems when it is not possible to make indentations shallow enough to avoid the substrate influences.

RECENT STUDY ON THE RELATED PROBLEMS IN EVALUATION OF MECHANICAL PROPERTIES FOR MEMS MATERIALS

2009 ◽  
Vol 01 (04) ◽  
pp. 765-779 ◽  
Author(s):  
ZHUANGDE JIANG ◽  
XIANGYANG ZHOU ◽  
QIANG ZHU ◽  
ZEXIANG ZHAO ◽  
WANG HAIRONG ◽  
...  
Keyword(s):  
Elastic Modulus ◽  
Influence Factors ◽  
Soft Materials ◽  
Fuzzy Variables ◽  
Pile Up ◽  
Soft Metal ◽  
Random Fuzzy Variables ◽  
Film Substrate ◽  
Hard Substrates ◽  
Quantitative Approaches

In order to obtain reliable evaluation result by nanoindentation, the related problems during measurement of the hardness and elastic modulus are investigated. Two quantitative approaches, i.e. calculating actual contact area and correcting contact depth errors, are proposed to deal with the significant pile-up errors for indentation on those ductile soft materials, especially thin soft metal films on hard substrates. The various influence factors during indentation are analyzed, and a new method for uncertainty estimation in hardness and elastic modulus is provided based on the random-fuzzy variables. Through the illustration of Au/glass-ceramic and Al/7059 glass, both the quantitative approaches are suitable for the elastically matching film-substrate systems. The measurement uncertainties in hardness and elastic modulus of Si(100) are effectively estimated, and all possible influencing effects on uncertainty can be involved.

Analysis of heavy ion beam probe potential measurement errors in the Madison Symmetric Torus

2004 ◽  
Vol 75 (10) ◽  
pp. 3502-3504 ◽  
Author(s):  
X. Zhang ◽  
J. Lei ◽  
K. A. Connor ◽  
D. R. Demers ◽  
P. M. Schoch ◽  
...  
Keyword(s):  
Measurement Errors ◽  
Ion Beam ◽  
Heavy Ion ◽  
Potential Measurement ◽  
Madison Symmetric Torus ◽  
Heavy Ion Beam ◽  
Heavy Ion Beam Probe ◽  
Probe Potential

Effects of substrate on determination of hardness of thin films by nanoscratch and nanoindentation techniques

2004 ◽  
Vol 19 (6) ◽  
pp. 1791-1802 ◽  
Author(s):  
Noureddine Tayebi ◽  
Andreas A. Polycarpou ◽  
Thomas F. Conry
Keyword(s):  
Thin Films ◽  
Film Thickness ◽  
Elastic Recovery ◽  
Empirical Relationship ◽  
Residual Deformation ◽  
Substrate Effect ◽  
Nanoindentation Technique ◽  
Film Substrate ◽  
Composite Hardness

A comparative study on the effects of the substrate on the determination of hardness of thin films by the use of the nanoscratch and nanoindentation techniques was conducted. Gold films deposited on fused quartz substrates and silicon dioxide films deposited on aluminum substrates with variant film thicknesses were investigated. These two systems correspond to a soft film on a hard substrate and a hard film on a soft substrate, respectively. The effect of substrate interaction on the measurement of hardness using the nanoscratch technique was found to be less pronounced compared to that of the nanoindentation technique due to: (i) the lower normal loads applied to achieve the penetration depths that occur at higher loads when using the nanoindentation method; (ii) the direct imaging of the residual deformation profile that is used in the nanoscratch technique, which allows for the effects of pileup or sink-in to be taken into account, whereas in the nanoindentation technique the contact area is estimated from the load-displacement data, which does not include such effects; and (iii) the account of elastic recovery of the plastically deformed surfaces from scratch tests. The film thickness did not appear to have any effect on the hardness of Au and SiO2 films obtained from nanoscratch data. This observation allowed, for the case of SiO2 films, the determination of the “free substrate effect region” and the derivation of an empirical relationship that relates the composite hardness of the film/substrate system to the contact-depth-to-film-thickness ratio, even when the indenter penetrates into the substrate. Such findings can allow for the determination of the intrinsic hardness of ultrathin hard films (∼1–5 nm thick), where the substrate effect is unavoidable.

A New Technique For Visualizing The Displacement Field Of Indentations: The Case Of A Soft Film On A Hard Substrate

1997 ◽  
Vol 505 ◽  
Author(s):  
Joost J. Vlassak ◽  
T. Y. Tsui ◽  
W. D. Nix
Keyword(s):  
Titanium Nitride ◽  
Displacement Field ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Grain Structure ◽  
New Technique ◽  
Hard Substrate ◽  
Film Material ◽  
Pile Up ◽  
A New Technique

ABSTRACTWe have developed a new technique for visualizing displacement fields of indentations in thin films. In this technique, the indented film consists of alternating layers of two different materials. One of the materials serves as a marker for visualizing the plastic flow induced by the indentation. Focused Ion Beam (FIB) milling is used to cross-section the indentation, revealing the deformed layers. This technique can be used to study how the presence of the substrate affects the plastic displacement field around the indentation. The technique is applied to a multilayered film of aluminum and titanium nitride on a silicon substrate. The titanium nitride layers are much thinner than the aluminum layers and serve the function of marker. Pile-up of the film material around the indenter and the effect of the hard substrate are easily revealed and a mechanism for pile-up is suggested. The technique also shows that the grain structure in the deformed zone around the indentation is altered profoundly.

