Emissivity Independent Process Control in a Short Wavelength ARC Lamp RTP Chamber
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AbstractTwo dimensional temperature measurements of patterned wafers are presented. The measurements are made using a commercially available CCD camera operating at λ=900nm, yielding a spatial resolution of 1 pixel per mm2 and a relative accuracy of ±0.25 °C. The emissivity is determined using a reflectivity measurement made possible by the unique properties of a short wavelength arc lamp RTP chamber. The use of this measurement system for closed loop control is discussed and the application to maintaining accurate time temperature profiles independent of emissivity is described.
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2012 ◽
Vol 220
(1)
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pp. 3-9
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2014 ◽
Vol 7
(5)
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pp. 164
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2018 ◽
Vol 2018
(1)
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pp. 176-181
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