Electron Transport and Conduction-Band-Tail States in a-Si:H Deposited with a Remote Hydrogen Plasma

1993 ◽  
Vol 297 ◽  
Author(s):  
C.E. Nebel ◽  
R.A. Street ◽  
N.M. Johnson ◽  
J. Walker

Electron transport properties of a-Si:H prepared in a remote hydrogen plasma deposition reactor (RHPD) at TD = 400°C were investigated in the temperature regime 110 K ≤ T ≤ 300 K by time-of-flight and post-transit spectroscopy experiments. Based on these data the conduction-band-tail state distribution was calculated. In the energy range 85 meV ≤ Ec- E ≤ 350 meV below the mobility edge Ec the tail is well described by an exponential distribution with a characteristic energy of ≃ 21 meV. Deeper in the mobility gap (Ec-E > 350 meV) the tail smoothly passes over into the defect density which is approximately six orders of magnitude smaller than at the mobility edge. Comparisons with data deduced on conventionally prepared a-Si:H (RF-, DC-glow discharge) at TD = 230 °C show that electron transport and the conduction band tail of the RHPD material are comparable.

1989 ◽  
Vol 149 ◽  
Author(s):  
S. Akita ◽  
Y. Nakayama ◽  
M. Yamano ◽  
T. Kawamura

ABSTRACTThe effect of carbon incorporation into a-Si:H has been investigated in terms of gap states. The shallow and deep states are measured by a combination of two methods of the time-of-flight and the depletion discharge transient spectroscopy. The results show that the carbon incorporation of 10Z into a-Si:H leads to a slight increase in the conduction-band tail states and an extention of the deep states distribution. However, the increase in the shallow states affects little change in the electron transport properties. The origin of the deep states is also discussed.


1990 ◽  
Vol 192 ◽  
Author(s):  
Samer Aljishi ◽  
J. David Cohen ◽  
Shu Jin ◽  
Lothar Ley

ABSTRACTThe energy distribution and temperature dependence of the conduction and valence band tail density of states in a-Si:H and a-Si,Ge:H alloys is determined via total yield photoelectron spectroscopy. All films are observed to possess purely exponential conduction and valence band tail densities of states; however, the characteristic energy of the conduction band tail increases much more rapidly with temperature in the range of 300K to 550K than that of the valence band tail. This indicates that over that temperature range the conduction band tail is considerably more susceptible to thermal disorder than to structural disorder whereas the reverse holds for the valence band tail.


1992 ◽  
Vol 258 ◽  
Author(s):  
C. E. Nebel ◽  
R. A. Street

ABSTRACTLow temperature, high field properties of electron and hole transport are investigated by time-of-flight (TOF), steady-state and transient space charge limited current (SCLC) experiments on intrinsic a-Si:H. Charge collection and TOF experiments performed at T= 80 K reveal hole μτ-products of = 8 × 10-10 cm2/V and hole mobilities μ ≤ 9×10-3 cm2/Vs. The field effect on hole thermalization is demonstrated by evaluation of the post transit current decay. SCLC experiments on p+ -i-n+ (electron transport) and p + -i-n+ (hole transport) configurations are introduced and interpreted in terms of field enhanced conductivity and mobility. The experiments demonstrate the overwhelming field effect on carrier hopping in the band tail regions of a-Si:H. Considerably higher fields have to be applied in the case of hole transport than electron transport to achieve comparable conductivities; this is discussed on the basis of the different tail state distributions and localization lengths.


1990 ◽  
Vol 192 ◽  
Author(s):  
C. E. Nebel ◽  
H. C. Weller ◽  
G.H. Bauer

ABSTRACTThe thermalization of electrons in the medium temperature range (120K ≤ T ≤ 200K) is investigated by time-of-flight experiments on a-SiGe:H mim structures. The evaluation of the pre-transit current decay reveals a dual slope characteristic which reflects an initial hopping down (I ∼ t−1) followed by a thermally activated (I ∼ t−p 0 < p < 1) process. The transition time from hopping down to multiple trapping sensitively depends on temperature and alloy composition. The experimentally deduced features can be explained by the increased tail state density at the conduction band mobility edge of a-SiGe:H samples compared to a-Si:H.


1999 ◽  
Vol 557 ◽  
Author(s):  
S. Reynolds ◽  
C. Main ◽  
D.P. Webb ◽  
M.J. Rose

AbstractModulated and Fourier-transformed transient photocurrent (MPC and TPC-FT) spectroscopies have been evaluated through a study of the density and capture properties of localised states in as-prepared and light-soaked PECVD a-Si:H samples over a range of temperatures and optical excitations. Both techniques return a conduction band tail state characteristic energy of approximately 22 meV. However, defect state spectra differ in detail and are strongly influenced by dc optical excitation. A feature correlating with the quasi-Fermi level position is observed, but the capture coefficient implied (of order 10-6 cm3 s-1) is some two orders greater than that calculated from thermal activation of emission frequencies. Such a value would suggest an implausibly low absolute density of defects. Possible explanations are briefly discussed and additional investigations proposed.


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Ahsan Ullah ◽  
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Author(s):  
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We develop a method based on the mechanically controllable break junction technique to investigate the electron transport properties of single molecular junctions upon fiber waveguided light. In our strategy, a...


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