Modelling of CW Laser Annealing of Multilayer Structures
Keyword(s):
Cw Laser
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ABSTRACTA thermal model is developed for cw laser annealing of multilayer structures. Each layer has arbitrary thickness, thermal conductivity and optical properties. Steady state conditions with no phase transition are assumed. A procedure is presented for obtaining the temperature distribution in any system and explicit integral expressions are developed for the two and three layer cases. Results are calculated for the Si/glass and Si/SiO2 /Si systems.
1993 ◽
Vol 441
(1911)
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pp. 181-189
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1990 ◽
Vol 1
(3)
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pp. 245-257
2004 ◽
Vol 1
(3)
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pp. 176-186
2019 ◽
1979 ◽
Vol 44
(3)
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pp. 841-853
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