Ion Mixing in Film-Substrate Systems Under Polyenergetic Ar+Ion Beam Irradiation

The results of alloying Al, Fe, and Mo surfaces by Be, Al, Ni, Sn under polyenergetic Ar+ ion beam irradiation with a mean energy of 10 keV have been presented. It has been shown that along with film and substrate materials sputtering there takes place the penetration of film atoms into substrate materials at a depth which is significantly greater (by a factor of 3… 10) than the projective range of ions in the given materials. The analysis of possible alloying depths with regard to different models (pure radiation range for monoenergetic ion beams; when the decrease of concentration is approximated by the exponential dependence; when the internal forcing out stresses are taken into account) for equal irradiation dose shows that the model, in which the migration of implanted atoms in the fields of forcing out stresses are considered, gives most close agreement between the calculated data and experimental ones.