An Extended Kalman Filter Based Method for Fast In-Situ Etch Rate Measurements
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AbstractThe goal of this paper is the presentation of a new algorithm for determining etch rate from single or multiple wavelength reflectometry data. This algorithm is based on techniques from recursive nonlinear estimation theory — Extended Kalman Filtering. A major advantage of our algorithm is extremely high speed. Consequently, it can be used in real-time feedback control applications. The speed advantage also makes it a suitable candidate for full wafer high speed etch rate measurement.
1997 ◽
Vol 10
(1)
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pp. 42-51
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2001 ◽
Vol 110
(5)
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pp. 2739-2740
2016 ◽
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