An Extended Kalman filtering-based method of processing reflectometry data for fast in-situ etch rate measurements

1997 ◽  
Vol 10 (1) ◽  
pp. 42-51 ◽  
Author(s):  
T.L. Vincent ◽  
P.P. Khargonekar ◽  
F.L. Terry
1995 ◽  
Vol 406 ◽  
Author(s):  
T. L. Vincent ◽  
P. P. Khargonekar ◽  
F. L. Terry

AbstractThe goal of this paper is the presentation of a new algorithm for determining etch rate from single or multiple wavelength reflectometry data. This algorithm is based on techniques from recursive nonlinear estimation theory — Extended Kalman Filtering. A major advantage of our algorithm is extremely high speed. Consequently, it can be used in real-time feedback control applications. The speed advantage also makes it a suitable candidate for full wafer high speed etch rate measurement.


1991 ◽  
Vol 224 ◽  
Author(s):  
Y.M. Cho ◽  
C.D. Schaper ◽  
T. Kailath

AbstractAn Extended Kalman Filter (EKF) is developed to provide an improved pyrometer-based estimate of temperature in rapid thermal processing systems. Models of the heat transfer characteristics, emissivity variations, and temperature measurement equipment, are used in formulating an EKF as a closed-loop observer to filter out noise, lessen the effects of processing variations, and to infer temperature at locations where no measurements are available. Extensive simulations are conducted to analyze the robustness of the EKF.


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