Electron Time-of-Flight Measurements in a-Si1−XCX:H

1993 ◽  
Vol 297 ◽  
Author(s):  
Qi Wang ◽  
Eric A. Schiff ◽  
Yuan-Min Li

We have measured the temperature-dependent electron drift mobility in a series of hydrogenated amorphous silicon-carbon alloys using time-of-flight. The specimens were prepared at Solarex using the gas mixture procedures which have recently yielded improvement in the solar conversion efficiency of wide bandgap solar cells. As the bandgap increased due to carbon alloying the electron drift mobility decreased by as much as a factor 30 at some temperatures. The cells with 1.75 eV, 1.81 eV, and 1.87 eV bandgaps had thermally activated drift mobilities over the temperature range 120 K ‐ 200 K; this is associated with simple multiple-trapping behavior. Specimens with bandgaps near 1.90 eV did not have simply activated drift mobilities; we have not accounted for this behavior, but it suggests that the bandtail broadening description used to account for the effects of germanium alloying on the electron drift mobility may not be simply applicable to carbon alloying.

1993 ◽  
Vol 68 (3) ◽  
pp. 173-178 ◽  
Author(s):  
Ö. Öktü ◽  
H. Tolunay ◽  
G. J. Adriaenssens ◽  
S. D. Baranovskii ◽  
W. Lauwerens

1995 ◽  
Vol 377 ◽  
Author(s):  
Qing Gu ◽  
E. A. Schiff ◽  
R. S. Crandall ◽  
E. Iwaniczko ◽  
B. Nelson

ABSTRACTWe have measured the electron drift mobility in a-Si:H prepared by hot wire (HW) deposition using photocarrier time-of-flight. Initial work has shown that light-soaked HW material can have much better ambipolar diffusion lengths than the plasma-deposited material following extended light soaking. In a sample with about 2% H-concentration in the intrinsic layer, we find that the electron drift mobility is quite different from that of a-Si:H alloys prepared by normal glow-discharge CVD, even allowing for the reduced bandgap of the hot Wire material. This result challenges the principle that the bandgap of optimized amorphous silicon based material is sufficient to predict the electron drift mobility.


1989 ◽  
Vol 54 (19) ◽  
pp. 1911-1913 ◽  
Author(s):  
E. A. Schiff ◽  
R. I. Devlen ◽  
H. T. Grahn ◽  
J. Tauc ◽  
S. Guha

1993 ◽  
Vol 164-166 ◽  
pp. 521-524 ◽  
Author(s):  
P.A. Bayley ◽  
A.K. Browne ◽  
J.M. Marshall ◽  
R.A.C.M.M. Van Swaaij ◽  
A.R. Hepburn

1993 ◽  
Vol 297 ◽  
Author(s):  
Qing Gu ◽  
Eric A. Schiff ◽  
Jean Baptiste Chevrier ◽  
Bernard Equer

We have measured the electron drift mobility in a-Si:H at high electric fields (E ≤ 3.6 x 105 V%cm). The a-Si:Hpin structure was prepared at Palaiseau, and incorporated a thickp+ layer to retard high field breakdown. The drift mobility was obtained from transient photocurrent measurements from 1 ns - 1 ms following a laser pulse. Mobility increases as large as a factor of 30 were observed; at 77 K the high field mobility de¬pended exponentially upon field (exp(E/Eu), where E u= 1.1 x 105 V%cm). The same field dependence was observed in the time range 10 ns – 1 μs, indicating that the dispersion parameter change with field was negligible. This latter result appears to exclude hopping in the exponential conduction bandtail as the fundamental transport mechanism in a-Si:H above 77 K; alternate models are briefly discussed.


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