Misfit Dislocations in Epitaxial Layers of SI on Gap (001) Substrates

1984 ◽  
Vol 37 ◽  
Author(s):  
M. P. A. Viegers ◽  
C. W. T. Bulle Lieuwma ◽  
P. C. Zalm ◽  
P. M. J. Maree

AbstractMisfit dislocations in epitaxial layers of Si grown by MBE at 570°C on GaP(001) substrates have been studied by TEM. It is found that layers as thick as 500 Å at least reside coherently on the substrate without misfit dislocations. In 1000 Å layers of Si the misfit strain is accommodated in part by 60-degree type dislocations with their Burgers vector inclined with respect to the interface, and by stacking faults intersecting the Si layer. The dislocations are dissociated into 30- and 90-degree Shockley partial dislocations. It is shown that in the case of a biaxial strain field, which is tensile in a (001)-plane, the 90-degree partial must be nucleated first. Only then can the 30-degree partial follow on the same glide plane. This geometrical effect explains the presence of dislocations as well as stacking faults in the Si layer.

2008 ◽  
Vol 600-603 ◽  
pp. 357-360 ◽  
Author(s):  
Yi Chen ◽  
Xian Rong Huang ◽  
Ning Zhang ◽  
Michael Dudley ◽  
Joshua D. Caldwell ◽  
...  

Electron-hole recombination activated Shockley partial dislocations bounding expanding stacking faults and their interactions with threading dislocations have been studied in 4H-SiC epitaxial layers using synchrotron x-ray topography. The bounding partials appear as white stripes or narrow dark lines in back-reflection X-ray topographs recorded using the basal plane reflections. Such contrast variations are attributable to the defocusing/focusing of the diffracted X-rays due to the edge component of the partial dislocations, which creates a convex/concave distortion of the basal planes. Simulation results based on the ray-tracing principle confirm our argument. The sign of the partial dislocations can be subsequently determined.


2007 ◽  
Vol 994 ◽  
Author(s):  
Yi Chen ◽  
Michael Dudley ◽  
Kendrick X Liu ◽  
Robert E Stahlbush

AbstractElectron-hole recombination enhanced glide of Shockley partial dislocations bounding expanding stacking faults and their interactions with threading dislocations in 4H silicon carbide epitaxial layers have been studied using synchrotron white beam X-ray topography and in situ electroluminescence. The mobile silicon-core Shockley partial dislocations bounding the stacking faults are able to cut through threading edge dislocations leaving no trailing dislocation segments in their wake. However, when the Shockley partial dislocations interact with threading screw dislocations, trailing 30o partial dislocation dipoles are initially deposited in their wake due to the pinning effect of the threading screw dislocations. These dipoles spontaneously snap into their screw orientation, regardless the normally immobile carbon-core Shockley partial dislocation components in the dipoles. They subsequently cross slip and annihilate, leaving a prismatic stacking fault in (2-1-10) plane with the displacement vector 1/3[01-10].


Crystals ◽  
2019 ◽  
Vol 9 (8) ◽  
pp. 386
Author(s):  
Takeo Hondoh

Dislocations in ice behave very differently from those in other materials due to the very low energies of stacking faults in the ice basal plane. As a result, the dislocations dissociate on the basal plane, from a perfect dislocation into two partial dislocations with equilibrium width we ranging from 20 to 500 nm, but what is the timescale to reach this dissociated state? Using physical models, we estimate this timescale by calculating two time-constants: the dissociation-completing time td and the dissociation-beginning time tb. These time constants are calculated for two Burgers vectors as a function of temperature. For perfect dislocations with Burgers vector <c + a>, td is more than one month even at the melting temperature TM, and it exceeds 103 years below −50 ℃, meaning that the dissociation cannot be completed during deformation over laboratory timescales. However, in this case the beginning time tb is less than one second at TM, and it is within several tens of minutes above −50 ℃. These dislocations can glide on non-basal planes until they turn to the dissociated state during deformation, finally resulting in sessile extended dislocations of various widths approaching to the equilibrium value we. In contrast, for perfect dislocations with Burgers vector <a>, td is less than one second above −50 ℃, resulting in glissile extended dislocations with the equilibrium width we on the basal plane. This width is sensitive to the shear stress τ exerted normal to the dislocation line, leading to extension of the intervening stacking fault across the entire crystal grain under commonly accessible stresses. Also, due to the widely dissociated state, dislocations <a> cannot cross-slip to non-basal planes. Such behavior of extended dislocations in ice are notable when compared to those of other materials.


1999 ◽  
Vol 595 ◽  
Author(s):  
A. Kvit ◽  
A. K. Sharma ◽  
J. Narayan

AbstractLarge lattice mismatch between GaN and α-Al2O3 (15%) leads to the possibility of high threading dislocation densities in the nitride layers grown on sapphire. This investigation focused on defect reduction in GaN epitaxial thin layer was investigated as a function of processing variables. The microstructure changes from threading dislocations normal to the basal plane to stacking faults in the basal plane. The plan-view TEM and the corresponding selected-area diffraction patterns show that the film is single crystal and is aligned with a fixed epitaxial orientation to the substrate. The epitaxial relationship was found to be (0001)GaN∥(0001)Sap and [01-10]GaN∥[-12-10]Sap. This is equivalent to a 30° rotation in the basal (0001) plane. The film is found to contain a high density of stacking faults with average spacing 15 nm terminated by partial dislocations. The density of partial dislocations was estimated from plan-view TEM image to be 7×109 cm−2. The cross-section image of GaN film shows the density of stacking faults is highest in the vicinity of the interface and decreases markedly near the top of the layer. Inverted domain boundaries, which are almost perpendicular to the film surface, are also visible. The concentration of threading dislocation is relatively low (∼;2×108 cm−2), compared to misfit dislocations. The average distance between misfit dislocations was found to be 22 Å. Contrast modulations due to the strain near misfit dislocations are seen in high-resolution cross-sectional TCM micrograph of GaN/α-Al2O3 interface. This interface is sharp and does not contain any transitional layer. The interfacial region has a high density of Shockley and Frank partial dislocations. Mechanism of accommodation of tensile, sequence and tilt disorder through partial dislocation generation is discussed. In order to achieve low concentration of threading dislocations we need to establish favorable conditions for some stacking disorder in thin layers above the film-substrate interface region.