Determination of elastic modulus of thin layers using nanoindentation

1997 ◽  
Vol 12 (9) ◽  
pp. 2475-2484 ◽  
Author(s):  
J. Menčík ◽  
D. Munz ◽  
E. Quandt ◽  
E. R. Weppelmann ◽  
M. V. Swain
Keyword(s):  
Thin Film ◽  
Experimental Data ◽  
Elastic Modulus ◽  
Linear Function ◽  
Thin Layers ◽  
Film Substrate ◽  
Comparison Of The Results ◽  
Practical Recommendations ◽  
Indentation Response

Elastic modulus of thin homogeneous films can be determined by indenting the specimen to various depths and extrapolating the measured (apparent) E-values to zero penetration. The paper shows the application of five approximation functions for this purpose: linear, exponential, reciprocal exponential, Gao's, and the Doerner and Nix functions. Comparison of the results for 26 film/substrate combinations has shown that the indentation response of film/substrate composites can, in general, be described by the Gao analytical function. In determining the thin film modulus from experimental data, satisfactory results can also be obtained with the exponential function, while linear function may be used only for thick films where the relative depths of penetration are small. The article explains the pertinent procedures and gives practical recommendations for the testing.

scholarly journals FeZrN Films: Magnetic and Mechanical Properties Relative to the Phase-Structural State

Materials ◽  
2021 ◽  
Vol 15 (1) ◽  
pp. 137
Author(s):  
Elena N. Sheftel ◽  
Valentin A. Tedzhetov ◽  
Eugene V. Harin ◽  
Philipp V. Kiryukhantsev-Korneev ◽  
Galina S. Usmanova ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Magnetic Properties ◽  
Elastic Modulus ◽  
Elastic Recovery ◽  
The Other ◽  
Magnetron Deposition ◽  
Glass Substrates ◽  
Saturation Induction ◽  
Low Elastic Modulus ◽  
Chemical And Phase Compositions

The paper presents results of investigation of Fe65.3–100Zr34.7–0N7.5–0 films prepared by dc magnetron deposition on glass substrates and subsequent 1-hour annealing at temperatures of 300–600 °C. The influence of the chemical and phase compositions and structure of the films, which were studied by TEM, SEM, XRD, and GDOES, on their mechanical properties determined by nanoindentation and static magnetic properties measured by VSM method is analyzed. The studied films exhibit the hardness within a range of 14–21 GPa, low elastic modulus (the value can reach 156 Gpa), and an elastic recovery of 55–83%. It was shown that the films are strong ferromagnets with the high saturation induction Bs (up to 2.1 T) and low coercive field Hc (as low as 40 A/m). The correlations between the magnetic and mechanical properties, on one hand, and the chemical composition of the films, their phase, and structural states as well, on the other hand, are discussed.

scholarly journals Experimentally friendly approach towards nonlocal correlations in multisetting N-partite Bell scenarios

Quantum ◽  
2021 ◽  
Vol 5 ◽  
pp. 430
Author(s):  
Artur Barasiński ◽  
Antonín Černoch ◽  
Wiesław Laskowski ◽  
Karel Lemr ◽  
Tamás Vértesi ◽  
...  
Keyword(s):  
Measurement Errors ◽  
Reference Frames ◽  
Simple Procedure ◽  
Bell Inequalities ◽  
Point Of View ◽  
Local Realism ◽  
Theoretical Point ◽  
Potential Measurement ◽  
Complete Knowledge ◽  
Feasible Alternative

In this work, we study a recently proposed operational measure of nonlocality by Fonseca and Parisio [Phys. Rev. A 92, 030101(R) (2015)] which describes the probability of violation of local realism under randomly sampled observables, and the strength of such violation as described by resistance to white noise admixture. While our knowledge concerning these quantities is well established from a theoretical point of view, the experimental counterpart is a considerably harder task and very little has been done in this field. It is caused by the lack of complete knowledge about the facets of the local polytope required for the analysis. In this paper, we propose a simple procedure towards experimentally determining both quantities for N-qubit pure states, based on the incomplete set of tight Bell inequalities. We show that the imprecision arising from this approach is of similar magnitude as the potential measurement errors. We also show that even with both a randomly chosen N-qubit pure state and randomly chosen measurement bases, a violation of local realism can be detected experimentally almost 100% of the time. Among other applications, our work provides a feasible alternative for the witnessing of genuine multipartite entanglement without aligned reference frames.

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