Adhesion Properties of Metallic and Oxide Thin Films Produced by Several Methods

1993 ◽  
Vol 308 ◽  
Author(s):  
C. Ottermann ◽  
N. Tadokoro ◽  
Y. Tomita ◽  
K. Bange
Keyword(s):  
Film Growth ◽  
Sol Gel ◽  
Chemical Vapor ◽  
Scratch Test ◽  
Test Method ◽  
Adhesion Properties ◽  
Ion Plating ◽  
Gel Technique ◽  
Film Substrate ◽  
Deposition Conditions

ABSTRACTAdhesion of Cr, SiO2, TiO2 and Ta2O5 films with thicknesses between 40 nm and 380 nm has been investigated using a new scratch-test method based on a vibrating diamond micro-indenter. The oxide films are produced on different substrates by sol-gel technique (SG), reactive evaporation (RE), reactive ion plating (IP) and plasma impulse chemical vapor deposition (PICVD); Cr-layers are deposited by sputtering (SP) on quartz. Large variations in adhesion are found for different coating techniques and deposition conditions, especially the substrate temperature. The adhesion can be correlated with microscopic properties in the film-substrate interface where differences are analyzed in term of hydrogen content, film growth and density. The adhesion is also connected with other macroscopic film quantities.

Influence of Aging Processes on Adhesion Properties of Metallic and Oxidic Thin Films

1994 ◽  
Vol 356 ◽  
Author(s):  
C. R. Ottermann ◽  
Y. Tomita ◽  
M. Ishiyama ◽  
K. Bange
Keyword(s):  
Low Voltage ◽  
Sol Gel ◽  
Chemical Vapour ◽  
Scratch Test ◽  
Temperature Treatment ◽  
Fused Silica ◽  
Test Method ◽  
Film Stress ◽  
Aging Effects ◽  
Adhesion Properties

AbstractAdhesion of oxidic and metallic films with thicknesses between 40 nm and 350 nm has been investigated by means of a scratch-test method based on a vibrating diamond micro-indenter. SiO2 and TiO2 films are precipitated on fused silica substrates by sol-gel techniques (SG), reactive evaporation (RE), reactive low-voltage ion plating (IP), and plasma impulse chemical vapour deposition (PICVD), and Cr-layers are produced by rf magnetron sputtering (SP). The influence of aging effects on film adhesion is investigated in respect of several conditions, like storage under ambient surroundings with differences in relative humidity or temperature treatment. A method is presented allowing control of the long-term stability of the scratch-test conditions. Temperature treatment up to 600 °C is found to have the most significant impact on adhesion properties. Adhesion increases for some SiO2 films, whereas for TiO2 layers an opposite behavior is observed. Here, the adhesion of the originally amorphous titania films is reduced due to the phase transition to polycrystalline anatase, which correlates with a significant increase in film stress.

Nonlinear Acoustic Response in thin Oxide Layers on Fused Silica

1996 ◽  
Vol 436 ◽  
Author(s):  
C. R. Ottermann ◽  
S. U. Fassbender ◽  
W. Arnold ◽  
K. Bange
Keyword(s):  
Scratch Test ◽  
Fused Silica ◽  
Test Method ◽  
Film Material ◽  
Acoustic Response ◽  
Layered Systems ◽  
Adhesion Properties ◽  
Nonlinear Mechanical ◽  
Nonlinear Acoustic ◽  
Film Substrate

AbstractNonlinear mechanical properties of layered systems of Ta2O5 and TiO2 films deposited on fused silica by reactive evaporation (RE), reactive ion plating (IP) and spin coating (SC) are investigated by means of an ultrasonic technique. The coatings with thickness of 100 nm possess differences in density and crystal structure, due to the different deposition conditions. The nonlinear acoustic response of the film/substrate systems depends on film material. Differences are observed in respect to film density as obtained by the alternate deposition methods. The origin of the differences in nonlinear acoustic response of the samples is discussed. The results are correlated to adhesion properties of the films determined by a scratch-test method.

scholarly journals Воздействие дуплексной обработки на механические свойства нержавеющей стали марки 316L

