Microcrystalline Cubic Boron Nitride/Amorphous Hydrogenated Boron Nitride Mixed Phase Thin Films

1994 ◽  
Vol 358 ◽  
Author(s):  
Shu-Han Lin ◽  
Bernard J. Feldman
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Boron Nitride ◽  
Hexagonal Boron Nitride ◽  
Cubic Boron Nitride ◽  
Mixed Phase ◽  
Good Adhesion ◽  
Transmission Electron ◽  
Plasma Decomposition ◽  
Absorption Measurements

ABSTRACTTransparent and insulating thin films have been grown by the plasma decomposition of B2H6, NH3, and H2, at a substrate temperature of 250°C. From chemical composition, transmission electron microscopy, infrared absorption, and optical absorption measurements, the thin films are determined to be a mixed phase of crystalline cubic boron nitride and amorphous hydrogenated boron nitride. Also, the films have significantly more boron than nitrogen, a large concentration of hydrogen, a very large bandgap, strong infrared aborption due to both hexagonal boron nitride and boron icosahedra, and good adhesion to various substrates.

Ion Beam Assisted Deposition of Cubic Boron Nitride Thin Films

1991 ◽  
Vol 235 ◽  
Author(s):  
Daniel J. Kester ◽  
Russell Messier
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Boron Nitride ◽  
Ion Beam ◽  
Cubic Boron Nitride ◽  
Secondary Phase ◽  
Ion Energy ◽  
Ion Beam Assisted Deposition ◽  
Transmission Electron ◽  
Argon Ions

ABSTRACTBoron nitride thin films were grown using ion beam assisted deposition. Boron metal was evaporated, and the depositing film was bombarded by nitrogen and argon ions. The films were characterized using Fourier transform infrared spectroscopy, electron diffraction, transmission electron microscopy, and Rutherford backscattering. The thin films were found to be cubic boron nitride, consisting of 100–200 Å crystallites with a small amount of an amorphous secondary phase. The best conditions for depositing cubic boron nitride were found to be a substrate temperature of 400°C, bombardment by a 50:50 mixture of argon and nitrogen with a bombarding ion energy of 500 eV and a ratio of bombarding ions to depositing boron atoms of from 1.0 to 1.5 ions per atom.

Laser Deposited Cubic Boron Nitride Films

1990 ◽  
Vol 191 ◽  
Author(s):  
Gary L. Doll ◽  
Jeffrey A. Sell ◽  
Lourdes Salamanca-riba ◽  
Ashwin K. Ballal
Keyword(s):  
Electron Microscopy ◽  
Boron Nitride ◽  
Hexagonal Boron Nitride ◽  
Cubic Boron Nitride ◽  
Emission Spectra ◽  
Optical Emission ◽  
Film Deposition ◽  
X Ray Diffraction ◽  
Transmission Electron ◽  
Boron Nitride Films

ABSTRACTWe report the successful growth of cubic boron nitride thin films on single crystal 100 silicon by using pulsed excimer laser ablation of a hexagonal boron nitride bulk target. Optical emission spectra were obtained during the film deposition giving insight into the deposition mechanism. The deposited films were characterized by transmission electron microscopy, scanning electron microscopy, optical microscopy, x-ray diffraction, and Auger electron microscopy. Regions of the films were found to exhibit epitaxy with the substrate.

Corrosion and Tribological Behaviour of BN Thin Films Deposited Using Magnetron Sputtering

2021 ◽  
Vol 9 (2) ◽  
pp. 24-39
Author(s):  
Mukhtiar Singh ◽  
Hitesh Vasudev ◽  
Ravinder Kumar
Keyword(s):  
Thin Films ◽  
Boron Nitride ◽  
Magnetron Sputtering ◽  
Hexagonal Boron Nitride ◽  
Cubic Boron Nitride ◽  
Base Material ◽  
Electrochemical Corrosion ◽  
Mechanical Analysis ◽  
Tribological Behaviour ◽  
Structural Morphology

Boron nitride coatings were synthesised on 316L stainless steel substrates through the radio frequency magnetron sputtering from a target made of hexagonal boron nitride. The process of deposition was conducted in three separate N2 and Ar system mixing regimes. Scanning electron microscopy (SEM) and x-ray diffraction (XRD) techniques investigated the microstructure morphology and composition of the BN films at varying ratio of N2 and Ar plasma. This research aimed to examine the effects of changing the N2 gas ratio on the structure and structural morphology of c-BN coatings. Using QAr / QN2-5/1 ratios, an increased consistency of the microstructure and further c-BN step formation suggest a fundamental technique for producing superior quality cubic boron nitride films. The electrochemical corrosion test and mechanical analysis was performed to study corrosion and tribological behaviour of the BN coating, and the results showed more improvement in corrosion and tribilogical behaviour in case of BN2 regime. The BN2 regime showed a maximum corrosion resistance of around 1.114 mpy (miles per year). The young's modulus of 346Gpa in magnitude in case of BN2 thin film was found to be higher as compared to base material and other two thin films.

scholarly journals Catalyst-Free Bottom-Up Synthesis of Few-Layer Hexagonal Boron Nitride Nanosheets

2015 ◽  
Vol 2015 ◽  
pp. 1-8 ◽  
Author(s):  
Shena M. Stanley ◽  
Amartya Chakrabarti ◽  
Joshua J. DeMuth ◽  
Vanessa E. Tempel ◽  
Narayan S. Hosmane
Keyword(s):  
Electron Microscopy ◽  
Boron Nitride ◽  
Hexagonal Boron Nitride ◽  
X Ray Diffraction ◽  
Bottom Up ◽  
X Ray ◽  
Boron Nitride Nanosheets ◽  
Catalyst Free ◽  
Transmission Electron ◽  
Novel Catalyst

A novel catalyst-free methodology has been developed to prepare few-layer hexagonal boron nitride nanosheets using a bottom-up process. Scanning electron microscopy and transmission electron microscopy (both high and low resolution) exhibit evidence of less than ten layers of nanosheets with uniform dimension. X-ray diffraction pattern and other additional characterization techniques prove crystallinity and purity of the product.

scholarly journals Atomic-scale dynamics of triangular hole growth in monolayer hexagonal boron nitride under electron irradiation

Nanoscale ◽  
2015 ◽  
Vol 7 (24) ◽  
pp. 10600-10605 ◽  
Author(s):  
Gyeong Hee Ryu ◽  
Hyo Ju Park ◽  
Junga Ryou ◽  
Jinwoo Park ◽  
Jongyeong Lee ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Boron Nitride ◽  
Electron Beam Irradiation ◽  
Hexagonal Boron Nitride ◽  
Atomic Scale ◽  
Atomic Resolution ◽  
Beam Irradiation ◽  
Transmission Electron ◽  
Hole Growth ◽  
Over Time

The production of holes by electron beam irradiation in hexagonal boron nitride is monitored over time using atomic resolution transmission electron microscopy.

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