No Correlation Between Porous Silicon Photoluminescence and Surface Hydrogen Species

1993 ◽  
Vol 298 ◽  
Author(s):  
S.M. Geoqrg ◽  
M.B. Robinson ◽  
A.C. Dillon

AbstractThe photoluminescence (PL) of porous silicon has been attributed to quantum confinement, amorphous silicon, or surface species such as hydrogen, polysilanes or siloxene. Our research has tested the early claims that surface hydrogen is responsible for PL. Our initial studies examined the effect of thermal annealing on surface hydrogen and PL in situ in an ultrahigh vacuum chamber. The results showed that the PL decreased between 450–550 whereas H2 was desorbed from surface SiH2 species between 500–575 K. There was no direct correlation between the PL and the loss of SiH2 surface species. Our most recent investigations have monitored PL and surface hydrogen species as a function of HF etching time for electrochemically anodized porous silicon samples that were not initially photoluminescent. While the surface hydrogen species continually decreased versus HF etching time, the photoluminescence did not appear until after HF etching times of 20–80 minutes depending on initial sample porosity. These results again illustrated that there is no direct correlation between the PL and surface hydrogen species.

1992 ◽  
Vol 283 ◽  
Author(s):  
M. B. Robinson ◽  
A. C. Dillon ◽  
S. M. George

ABSTRACTThe photoluminescence and infrared absorbance of electrochemically anodized porous silicon samples were examined as a function of hydrofluoric acid (HF) etching time. Transmission FTIR spectroscopy measurements revealed that the infrared absorbance from silicon hydrogen surface species was largest for the initial porous silicon samples and immediately decreased with HF etching. In contrast, the photoluminescence did not appear until after HF etching times of 20–80 minutes, depending on initial sample porosity. Subsequently, the photoluminescence intensity increased, reached a maximum, and then progressively decreased versus HF etching time. These HF etching results demonstrate that there is no direct correlation between the photoluminescence and the silicon hydrogen surface species.


1994 ◽  
Vol 358 ◽  
Author(s):  
Adam A. Filios ◽  
Raphael Tsu

ABSTRACTPorous silicon samples prepared in the dark under "gentle" etching conditions clearly demonstrate effects of quantum confinement, such as a correlation of the photoluminescence peak energy with the downshift of the Raman line from 521 cm−1 for bulk silicon, and a blue shift in the remaining weak photoluminescence after thermal annealing. On the other hand, samples prepared under illumination as well as those heavily etched in the dark, though luminesce brightly, show no significant effects of quantum confinement, suggesting a different dominant mechanism for the observed luminescence.


1999 ◽  
Vol 85 (10) ◽  
pp. 7105-7111 ◽  
Author(s):  
D. Buttard ◽  
G. Dolino ◽  
C. Faivre ◽  
A. Halimaoui ◽  
F. Comin ◽  
...  

Micromachines ◽  
2021 ◽  
Vol 12 (4) ◽  
pp. 354
Author(s):  
Qianqian Liu ◽  
Xiaoxuan Chen ◽  
Hongliang Li ◽  
Yanqing Guo ◽  
Jie Song ◽  
...  

Luminescent amorphous silicon nitride-containing dense Si nanodots were prepared by using very-high-frequency plasma-enhanced chemical vapor deposition at 250 °C. The influence of thermal annealing on photoluminescence (PL) was studied. Compared with the pristine film, thermal annealing at 1000 °C gave rise to a significant enhancement by more than twofold in terms of PL intensity. The PL featured a nanosecond recombination dynamic. The PL peak position was independent of the excitation wavelength and measured temperatures. By combining the Raman spectra and infrared absorption spectra analyses, the enhanced PL was suggested to be from the increased density of radiative centers related to the Si dangling bonds (K0) and N4+ or N20 as a result of bonding configuration reconstruction.


2001 ◽  
Vol 203 (2) ◽  
pp. 375-381 ◽  
Author(s):  
Irina I Ivanova ◽  
Elena B Pomakhina ◽  
Alexander I Rebrov ◽  
Michael Hunger ◽  
Yuryi G Kolyagin ◽  
...  

2020 ◽  
Vol 1529 ◽  
pp. 032106
Author(s):  
Muna E. Raypah ◽  
Naser M. Ahmed ◽  
S.A.M Samsuri ◽  
Shahrom Mahmud

Author(s):  
Martin Owusu-Mensah ◽  
Stéphanie Jublot-Leclerc ◽  
Aurélie Gentils ◽  
Cédric Baumier ◽  
Joël Ribis ◽  
...  

1994 ◽  
Vol 345 ◽  
Author(s):  
T. Kretz ◽  
D. Pribat ◽  
P. Legagneux ◽  
F. Plais ◽  
O. Huet ◽  
...  

AbstractHigh purity amorphous silicon layers were obtained by ultrahigh vacuum (millitorr range) chemical vapor deposition (UHVCVD) from disilane gas. The crystalline fraction of the films was monitored by in situ electrical conductance measurements performed during isothermal annealings. The experimental conductance curves were fitted with an analytical expression, from which the characteristic crystallisation time, tc, was extracted. Using the activation energy for the growth rate extracted from our previous work, we were able to determine the activation energy for the nucleation rate for the analysed-films. For the films including small crystallites we have obtained En ∼ 2.8 eV, compared to En ∼ 3.7 eV for the completely amorphous ones.


1997 ◽  
Vol 31 (7) ◽  
pp. 704-706 ◽  
Author(s):  
V. A. Kiselev ◽  
S. V. Polisadin ◽  
A. V. Postnikov

Sign in / Sign up

Export Citation Format

Share Document