2020 ◽  
Vol 46 (21) ◽  
pp. 14
Author(s):  
А.С. Гренадёров ◽  
А.А. Соловьёв ◽  
К.В. Оскомов
Keyword(s):  
Mechanical Properties ◽  
Surface Hardness ◽  
Chemical Vapor ◽  
Scratch Test ◽  
Nitrogen Plasma ◽  
Nitrogen Atmosphere ◽  
Hydrocarbon Films ◽  
Ion Plasma ◽  
316L Steel ◽  
Film Substrate

The results of experimental research on modifying the surface layer of 316L steel by duplex treatment are presented. The latter includes ion-plasma treatment in a nitrogen atmosphere with subsequent plasma-enhanced chemical vapor deposition of hydrocarbon films doped with silicon and oxygen (a-C:H:SiOx). Mechanical properties of steel surface (hardness, modulus of elasticity, plasticity index, plastic deformation resistance) were determined by the nanoindentation method, and adhesion of the films was evaluated by a scratch test. It was found that the greatest improvement in the mechanical properties of the film-substrate system occurs after the deposition of a-C:H:SiOx film on a surface previously hardened in a nitrogen plasma.

Preferred Orientation Growth of Ba0.6Sr0.4TiO3 Thin Films with Epitaxial MgO Buffer Layer on Si(100) Substrate

2007 ◽  
Vol 336-338 ◽  
pp. 69-72 ◽  
Author(s):  
Xue Feng Ma ◽  
Shu Bin Wang ◽  
Yue Zhang
Keyword(s):  
Thin Films ◽  
Atmospheric Pressure ◽  
Annealing Temperature ◽  
Sol Gel ◽  
Stoichiometric Composition ◽  
Chemical Vapor ◽  
Buffer Layers ◽  
Spectroscopy Analysis ◽  
Gel Technique ◽  
Post Deposition

Epitaxial MgO thin films were deposited on Si(100) substrate by atmospheric-pressure metalorganic chemical vapor deposition for using as buffer layers. Ba0.6Sr0.4TiO3 thin films were prepared on MgO/Si(100) substrate by sol-gel technique. The independence of crystallinity on annealing temperature was investigated. The Ba0.6Sr0.4TiO3 (BST) thin films are crystallized in preferential (100) orientation after post-deposition annealing at 850°C and 950°C for 2h in air, respectively. Rutherford backscattering spectroscopy analysis confirmed that both the BST and MgO films have stoichiometric composition.

Metal alkoxides as precursors for thin-film growth

1990 ◽  
Vol 330 (1610) ◽  
pp. 167-171 ◽  
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Sol Gel ◽  
Pure Metal ◽  
Thin Film Growth ◽  
Metal Alkoxide ◽  
Metal Alkoxides ◽  
Oxide Deposition ◽  
Gel Technique ◽  
Deposition Processes

The metal alkoxides [M (OR) x ] n are excellent precursor compounds for synthesizing pure metal oxides, glasses and ceramics by either the MOCVD or the sol—gel technique depending on the volatility and solubility of the metal alkoxide. Factors controlling the volatility of metal alkoxides are discussed together with possible mechanisms for the oxide deposition processes.

Influence of Tipradius and Substrate on the Nanotribological Characterization of Thin DLC Coatings

2000 ◽  
Vol 649 ◽  
Author(s):  
Thorsten Staedler ◽  
Kirsten I. Schiffmann
Keyword(s):  
Chemical Vapor ◽  
Scratch Test ◽  
Carbon Films ◽  
Dlc Coatings ◽  
Wide Range ◽  
Substrate Properties ◽  
Film Substrate ◽  
Wear Tests ◽  
Increasing Load

ABSTRACTIn this work diamond-like carbon films deposited via plasma enhanced chemical vapor deposition with a thickness of 250nm on different substrates are characterized by nanoindentation and microscratching in combination with scanning probe microscopy. The substrates (SU8 photoresist, quartz glass, Si(100) and AlTiC ceramic) provide a wide range of combinations between film and substrate properties. The experimental configuration allows the testing of samples with loads between 1μN and 10mN and a high local resolution. The tribological response of the various film/substrate systems is analysed in two different ways. A single scratch test with linear increasing load and an oscillating wear tests at constant loads is used. The tip radii of the conical diamond tips utilized vary between 0.6 and 6μm. Both, the substrates as well as the tip radii, show a significant influence on the tribological behavior of the systems.