1981 ◽  
Vol 5 ◽  
Author(s):  
C.B. Carter

ABSTRACTDislocations in low-angle tilt boundaries exhibit a wide variety of Burgers vector including a/2<112> a<001> and a<111>. The dislocations are usually dissociated: Shohkley, stair-rod and Frank partial dislocations may each be formed together with associated intrinsic and extrinsic stackingfaults. Dislocations in low-angle {111} twist boundaries are usually assumed to dissociated by a glide mechanism to give two types of extended nodes, known as P–type and K–type, which contain intrinsic and extrinsic stacking-faults respectively. It is shown that dissociation by climb actually occurs for both types of grain boundary.


2014 ◽  
Vol 778-780 ◽  
pp. 319-323
Author(s):  
Rii Hirano ◽  
Michio Tajima ◽  
Hidekazu Tsuchida ◽  
Kohei M. Itoh ◽  
Koji Maeda

Polarization characteristics of luminescence from partial dislocations (PDs) in 4H-SiC have been investigated by room-temperature photoluminescence (PL) imaging. After expansion of Shockley stacking faults by high-power laser irradiation, PL from PDs tilted by 6° from their Burgers vector (6°-PDs) was observed with almost the same PL peak energy as that of 30°-Si (g) PDs. The PL from the 30°-Si (g) and 6°-PDs which were mobile under illumination were both found to be polarized perpendicular to their dislocation lines. In contrast, the PL from immobile 30°-C(g) PDs was not polarized. The present results suggest that the carriers bound to the 30°-Si (g) and 6°-PDs have anisotropic wave functions and those bound to 30°-C(g)PDs have isotropic wave functions.


1991 ◽  
Vol 239 ◽  
Author(s):  
R. Hull ◽  
J. C. Bean ◽  
F. Ross ◽  
D. Bahnck ◽  
L. J. Pencolas

ABSTRACTThe geometries, microstructures, energetics and kinetics of misfit dislocations as functions of surface orientation and the magnitude of strain/stress are investigated experimentally and theoretically. Examples are drawn from (100), (110) and (111) surfaces and from the GexSi1–x/Si and InxGa1–x/GaAs systems. It is shown that the misfit dislocation geometries and microstructures at lattice mismatch stresses < - 1GPa may in general be predicted by operation of the minimum magnitude Burgers vector slipping on the widest spaced planes. At stresses of the order several GPa, however, new dislocation systems may become operative with either modified Burgers vectors or slip systems. Dissociation of totál misfit dislocations into partial dislocations is found to play a crucial role in strain relaxation, on surfaces other than (100) under compressive stress.


2006 ◽  
Vol 527-529 ◽  
pp. 383-386 ◽  
Author(s):  
Mark E. Twigg ◽  
Robert E. Stahlbush ◽  
Peter A. Losee ◽  
Can Hua Li ◽  
I. Bhat ◽  
...  

Using light emission imaging (LEI), we have determined that not all planar defects in 4H-SiC PiN diodes expand in response to bias. Accordingly, plan-view transmission electron microscopy (TEM) observations of these diodes indicate that these static planar defects are different in structure from the mobile stacking faults (SFs) that have been previously observed in 4H-SiC PiN diodes. Bright and dark field TEM observations reveal that such planar defects are bounded by partial dislocations, and that the SFs associated with these partials display both Frank and Shockley character. That is, the Burgers vector of such partial dislocations is 1/12<4-403>. For sessile Frank partial dislocations, glide is severely constrained by the need to inject either atoms or vacancies into the expanding faulted layer. Furthermore, these overlapping SFs are seen to be fundamentally different from other planar defects found in 4H-SiC.


Author(s):  
C. De Blasi ◽  
D. Manno

The study of dislocations and stacking faults in melt grown GaSe single crystals has been carried out by the Convergent Beam Electron Diffraction (CBED) technique.The presence of stacking faults induces distortions in the Kikuchi lines observed in the CBED transmitted disk. According to the kinematical condition of the stacking fault visibility, such lines show modifications when g·R is not integer, The displacement vector R has been determined by the analysis of the visibility and invisibility conditions in the transmitted disk, recorded according to the Tanaka method, The Burgers vector b of dislocations has been determined by the analysis of the modifications induced both in Kikuchi lines and in the First Order Laue Zone (FOLZ) reflections, observed in low camera length CBED patterns. Splitting and unsplitting of the reflections correspond to the visibility and invisibility of the dislocations in the kinematical approximation of diffraction contrast, The condition g·b = 0 is not strictly a sufficient condition for the vanishing of the modifications induced by the dislocation, neverthless it is generally very useful as a criterion for determining the direction of b, Moreover, some reflections g give g·b = ⅓ in the case of partial dislocations. This condition does not produce enough contrast to be detected, so that it is one more for the defect invisibility. The Thompson construction has been used in order to calculate the amplitude of b and to discriminate perfect or partial dislocations.


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