The Origin of Stress in Co-Cr Alloy Thin Films Deposited by Magnetron Sputtering

1991 ◽  
Vol 239 ◽  
Author(s):  
Zhi-Feng Zhou ◽  
Yu-Dian Fan
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Growth Process ◽  
Film Growth ◽  
Perpendicular Magnetic Recording ◽  
Glass Substrates ◽  
Planar Magnetron ◽  
Film Substrate ◽  
Defect Elimination ◽  
Deposition Conditions

ABSTRACTCo-Cr alloy thin films are considered as an applicable perpendicular magnetic recording medium, and their mechanical properties such as internal stress can not be neglected. In this experiment, Co-Cr films are deposited on glass substrates by D. C planar magnetron sputtering, and the effects of film thickness, Ni-Fe underlayer as well as substrate temperature on the stress are studied respectively. The stresses are all tensile in all cases, and the stress existing at the film-substrate interface is very small. According to the above experimental results and the structure analysis of the films, the atomic peening effect produced by the rebounded working gas atoms can be negligible, and the stress is thought to originate from the film growth process but not from the inter-facial effect. Therefore, the structural defect elimination model is proposed (here the defects mainly include vacancies and grain boundaries). With this model, the origin of the tensile stress as well as the relations between the stress and the deposition conditions are explained qualitatively.

Limiting and Enhancement Effects in Laser Chemical Vapor Deposition

1983 ◽  
Vol 29 ◽  
Author(s):  
S. D. Allen ◽  
R. Y. Jan ◽  
S. M. Mazuk ◽  
K. J. Shin ◽  
S. D. Vernon
Keyword(s):  
Chemical Vapor Deposition ◽  
Heat Source ◽  
Vapor Deposition ◽  
Film Growth ◽  
Laser Energy ◽  
Chemical Vapor ◽  
Laser Chemical Vapor Deposition ◽  
Diffusion Geometry ◽  
Laser Heat Source ◽  
Film Substrate

ABSTRACTLaser chemical vapor deposition (LCVD) is a modification of conventional CVD using a laser heat source. The film growth characteristics differ considerably from conventional CVD in several ways, however. The use of an optical heat source means that the optical properties of the film/substrate system must be considered, e.g., for metals deposited on absorbing substrates, the film thickness and diameter may “self-limit” in some cases because the deposited film reflects most of the laser energy. On the other hand, the small area heated in LCVD results in a different diffusion geometry and access to higher surface temperatures than are achievable when large areas are heated. For favorable reactant systems, these enhancement effects can yield fast deposition rates and line deposition scan speeds greater than 10 cm/sec. This paper will review results of pulsed and cw LCVD of predominantly metal films using visible and infrared lasers.

scholarly journals Enhanced adhesion of acrylic adhesives with dental tissue with the addition of aluminum oxide based particles

Tehnika ◽  
2020 ◽  
Vol 75 (4) ◽  
pp. 429-433
Author(s):  
Marija Vuksanović ◽  
Nataša Tomić ◽  
Ivana Mladenović ◽  
Tamara Perić ◽  
Bojan Gligorijević ◽  
...  
Keyword(s):  
Sol Gel ◽  
Dental Tissue ◽  
Adhesion Properties ◽  
Alumina Particles ◽  
Gel Technique ◽  
Adhesive Application ◽  
Tooth Tissue

Composite materials based on acrylate UV-cured polymers (Bis-GMA/TEGDMA) as a matrix and reinforcements that can be selected in order to adjust the properties of the obtained composite are used in the field of dental technology. The role of reinforcement is to adjust the mechanical properties, but also to control the shrinkage during curing. As reinforcement, alumina particles doped with iron oxide (Al2O3 Fe) synthesized using the sol-gel technique were selected. In order to simulate the process of adhesive application in real conditions, in vitro testing technique and adhesion properties of synthesized adhesive were used, where tooth tissue was used as a substrate. Comparison with standard adhesives used in dentistry was used to compare adhesion. The quality of the adhesive joint was evaluated using the microhardness testing method using different loads where it is estimated how the adhesive makes a connection with the substrate. It was shown that the synthesized adhesive showed significantly enhanced adhesion compared to the standard adhesive used in dentistry (836%).

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